Inventor · disambiguated record
Martijn Gerard Dominique Wehrens
Also filed as: WEHRENS MARTIJN · WEHRENS MARTIJN G D · WEHRENS MARTIJN GERARD DOMINIQ · WEHRENS MARTIJN GERARD DOMINIQUE
11 granted patents·5 pending applications·109 citations·filing 2003–2014
89Inventor score
Files withASML NETHERLANDS BV10ROOIJAKKERS WILHELMUS JACOBUS MARIA2Cymer LLC1KRUIZINGA BORGERT1NIKOLAEV IVAN SERGEJEVITSJ1
Top patents by PatentIndex Score
16 records- 0195US8809823B1System and method for controlling droplet timing and steering in an LPP EUV light sourceCymer LLC·Filed 2013·Granted Aug 19, 2014·22 cites·14 claims
- 0294US7375799B2Lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted May 20, 2008·24 cites·15 claims
- 0393US9497840B2System and method for creating and utilizing dual laser curtains from a single laser in an LPP EUV light sourceASML NETHERLANDS BV·Filed 2014·Granted Nov 15, 2016·17 cites·19 claims
- 0492US9241395B2System and method for controlling droplet timing in an LPP EUV light sourceASML NETHERLANDS BV·Filed 2013·Granted Jan 19, 2016·16 cites·14 claims
- 0589US9331117B2Sensor and lithographic apparatusASML NETHERLANDS BV·Filed 2013·Granted May 3, 2016·6 cites·7 claims
- 0678US6842247B1Reticle independent reticle stage calibrationASML NETHERLANDS BV·Filed 2003·Granted Jan 11, 2005·17 cites·19 claims
- 0772US8559108B2Grating for EUV-radiation, method for manufacturing the grating and wavefront measurement systemKRUIZINGA BORGERT·Filed 2008·Granted Oct 15, 2013·5 cites·20 claims
- 0866US8124939B2Radiation detectorROOIJAKKERS WILHELMUS JACOBUS MARIA·Filed 2010·Granted Feb 28, 2012·2 cites·18 claims
- 0957US9170498B2Lithographic apparatus and a method for determining a polarization property of a projection system using an adjustable polarizer and interferometric sensorASML NETHERLANDS BV·Filed 2013·Granted Oct 27, 2015·0 cites·12 claims
- 1050US2006203221A1Lithographic apparatus and a method for determining a polarization propertyASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 1150US2008137049A1Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicleASML NETHERLANDS BV·Filed 2008·Application pending·0 cites
- 1249US8934083B2Lithographic apparatus and detector apparatusNIKOLAEV IVAN SERGEJEVITSJ·Filed 2010·Granted Jan 13, 2015·0 cites·14 claims
- 1349US8269186B2Radiation detectorROOIJAKKERS WILHELMUS JACOBUS MARIA·Filed 2011·Granted Sep 18, 2012·0 cites·18 claims
- 1439US2010118288A1Lithographic projection system and projection lens polarization sensorVAN DE KERKHOF MARCUS ADRIANUS·Filed 2006·Application pending·0 cites
- 1539US2010182582A1Passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography toolASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 1639US2010045956A1Lithographic Apparatus, Method for Determining at Least One Polarization Property Thereof, Polarization Analyzer and Polarization Sensor ThereofASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →