Inventor · disambiguated record
Michael Gerhard
Also filed as: GERHARD MICHAEL
33 granted patents·4 pending applications·658 citations·filing 1999–2019
97Inventor score
Top patents by PatentIndex Score
37 records- 0197US6252712B1Optical system with polarization compensatorZEISS STIFTUNG·Filed 1999·Granted Jun 26, 2001·213 cites·14 claims
- 0296US6774984B2Optical imaging system with polarizer and a crystalline-quartz plate for use therewithZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Aug 10, 2004·67 cites·12 claims
- 0394US7145720B2Objective with fluoride crystal lensesZEISS CARL SMT AG·Filed 2003·Granted Dec 5, 2006·49 cites·97 claims
- 0493US6697199B2Objective with lenses made of a crystalline materialZEISS CARL SMT AG·Filed 2002·Granted Feb 24, 2004·52 cites·21 claims
- 0591US7199864B2Polarization rotator and a crystalline-quartz plate for use in an optical imaging systemZEISS CARL SMT AG·Filed 2006·Granted Apr 3, 2007·18 cites·5 claims
- 0691US6388823B1Optical system, especially a projection light facility for microlithographyZEISS STIFTUNG·Filed 1999·Granted May 14, 2002·126 cites·13 claims
- 0788US7294814B2Microlithography projection objective including deformable mirror with adjusting elements and systems and methods using the sameZEISS CARL SMT AG·Filed 2006·Granted Nov 13, 2007·10 cites·41 claims
- 0887US8705005B2Microlithographic illumination systemDEGUENTHER MARKUS·Filed 2008·Granted Apr 22, 2014·9 cites·49 claims
- 0984US9280060B2Illumination system for microlithographyZEISS CARL SMT GMBH·Filed 2014·Granted Mar 8, 2016·5 cites·28 claims
- 1083US7112772B2Catadioptric projection objective with adaptive mirror and projection exposure methodZEISS CARL SMT AG·Filed 2004·Granted Sep 26, 2006·24 cites·35 claims
- 1181US8870396B2Substrates for mirrors for EUV lithography and their productionZEISS CARL SMT GMBH·Filed 2012·Granted Oct 28, 2014·5 cites·19 claims
- 1278US8873023B2Illumination system for microlithographySCHOLZ AXEL·Filed 2011·Granted Oct 28, 2014·4 cites·12 claims
- 1377US7880969B2Optical integrator for an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Granted Feb 1, 2011·4 cites·20 claims
- 1477US7126765B2Objective with fluoride crystal lensesZEISS CARL SMT AG·Filed 2005·Granted Oct 24, 2006·3 cites·14 claims
- 1577US6891980B2Method and apparatus for analysis of schlierenZEISS CARL SMT AG·Filed 2002·Granted May 10, 2005·17 cites·16 claims
- 1673US6667839B2Holding device for an optical element made of a crystalline materialZEISS CARL SMT AG·Filed 2001·Granted Dec 23, 2003·18 cites·19 claims
- 1770US9606441B2Illumination system for microlithographyZEISS CARL SMT GMBH·Filed 2016·Granted Mar 28, 2017·1 cites·20 claims
- 1869US8520307B2Optical integrator for an illumination system of a microlithographic projection exposure apparatusWOLF OLIVER·Filed 2010·Granted Aug 27, 2013·4 cites·48 claims
- 1967US10578783B2Optical grating and optical assembly for sameZEISS CARL SMT GMBH·Filed 2019·Granted Mar 3, 2020·2 cites·22 claims
- 2067US9310693B2Method for operating a projection exposure tool and control apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Apr 12, 2016·1 cites·29 claims
- 2164US7271876B2Projection objective for microlithographyZEISS CARL SMT AG·Filed 2004·Granted Sep 18, 2007·7 cites·6 claims
- 2263US6936825B2Process for the decontamination of microlithographic projection exposure devicesZEISS CARL SMT AG·Filed 2001·Granted Aug 30, 2005·8 cites·21 claims
- 2361US7961298B2Polarization rotator and a crystalline-quartz plate for use in an optical imaging systemZEISS CARL SMT GMBH·Filed 2008·Granted Jun 14, 2011·1 cites·19 claims
- 2460US7180667B2Objective with fluoride crystal lensesZEISS CARL SMT AG·Filed 2004·Granted Feb 20, 2007·4 cites·56 claims
- 2557US10088754B2Illumination system for microlithographyZEISS CARL SMT GMBH·Filed 2017·Granted Oct 2, 2018·0 cites·19 claims
- 2657US9341953B2Microlithographic illumination systemZEISS CARL SMT GMBH·Filed 2014·Granted May 17, 2016·0 cites·25 claims
- 2757US8411251B2Optical element and illumination optics for microlithographyGERHARD MICHAEL·Filed 2009·Granted Apr 2, 2013·1 cites·19 claims
- 2855US2007139636A1Polarization rotator and a crystalline-quartz plate for use in an optical imaging systemZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 2954US6842284B2Objective with lenses made of a crystalline materialZEISS CARL SMT AG·Filed 2003·Granted Jan 11, 2005·3 cites·11 claims
- 3053US7382536B2Objective with fluoride crystal lensesZEISS CARL SMT AG·Filed 2006·Granted Jun 3, 2008·0 cites·61 claims
- 3150US6836379B2Catadioptric objectiveZEISS CARL SMT AG·Filed 2002·Granted Dec 28, 2004·2 cites·20 claims
- 3249US11555783B2Method for detecting particles on the surface of an object, wafer, and mask blankZEISS CARL SMT GMBH·Filed 2019·Granted Jan 17, 2023·0 cites·17 claims
- 3349US2008055740A1Catadioptric projection objective with adaptive mirror and projection exposure methodZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 3448US2008049320A1Projection objective for microlithographyZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 3545US2004240073A1Polarization rotator and a crystalline-quartz plate for use in an optical imaging systemZEISS CARL SMT AG·Filed 2004·Application pending·0 cites
- 3642US9618387B2Method for determining the phase angle and/or the thickness of a contamination layer at an optical element and EUV lithography apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Apr 11, 2017·0 cites·6 claims
- 3729US9025131B2Optical beam deflecting element, illumination system including same, and related methodRUNDE DANIEL·Filed 2012·Granted May 5, 2015·0 cites·24 claims
Join the waitlist — get patent alerts
Get an alert when Michael Gerhard files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →