Inventor · disambiguated record
Mitsutoshi Ashida
Also filed as: ASHIDA MITSUTOSHI
11 granted patents·9 pending applications·93 citations·filing 2011–2025
85Inventor score
Top patents by PatentIndex Score
20 records- 0195US8907259B2Microwave irradiation device and microwave irradiation methodKASAI SHIGERU·Filed 2011·Granted Dec 9, 2014·43 cites·14 claims
- 0294US9011636B2Automatic matching method, computer-readable storage medium, automatic matching unit, and plasma processing apparatusASHIDA MITSUTOSHI·Filed 2011·Granted Apr 21, 2015·42 cites·3 claims
- 0380US9337001B2Microwave processing apparatus and control method thereofASHIDA MITSUTOSHI·Filed 2012·Granted May 10, 2016·6 cites·15 claims
- 0465US2025357095A1Method for controlling plasma measurement system and plasma measurement systemTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0564US9224623B2Microwave irradiation apparatusKASAI SHIGERU·Filed 2012·Granted Dec 29, 2015·2 cites·8 claims
- 0662US2025087463A1Electromagnetic wave supply mechanism and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0760US2024290589A1Plasma Measuring Method and Plasma Processing ApparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0860US2024274417A1Plasma measurement method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0957US12444574B2Plasma processing apparatus, and plasma processing methodTOKYO ELECTRON LTD·Filed 2022·Granted Oct 14, 2025·0 cites·18 claims
- 1057US2025299923A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1155US12237157B2Plasma measurement methodTOKYO ELECTRON LTD·Filed 2022·Granted Feb 25, 2025·0 cites·19 claims
- 1254US11842886B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Dec 12, 2023·0 cites·5 claims
- 1348US11569558B2Directional coupler for use in a substrate processing apparatus, where the directional coupler includes a coaxial line coupled to a conductor on a substrateTOKYO ELECTRON LTD·Filed 2021·Granted Jan 31, 2023·0 cites·20 claims
- 1448US11411541B2High frequency power supply device and high frequency power supply methodTOKYO ELECTRON LTD·Filed 2020·Granted Aug 9, 2022·0 cites·18 claims
- 1541US2015144621A1Matching method and microwave heating methodTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1638US10818478B2High frequency generator and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Oct 27, 2020·0 cites·9 claims
- 1737US2013075390A1Microwave processing apparatus and method for processing object to be processedASHIDA MITSUTOSHI·Filed 2012·Application pending·0 cites
- 1837US2013075389A1Microwave processing apparatus and method for processing object to be processedASHIDA MITSUTOSHI·Filed 2012·Application pending·0 cites
- 1936US9384945B2Automatic matching unit and plasma processing apparatusASHIDA MITSUTOSHI·Filed 2011·Granted Jul 5, 2016·0 cites·24 claims
- 2030US2015305097A1Microwave heating apparatus and microwave heating methodTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →