Inventor · disambiguated record
Minori Noguchi
Also filed as: NOGUCHI MINORI
113 granted patents·10 pending applications·3,378 citations·filing 1984–2019
99Inventor score
Files withHITACHI LTD51HITACHI HIGH TECH CORP37RENESAS TECH CORP6HAMAMATSU AKIRA5NISHIYAMA HIDETOSHI5
Top patents by PatentIndex Score
123 records- 0197US7248352B2Method for inspecting defect and apparatus for inspecting defectHITACHI HIGH TECH CORP·Filed 2003·Granted Jul 24, 2007·66 cites·4 claims
- 0297US7098055B2Apparatus and method for testing defectsHITACHI HIGH TECH CORP·Filed 2005·Granted Aug 29, 2006·36 cites·7 claims
- 0396US7940383B2Method of detecting defects on an objectHITACHI LTD·Filed 2009·Granted May 10, 2011·42 cites·20 claims
- 0496US7639350B2Apparatus and method for testing defectsHITACHI LTD·Filed 2007·Granted Dec 29, 2009·25 cites·20 claims
- 0596US6411377B1Optical apparatus for defect and particle size inspectionHITACHI LTD·Filed 1999·Granted Jun 25, 2002·174 cites·29 claims
- 0695US7369223B2Method of apparatus for detecting particles on a specimenHITACHI HIGH TECH CORP·Filed 2005·Granted May 6, 2008·25 cites·5 claims
- 0795US6797975B2Method and its apparatus for inspecting particles or defects of a semiconductor deviceHITACHI LTD·Filed 2001·Granted Sep 28, 2004·56 cites·6 claims
- 0895US6400454B1Apparatus and method for inspector defectsHITACHI LTD·Filed 2000·Granted Jun 4, 2002·67 cites·20 claims
- 0995US6229913B1Apparatus and methods for determining the three-dimensional shape of an object using active illumination and relative blurring in two-images due to defocusUNIV COLUMBIA·Filed 1995·Granted May 8, 2001·712 cites·51 claims
- 1094US7061602B2Method of inspecting a semiconductor device and an apparatus thereofHITACHI HIGH TECH CORP·Filed 2005·Granted Jun 13, 2006·18 cites·13 claims
- 1194US5274434AMethod and apparatus for inspecting foreign particles on real time basis in semiconductor mass production lineHITACHI LTD·Filed 1991·Granted Dec 28, 1993·218 cites·20 claims
- 1294US4615620AApparatus for measuring the depth of fine engraved patternsHITACHI LTD·Filed 1984·Granted Oct 7, 1986·56 cites·13 claims
- 1393US8319960B2Defect inspection systemAIKO KENJI·Filed 2010·Granted Nov 27, 2012·19 cites·12 claims
- 1493US7443496B2Apparatus and method for testing defectsHITACHI LTD·Filed 2007·Granted Oct 28, 2008·16 cites·15 claims
- 1593US7315366B2Apparatus and method for inspecting defectsHITACHI LTD·Filed 2007·Granted Jan 1, 2008·17 cites·5 claims
- 1693US5463459AMethod and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication processHITACHI LTD·Filed 1993·Granted Oct 31, 1995·145 cites·39 claims
- 1792US8013989B2Defects inspecting apparatus and defects inspecting methodHITACHI HIGH TECH CORP·Filed 2010·Granted Sep 6, 2011·7 cites·16 claims
- 1892US7037735B2Apparatus and method for testing defectsHITACHI HIGH TECH CORP·Filed 2002·Granted May 2, 2006·43 cites·18 claims
- 1992US6753972B1Thin film thickness measuring method and apparatus, and method and apparatus for manufacturing a thin film device using the sameHITACHI LTD·Filed 1999·Granted Jun 22, 2004·87 cites·22 claims
- 2092US5329333AExposure apparatus and methodHITACHI LTD·Filed 1992·Granted Jul 12, 1994·45 cites·48 claims
- 2191US7692779B2Apparatus and method for testing defectsHITACHI LTD·Filed 2005·Granted Apr 6, 2010·12 cites·20 claims
- 2291US7535561B2Defect inspecting apparatusHITACHI HIGH TECH CORP·Filed 2007·Granted May 19, 2009·14 cites·2 claims
- 2391US7417723B2Method of inspecting a semiconductor device and an apparatus thereofHITACHI LTD·Filed 2006·Granted Aug 26, 2008·10 cites·12 claims
- 2491US7262425B2Method and its apparatus for inspecting particles or defects of a semiconductor deviceHITACHI HIGH TECH CORP·Filed 2005·Granted Aug 28, 2007·13 cites·18 claims
- 2591US7231079B2Method and system for inspecting electronic circuit patternHITACHI LTD·Filed 2002·Granted Jun 12, 2007·44 cites·27 claims
- 2691US7177020B2Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication processRENESAS TECH CORP·Filed 2005·Granted Feb 13, 2007·15 cites·19 claims
- 2791US6936835B2Method and its apparatus for inspecting particles or defects of a semiconductor deviceHITACHI LTD·Filed 2002·Granted Aug 30, 2005·34 cites·22 claims
- 2891US6894302B2Surface inspection apparatus and method thereofHITACHI HIGH TECH ELECT ENG CO·Filed 2001·Granted May 17, 2005·35 cites·7 claims
- 2991US4952058AMethod and apparatus for detecting abnormal patternsHITACHI LTD·Filed 1988·Granted Aug 28, 1990·61 cites·24 claims
- 3090US6888959B2Method of inspecting a semiconductor device and an apparatus thereofHITACHI HIGH TECH ELECT ENG CO·Filed 2001·Granted May 3, 2005·38 cites·20 claims
- 3190US6731384B2Apparatus for detecting foreign particle and defect and the same methodHITACHI LTD·Filed 2001·Granted May 4, 2004·44 cites·18 claims
- 3290US5233191AMethod and apparatus of inspecting foreign matters during mass production start-up and mass production line in semiconductor production processHITACHI LTD·Filed 1991·Granted Aug 3, 1993·145 cites·14 claims
- 3389US7242016B2Surface inspection apparatus and method thereofHITACHI HIGH TECH CORP·Filed 2005·Granted Jul 10, 2007·11 cites·15 claims
- 3489US6485891B1Exposure apparatus and methodHITACHI LTD·Filed 2000·Granted Nov 26, 2002·21 cites·23 claims
- 3589US5333495AMethod and apparatus for processing a minute portion of a specimenHITACHI LTD·Filed 1993·Granted Aug 2, 1994·76 cites·8 claims
- 3688US7417244B2Surface inspection apparatus and method thereofHITACHI LTD·Filed 2007·Granted Aug 26, 2008·9 cites·18 claims
- 3788US6897956B2Apparatus and method for measuring alignment accuracy, as well as method and system for manufacturing semiconductor deviceHITACHI HIGH TECH ELECT ENG CO·Filed 2002·Granted May 24, 2005·37 cites·21 claims
- 3888US6841403B2Method for manufacturing semiconductor devices and method and its apparatus for processing detected defect dataHITACHI LTD·Filed 2003·Granted Jan 11, 2005·35 cites·17 claims
- 3988US6597448B1Apparatus and method of inspecting foreign particle or defect on a sampleHITACHI LTD·Filed 2000·Granted Jul 22, 2003·44 cites·20 claims
- 4088US5302999AIllumination method, illumination apparatus and projection exposure apparatusHITACHI LTD·Filed 1993·Granted Apr 12, 1994·91 cites·32 claims
- 4187US7417721B2Defect detector and defect detecting methodHITACHI LTD·Filed 2003·Granted Aug 26, 2008·20 cites·21 claims
- 4287US7187438B2Apparatus and method for inspecting defectsHITACHI LTD·Filed 2002·Granted Mar 6, 2007·25 cites·24 claims
- 4387US5098191AMethod of inspecting reticles and apparatus thereforHITACHI LTD·Filed 1989·Granted Mar 24, 1992·57 cites·18 claims
- 4486US8274651B2Method of inspecting a semiconductor device and an apparatus thereofHAMAMATSU AKIRA·Filed 2011·Granted Sep 25, 2012·3 cites·14 claims
- 4586US7115892B2Method and its apparatus for inspecting particles or defects of a semiconductor deviceHITACHI HIGH TECH CORP·Filed 2005·Granted Oct 3, 2006·7 cites·5 claims
- 4686US5214282AMethod and apparatus for processing a minute portion of a specimenHITACHI LTD·Filed 1991·Granted May 25, 1993·58 cites·69 claims
- 4785US7643139B2Method and apparatus for detecting defectsHITACHI HIGH TECH CORP·Filed 2005·Granted Jan 5, 2010·8 cites·6 claims
- 4885US7643138B2Method of inspecting a semiconductor device and an apparatus thereofHITACHI LTD·Filed 2008·Granted Jan 5, 2010·5 cites·12 claims
- 4985US7511806B2Apparatus and method for inspecting defectsHITACHI LTD·Filed 2007·Granted Mar 31, 2009·7 cites·18 claims
- 5085US7277155B2Exposure apparatus and methodRENESAS TECH CORP·Filed 2005·Granted Oct 2, 2007·4 cites·11 claims
Showing the top 50 of 123 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →