Inventor · disambiguated record
Melvin Montgomery
Also filed as: MONTGOMERY MELVIN W · MONTGOMERY MELVIN WARREN
20 granted patents·3 pending applications·421 citations·filing 1989–2016
96Inventor score
Top patents by PatentIndex Score
23 records- 0192US6582861B2Method of reshaping a patterned organic photoresist surfaceAPPLIED MATERIALS INC·Filed 2001·Granted Jun 24, 2003·46 cites·27 claims
- 0287US6727047B2Method of extending the stability of a photoresist during direct writing of an image upon the photoresistAPPLIED MATERIALS INC·Filed 2001·Granted Apr 27, 2004·31 cites·31 claims
- 0387US6605394B2Organic bottom antireflective coating for high performance mask making using optical imagingAPPLIED MATERIALS INC·Filed 2001·Granted Aug 12, 2003·30 cites·13 claims
- 0485US6703169B2Method of preparing optically imaged high performance photomasksAPPLIED MATERIALS INC·Filed 2001·Granted Mar 9, 2004·26 cites·15 claims
- 0585US5272042APositive photoresist system for near-UV to visible imagingIBM·Filed 1991·Granted Dec 21, 1993·68 cites·3 claims
- 0683US5338818ASilicon containing positive resist for DUV lithographyIBM·Filed 1992·Granted Aug 16, 1994·44 cites·4 claims
- 0783US5164278ASpeed enhancers for acid sensitized resistsIBM·Filed 1990·Granted Nov 17, 1992·41 cites·23 claims
- 0882US7244334B2Apparatus used in reshaping a surface of a photoresistAPPLIED MATERIALS INC·Filed 2005·Granted Jul 17, 2007·5 cites·11 claims
- 0978US6969569B2Method of extending the stability of a photoresist during direct writing of an imageAPPLIED MATERIALS INC·Filed 2004·Granted Nov 29, 2005·18 cites·18 claims
- 1076US5023164AHighly sensitive dry developable deep UV photoresistIBM·Filed 1989·Granted Jun 11, 1991·26 cites·14 claims
- 1173US6998206B2Method of increasing the shelf life of a blank photomask substrateAPPLIED MATERIALS INC·Filed 2004·Granted Feb 14, 2006·12 cites·11 claims
- 1273US6258514B1Top surface imaging technique using a topcoat delivery systemLSI LOGIC CORP·Filed 1999·Granted Jul 10, 2001·33 cites·39 claims
- 1367US6931619B2Apparatus for reshaping a patterned organic photoresist surfaceAPPLIED MATERIALS INC·Filed 2003·Granted Aug 16, 2005·7 cites·13 claims
- 1465US7365014B2Reticle fabrication using a removable hard maskAPPLIED MATERIALS INC·Filed 2004·Granted Apr 29, 2008·7 cites·13 claims
- 1555US5362599AFast diazoquinone positive resists comprising mixed esters of 4-sulfonate and 5-sulfonate compoundsIBM·Filed 1991·Granted Nov 8, 1994·13 cites·6 claims
- 1653US7737040B2Method of reducing critical dimension bias during fabrication of a semiconductor deviceAPPLIED MATERIALS INC·Filed 2007·Granted Jun 15, 2010·0 cites·8 claims
- 1753US7208249B2Method of producing a patterned photoresist used to prepare high performance photomasksAPPLIED MATERIALS INC·Filed 2002·Granted Apr 24, 2007·4 cites·18 claims
- 1852US7067227B2Sensitized chemically amplified photoresist for use in photomask fabrication and semiconductor processingAPPLIED MATERIALS INC·Filed 2002·Granted Jun 27, 2006·5 cites·12 claims
- 1950US2014206112A1Method for reducing charge in critical dimension-scanning electron microscope metrologySEMATECH INC·Filed 2014·Application pending·0 cites
- 2046US2017040228A1Method for reducing charge in critical dimension-scanning electron microscope metrologyUNIV NEW YORK STATE RES FOUND·Filed 2016·Application pending·0 cites
- 2139US7135256B2Method of increasing the shelf life of a photomask substrateAPPLIED MATERIALS INC·Filed 2003·Granted Nov 14, 2006·3 cites·33 claims
- 2236US7468227B2Method of reducing the average process bias during production of a reticleAPPLIED MATERIALS INC·Filed 2004·Granted Dec 23, 2008·2 cites·18 claims
- 2333US2002071995A1Photoresist topcoat for deep ultraviolet (DUV) direct write laser mask fabricationFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →