Inventor · disambiguated record
Michio Aruga
Also filed as: ARUGA MICHIO
15 granted patents·1 pending application·2,289 citations·filing 1993–2021
96Inventor score
Top patents by PatentIndex Score
16 records- 0198US7036453B2Apparatus for reducing plasma charge damage for plasma processesAPPLIED MATERIALS INC·Filed 2003·Granted May 2, 2006·467 cites·14 claims
- 0298US6660662B2Method of reducing plasma charge damage for plasma processesAPPLIED MATERIALS INC·Filed 2001·Granted Dec 9, 2003·478 cites·15 claims
- 0396US5500249AUniform tungsten silicide films produced by chemical vapor depositionAPPLIED MATERIALS INC·Filed 1993·Granted Mar 19, 1996·267 cites·11 claims
- 0494US5688331AResistance heated stem mounted aluminum susceptor assemblyAPPLIED MATERISLS INC·Filed 1996·Granted Nov 18, 1997·411 cites·9 claims
- 0593US5456757ASusceptor for vapor depositionAPPLIED MATERIALS INC·Filed 1993·Granted Oct 10, 1995·399 cites·13 claims
- 0688US5643633AUniform tungsten silicide films produced by chemical vapor depostitonAPPLIED MATERIALS INC·Filed 1995·Granted Jul 1, 1997·75 cites·15 claims
- 0778US5877086AMetal planarization using a CVD wetting filmAPPLIED MATERIALS INC·Filed 1997·Granted Mar 2, 1999·52 cites·24 claims
- 0869US5482749APretreatment process for treating aluminum-bearing surfaces of deposition chamber prior to deposition of tungsten silicide coating on substrate thereinAPPLIED MATERIALS INC·Filed 1994·Granted Jan 9, 1996·28 cites·25 claims
- 0965US5997950ASubstrate having uniform tungsten silicide film and method of manufactureAPPLIED MATERIALS INC·Filed 1997·Granted Dec 7, 1999·29 cites·47 claims
- 1060US5558910AUniform tungsten silicide films produced by chemical vapor depositionAPPLIED MATERIALS INC·Filed 1995·Granted Sep 24, 1996·24 cites·11 claims
- 1156US6090706APreconditioning process for treating deposition chamber prior to deposition of tungsten silicide coating on active substrates thereinAPPLIED MATERIALS INC·Filed 1998·Granted Jul 18, 2000·21 cites·20 claims
- 1256US5510297AProcess for uniform deposition of tungsten silicide on semiconductor wafers by treatment of susceptor having aluminum nitride surface thereon with tungsten silicide after cleaning of susceptorAPPLIED MATERIALS INC·Filed 1995·Granted Apr 23, 1996·22 cites·21 claims
- 1355US6632726B2Film formation method and film formation apparatusAPPLIED MATERIALS INC·Filed 2001·Granted Oct 14, 2003·4 cites·18 claims
- 1449US11687439B2Automatic window generation for process tracePDF SOLUTIONS INC·Filed 2021·Granted Jun 27, 2023·0 cites·17 claims
- 1549US5779848ACorrosion-resistant aluminum nitride coating for a semiconductor chamber windowAPPLIED MATERIALS INC·Filed 1997·Granted Jul 14, 1998·12 cites·18 claims
- 1639US2008035754A1Device for Treating Object and Process ThereforAQUA SCIENCE CORP·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →