Inventor · disambiguated record
Michel Puech
Also filed as: PUECH MICHEL
12 granted patents·11 pending applications·218 citations·filing 1998–2016
91Inventor score
Top patents by PatentIndex Score
23 records- 0190US6644931B2System for pumping low thermal conductivity gasesCIT ALCATEL·Filed 2002·Granted Nov 11, 2003·37 cites·9 claims
- 0270US6431113B1Plasma vacuum substrate treatment process and systemCIT ALCATEL·Filed 2000·Granted Aug 13, 2002·12 cites·12 claims
- 0368US7938907B2Device for fabricating a mask by plasma etching a semiconductor substrateCIT ALCATEL·Filed 2005·Granted May 10, 2011·3 cites·15 claims
- 0466US7793685B2Controlling gas partial pressures for process optimizationCIT ALCATEL·Filed 2005·Granted Sep 14, 2010·4 cites·20 claims
- 0565US8297311B2Controlling gas partial pressures for process optimizationDESBIOLLES JEAN-PIERRE·Filed 2010·Granted Oct 30, 2012·3 cites·19 claims
- 0655US6837855B1Use of an ultrasonic transducer for echographic exploration of human or animal body tissues or organs in particular of the eyeball posterior segmentFiled 1998·Granted Jan 4, 2005·70 cites·35 claims
- 0754US6224326B1Method and apparatus for preventing deposits from forming in a turbomolecular pump having magnetic or gas bearingsCIT ALCATEL·Filed 1999·Granted May 1, 2001·28 cites·10 claims
- 0853US2006189165A1Method and apparatus for non-aggressive plasma-enhanced vapor deposition of dielectric filmsCIT ALCATEL·Filed 2006·Application pending·0 cites
- 0951US6383938B2Method of anisotropic etching of substratesCIT ALCATEL·Filed 1999·Granted May 7, 2002·17 cites·13 claims
- 1047US7892980B2Apparatus and a method for controlling the depth of etching during alternating plasma etching of semiconductor substratesTEGAL CORP·Filed 2005·Granted Feb 22, 2011·0 cites·19 claims
- 1146US7056842B2Method and apparatus for non-aggressive plasma-enhanced vapor deposition of dielectric filmsCIT ALCATEL·Filed 2004·Granted Jun 6, 2006·0 cites·3 claims
- 1245US6949071B1Method for exploring and displaying tissue of human or animal origin from a high frequency ultrasound probeCENTRE NAT RECH SCIENT·Filed 1999·Granted Sep 27, 2005·44 cites·11 claims
- 1345US2005251043A1Method for exploring and displaying tissues fo human or animal origin from a high frequency ultrasound probeCENTRE NAT RECH SCIENT·Filed 2005·Application pending·0 cites
- 1444US2005124894A1Use of an ultrasonic transducer for echographic exploration of human or animal body tissues or organs in particular of the eyeball posterior segmentFiled 2004·Application pending·0 cites
- 1543US2011120648A1Apparatus and a method for controlling the depth of etching during alternating plasma etching of semiconductor substratesTEGAL CORP·Filed 2011·Application pending·0 cites
- 1643US2007197039A1Anisotropic etching methodALCATEL LUCENT·Filed 2007·Application pending·0 cites
- 1741US10578512B2Leak detector and method for detecting leaksPFEIFFER VACUUM·Filed 2016·Granted Mar 3, 2020·0 cites·11 claims
- 1840US2006051893A1Thin substrate supportCIT ALCATEL·Filed 2005·Application pending·0 cites
- 1940US2002168467A1Plasma vacuum substrate treatment process and systemCIT ALCATEL·Filed 2002·Application pending·0 cites
- 2038US2005224178A1Heating jacket for plasma etching reactor, and etching method using samePUECH MICHEL·Filed 2003·Application pending·0 cites
- 2138US2006060566A1Method and device for substrate etching with very high power inductively coupled plasmaPUECH MICHEL·Filed 2003·Application pending·0 cites
- 2236US2005103749A1Method and device for anisotropic etching of high aspect ratioFiled 2002·Application pending·0 cites
- 2333US2002179246A1Removable shield arrangement for ICP-RIE reactorsCIT ALCATEL·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →