Inventor · disambiguated record
Mei Chang
Also filed as: CHANG MEI · CHANG MEI-YEH
43 granted patents·18 pending applications·990 citations·filing 2001–2022
97Inventor score
Top patents by PatentIndex Score
61 records- 0199US10400335B2Dual-direction chemical delivery system for ALD/CVD chambersAPPLIED MATERIALS INC·Filed 2017·Granted Sep 3, 2019·363 cites·12 claims
- 0298US10121671B2Methods of depositing metal films using metal oxyhalide precursorsAPPLIED MATERIALS INC·Filed 2016·Granted Nov 6, 2018·429 cites·20 claims
- 0398US9460959B1Methods for pre-cleaning conductive interconnect structuresAPPLIED MATERIALS INC·Filed 2015·Granted Oct 4, 2016·113 cites·18 claims
- 0496US9601339B2Methods for depositing fluorine/carbon-free conformal tungstenAPPLIED MATERIALS INC·Filed 2015·Granted Mar 21, 2017·13 cites·18 claims
- 0594US9048183B2NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursorsAPPLIED MATERIALS INC·Filed 2014·Granted Jun 2, 2015·14 cites·18 claims
- 0689US8642468B2NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursorsGANGULI SESHADRI·Filed 2011·Granted Feb 4, 2014·9 cites·17 claims
- 0786US10763090B2High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this processAPPLIED MATERIALS INC·Filed 2016·Granted Sep 1, 2020·3 cites·19 claims
- 0886US9418890B2Method for tuning a deposition rate during an atomic layer deposition processMA PAUL·Filed 2014·Granted Aug 16, 2016·8 cites·25 claims
- 0985US10109534B2Multi-threshold voltage (Vt) workfunction metal by selective atomic layer deposition (ALD)APPLIED MATERIALS INC·Filed 2015·Granted Oct 23, 2018·5 cites·20 claims
- 1085US9399812B2Methods of preventing plasma induced damage during substrate processingXIE ZHIGANG·Filed 2011·Granted Jul 26, 2016·11 cites·16 claims
- 1183US9245769B2Directional SiO2 etch using plasma pre-treatment and high-temperature etchant depositionAPPLIED MATERIALS INC·Filed 2014·Granted Jan 26, 2016·4 cites·20 claims
- 1282US10395916B2In-situ pre-clean for selectivity improvement for selective depositionAPPLIED MATERIALS INC·Filed 2017·Granted Aug 27, 2019·3 cites·20 claims
- 1382US9177780B2Directional SiO2 etch using plasma pre-treatment and high-temperature etchant depositionAPPLIED MATERIALS INC·Filed 2013·Granted Nov 3, 2015·5 cites·20 claims
- 1476US11887855B2Methods for depositing fluorine/carbon-free conformal tungstenAPPLIED MATERIALS INC·Filed 2021·Granted Jan 30, 2024·0 cites·19 claims
- 1576US9947578B2Methods for forming low-resistance contacts through integrated process flow systemsAPPLIED MATERIALS INC·Filed 2016·Granted Apr 17, 2018·2 cites·19 claims
- 1675US10600685B2Methods to fill high aspect ratio features on semiconductor substrates with MOCVD cobalt filmAPPLIED MATERIALS INC·Filed 2017·Granted Mar 24, 2020·2 cites·20 claims
- 1774US12406849B2Methods and apparatus for enhancing selectivity of titanium and titanium silicides during chemical vapor depositionAPPLIED MATERIALS INC·Filed 2022·Granted Sep 2, 2025·0 cites·20 claims
- 1873US2023063929A1Hydrophobic and icephobic coatingAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1972US11530478B2Method for forming a hydrophobic and icephobic coatingAPPLIED MATERIALS INC·Filed 2020·Granted Dec 20, 2022·0 cites·18 claims
- 2072US9595466B2Methods for etching via atomic layer deposition (ALD) cyclesAPPLIED MATERIALS INC·Filed 2015·Granted Mar 14, 2017·2 cites·19 claims
- 2170US10453657B2Apparatus for depositing metal films with plasma treatmentAPPLIED MATERIALS INC·Filed 2017·Granted Oct 22, 2019·0 cites·16 claims
- 2269US9653318B2Directional SiO2 etch using plasma pre-treatment and high-temperature etchant depositionAPPLIED MATERIALS INC·Filed 2016·Granted May 16, 2017·1 cites·20 claims
- 2368US2020357616A1High pressure rf-dc sputtering and methods to improve film uniformity and step-coverage of this processAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 2466US10094023B2Methods and apparatus for chemical vapor deposition of a cobalt layerAPPLIED MATERIALS INC·Filed 2015·Granted Oct 9, 2018·1 cites·17 claims
- 2566US9824889B2CVD silicon monolayer formation method and gate oxide ALD formation on III-V materialsAPPLIED MATERIALS INC·Filed 2015·Granted Nov 21, 2017·1 cites·13 claims
- 2666US9202745B2Directional SiO2 etch using low-temperature etchant deposition and plasma post-treatmentAPPLIED MATERIALS INC·Filed 2014·Granted Dec 1, 2015·1 cites·20 claims
- 2765US11133155B2Apparatus for depositing metal films with plasma treatmentAPPLIED MATERIALS INC·Filed 2019·Granted Sep 28, 2021·0 cites·12 claims
- 2863US11430661B2Methods and apparatus for enhancing selectivity of titanium and titanium silicides during chemical vapor depositionAPPLIED MATERIALS INC·Filed 2019·Granted Aug 30, 2022·0 cites·18 claims
- 2961US2014076234A1Multi chamber processing systemAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 3061US2021283650A1Methods and Apparatus for Cryogenic Gas Stream Assisted SAM-based Selective DepositionAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 3161US2009111280A1Method for removing oxidesAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 3260US10985023B2Methods for depositing fluorine/carbon-free conformal tungstenAPPLIED MATERIALS INC·Filed 2017·Granted Apr 20, 2021·0 cites·14 claims
- 3359US10640870B2Gas feedthrough assemblyAPPLIED MATERIALS INC·Filed 2017·Granted May 5, 2020·0 cites·20 claims
- 3458US11033930B2Methods and apparatus for cryogenic gas stream assisted SAM-based selective depositionAPPLIED MATERIALS INC·Filed 2019·Granted Jun 15, 2021·0 cites·11 claims
- 3557US10553425B2Self-limiting and saturating chemical vapor deposition of a silicon bilayer and ALDAPPLIED MATERIALS INC·Filed 2017·Granted Feb 4, 2020·0 cites·20 claims
- 3654US10373824B2CVD silicon monolayer formation method and gate oxide ALD formation on semiconductor materialsAPPLIED MATERIALS INC·Filed 2017·Granted Aug 6, 2019·0 cites·20 claims
- 3753US11658014B2Apparatuses and methods of protecting nickel and nickel containing components with thin filmsAPPLIED MATERIALS INC·Filed 2020·Granted May 23, 2023·0 cites·17 claims
- 3853US10283345B2Methods for pre-cleaning conductive materials on a substrateAPPLIED MATERIALS INC·Filed 2016·Granted May 7, 2019·0 cites·18 claims
- 3953US9552968B2Plasma cleaning apparatus and methodAPPLIED MATERIALS INC·Filed 2014·Granted Jan 24, 2017·0 cites·15 claims
- 4053US2005230350A1In-situ dry clean chamber for front end of line fabricationAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 4153US2019385838A1In-Situ Pre-Clean For Selectivity Improvement For Selective DepositionAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 4252US2010062149A1Method for tuning a deposition rate during an atomic layer deposition processAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 4351US11355391B2Method for forming a metal gapfillAPPLIED MATERIALS INC·Filed 2020·Granted Jun 7, 2022·0 cites·19 claims
- 4451US11018009B2Tuning work function of p-metal work function films through vapor depositionAPPLIED MATERIALS INC·Filed 2019·Granted May 25, 2021·0 cites·17 claims
- 4551US9857027B2Apparatus and method for self-regulating fluid chemical deliveryAPPLIED MATERIALS INC·Filed 2014·Granted Jan 2, 2018·0 cites·19 claims
- 4651US9082828B2Al bond pad clean methodAPPLIED MATERIALS INC·Filed 2013·Granted Jul 14, 2015·0 cites·15 claims
- 4751US2010252417A1High pressure rf-dc sputtering and methods to improve film uniformity and step-coverage of this processAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 4850US11598003B2Substrate processing chamber having heated showerhead assemblyAPPLIED MATERIALS INC·Filed 2017·Granted Mar 7, 2023·0 cites·7 claims
- 4950US10879081B2Methods of reducing or eliminating defects in tungsten filmAPPLIED MATERIALS INC·Filed 2018·Granted Dec 29, 2020·0 cites·20 claims
- 5050US10535527B2Methods for depositing semiconductor filmsAPPLIED MATERIALS INC·Filed 2018·Granted Jan 14, 2020·0 cites·17 claims
Showing the top 50 of 61 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →