Inventor · disambiguated record
Matthias Zinke
Also filed as: ZINKE MATTHIAS
3 granted patents·1 pending application·1 citations·filing 2012–2019
51Inventor score
Technology areasH10P
Top patents by PatentIndex Score
4 records- 0158US9111999B2Technique for reducing plasma-induced etch damage during the formation of vias in interlayer dielectrics by modified RF power ramp-upGLOBALFOUNDRIES INC·Filed 2015·Granted Aug 18, 2015·1 cites·14 claims
- 0250US11127683B2Semiconductor structure with substantially straight contact profileGLOBALFOUNDRIES US INC·Filed 2019·Granted Sep 21, 2021·0 cites·19 claims
- 0348US2019157213A1Semiconductor structure with substantially straight contact profileGLOBALFOUNDRIES INC·Filed 2017·Application pending·0 cites
- 0438US9018102B2Technique for reducing plasma-induced etch damage during the formation of vias in interlayer dielectrics by modified RF power ramp-upRADWAN MOHAMMED·Filed 2012·Granted Apr 28, 2015·0 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →