Inventor · disambiguated record
Merritt Funk
Also filed as: FUNK MERRITT · FUNK MERRITT L · FUNK MERRITT LANE
105 granted patents·25 pending applications·1,604 citations·filing 1997–2024
99Inventor score
Top patents by PatentIndex Score
130 records- 0198US9799494B2Energetic negative ion impact ionization plasmaTOKYO ELECTRON LTD·Filed 2016·Granted Oct 24, 2017·42 cites·28 claims
- 0298US8747610B2Plasma source pumping and gas injection baffleCHEN LEE·Filed 2012·Granted Jun 10, 2014·75 cites·20 claims
- 0398US8415884B2Stable surface wave plasma sourceCHEN LEE·Filed 2009·Granted Apr 9, 2013·240 cites·20 claims
- 0497US9209032B2Electric pressure systems for control of plasma properties and uniformityTOKYO ELECTRON LTD·Filed 2014·Granted Dec 8, 2015·42 cites·10 claims
- 0597US8038834B2Method and system for controlling radical distributionTOKYO ELECTRON LTD·Filed 2010·Granted Oct 18, 2011·18 cites·15 claims
- 0696US11600474B2RF voltage and current (V-I) sensors and measurement methodsTOKYO ELECTRON LTD·Filed 2020·Granted Mar 7, 2023·6 cites·19 claims
- 0796US7477960B2Fault detection and classification (FDC) using a run-to-run controllerTOKYO ELECTRON LTD·Filed 2005·Granted Jan 13, 2009·86 cites·51 claims
- 0896US7123980B2Method and apparatus for the monitoring and control of a semiconductor manufacturing processTOKYO ELECTRON LTD·Filed 2005·Granted Oct 17, 2006·97 cites·33 claims
- 0995US7993937B2DC and RF hybrid processing systemTOKYO ELECTRON LTD·Filed 2010·Granted Aug 9, 2011·21 cites·19 claims
- 1095US7324193B2Measuring a damaged structure formed on a wafer using optical metrologyTOKYO ELECTRON LTD·Filed 2006·Granted Jan 29, 2008·30 cites·20 claims
- 1194US11094507B2Power generation systems and methods for plasma stability and controlTOKYO ELECTRON LTD·Filed 2019·Granted Aug 17, 2021·13 cites·22 claims
- 1294US7718030B2Method and system for controlling radical distributionTOKYO ELECTRON LTD·Filed 2005·Granted May 18, 2010·20 cites·17 claims
- 1394US7395131B2Method for processing data based on the data contextTOKYO ELECTRON LTD·Filed 2005·Granted Jul 1, 2008·44 cites·23 claims
- 1494US7328418B2Iso/nested control for soft mask processingTOKYO ELECTRON LTD·Filed 2005·Granted Feb 5, 2008·29 cites·19 claims
- 1594US7113838B2Method and apparatus for monitoring tool performanceTOKYO ELECTRON LTD·Filed 2004·Granted Sep 26, 2006·111 cites·35 claims
- 1693US7967995B2Multi-layer/multi-input/multi-output (MLMIMO) models and method for usingTOKYO ELECTRON LTD·Filed 2008·Granted Jun 28, 2011·25 cites·19 claims
- 1793US7894927B2Using Multi-Layer/Multi-Input/Multi-Output (MLMIMO) models for metal-gate structuresTOKYO ELECTRON LTD·Filed 2008·Granted Feb 22, 2011·23 cites·32 claims
- 1891US7642102B2Real-time parameter tuning using wafer thicknessTOKYO ELECTRON LTD·Filed 2007·Granted Jan 5, 2010·15 cites·39 claims
- 1991US7502709B2Dynamic metrology sampling for a dual damascene processTOKYO ELECTRON LTD·Filed 2006·Granted Mar 10, 2009·17 cites·33 claims
- 2090US12451327B2Apparatus for plasma processingTOKYO ELECTRON LTD·Filed 2022·Granted Oct 21, 2025·1 cites·9 claims
- 2190US8968588B2Low electron temperature microwave surface-wave plasma (SWP) processing method and apparatusZHAO JIANPING·Filed 2012·Granted Mar 3, 2015·23 cites·13 claims
- 2289US11817296B2RF voltage and current (V-I) sensors and measurement methodsTOKYO ELECTRON LTD·Filed 2020·Granted Nov 14, 2023·2 cites·20 claims
- 2389US11410832B2RF measurement system and methodTOKYO ELECTRON LTD·Filed 2020·Granted Aug 9, 2022·2 cites·22 claims
- 2489US8816281B2Ion energy analyzer and methods of manufacturing the sameFUNK MERRITT·Filed 2012·Granted Aug 26, 2014·16 cites·20 claims
- 2589US8343371B2Apparatus and method for improving photoresist properties using a quasi-neutral beamTOKYO ELECTRON LTD·Filed 2010·Granted Jan 1, 2013·10 cites·2 claims
- 2689US7801635B2Real-time parameter tuning for etch processesTOKYO ELECTRON LTD·Filed 2007·Granted Sep 21, 2010·13 cites·28 claims
- 2789US7713758B2Method and apparatus for optimizing a gate channelTOKYO ELECTON LTD·Filed 2007·Granted May 11, 2010·22 cites·20 claims
- 2889US7567700B2Dynamic metrology sampling with wafer uniformity controlTOKYO ELECTRON LTD·Filed 2006·Granted Jul 28, 2009·11 cites·24 claims
- 2989US7517708B2Real-time parameter tuning using wafer temperatureTOKYO ELECTRON LTD·Filed 2007·Granted Apr 14, 2009·20 cites·39 claims
- 3089US7451054B2Method of using a wafer-temperature-dependent profile libraryTOKYO ELECTRON LTD·Filed 2007·Granted Nov 11, 2008·10 cites·39 claims
- 3188US12074390B2Parallel resonance antenna for radial plasma controlTOKYO ELECTRON LTD·Filed 2022·Granted Aug 27, 2024·1 cites·22 claims
- 3288US9087677B2Methods of electrical signaling in an ion energy analyzerFUNK MERRITT·Filed 2012·Granted Jul 21, 2015·8 cites·20 claims
- 3388US7939450B2Method and apparatus for spacer-optimization (S-O)TOKYO ELECTRON LTD·Filed 2007·Granted May 10, 2011·13 cites·20 claims
- 3488US7732759B2Multi-plasma neutral beam source and method of operatingTOKYO ELECTRON LTD·Filed 2008·Granted Jun 8, 2010·28 cites·25 claims
- 3588US7487053B2Refining a virtual profile libraryTOKYO ELECTRON LTD·Filed 2006·Granted Feb 3, 2009·13 cites·34 claims
- 3687US12057293B2Methods for real-time pulse measurement and pulse timing adjustment to control plasma process performanceTOKYO ELECTRON LTD·Filed 2021·Granted Aug 6, 2024·1 cites·20 claims
- 3787US8847159B2Ion energy analyzerCHEN LEE·Filed 2012·Granted Sep 30, 2014·6 cites·25 claims
- 3885US9396900B2Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma propertiesTOKYO ELECTRON LTD·Filed 2012·Granted Jul 19, 2016·10 cites·18 claims
- 3985US7899637B2Method and apparatus for creating a gate optimization evaluation libraryTOKYO ELECTRON LTD·Filed 2007·Granted Mar 1, 2011·11 cites·15 claims
- 4085US7765077B2Method and apparatus for creating a Spacer-Optimization (S-O) libraryTOKYO ELECTRON LTD·Filed 2007·Granted Jul 27, 2010·13 cites·16 claims
- 4185US7619731B2Measuring a damaged structure formed on a wafer using optical metrologyTOKYO ELECTRON LTD·Filed 2006·Granted Nov 17, 2009·11 cites·18 claims
- 4285US7158851B2Feedforward, feedback wafer to wafer control method for an etch processTOKYO ELECTRON LTD·Filed 2003·Granted Jan 2, 2007·31 cites·25 claims
- 4385US6148239AProcess control system using feed forward control threads based on material groupsADVANCED MICRO DEVICES INC·Filed 1997·Granted Nov 14, 2000·128 cites·24 claims
- 4484US8486798B1Variable capacitance chamber component incorporating a semiconductor junction and methods of manufacturing and using thereofCHEN ZHIYING·Filed 2012·Granted Jul 16, 2013·6 cites·20 claims
- 4584US2025014865A1Apparatus for plasma processingTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 4683US11050394B2Modules, multi-stage systems, and related methods for radio frequency power amplifiersTOKYO ELECTRON LTD·Filed 2019·Granted Jun 29, 2021·4 cites·24 claims
- 4783US9431218B2Scalable and uniformity controllable diffusion plasma sourceTOKYO ELECTRON LTD·Filed 2014·Granted Aug 30, 2016·5 cites·15 claims
- 4883US7292906B2Formula-based run-to-run controlTOKYO ELECTRON LTD·Filed 2004·Granted Nov 6, 2007·33 cites·27 claims
- 4981US7305322B2Using a virtual profile libraryTOKYO ELECTRON LTD·Filed 2006·Granted Dec 4, 2007·11 cites·38 claims
- 5080US8721833B2Variable capacitance chamber component incorporating ferroelectric materials and methods of manufacturing and using thereofCHEN ZHIYING·Filed 2012·Granted May 13, 2014·4 cites·15 claims
Showing the top 50 of 130 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Merritt Funk files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →