Inventor · disambiguated record
Michael Jozef Mathijs Renkens
Also filed as: RENKENS MICHAEL JOZEF MATHIJS
19 granted patents·1 pending application·201 citations·filing 2004–2023
92Inventor score
Files withASML NETHERLANDS BV15BUTLER HANS2DE SCHIFFART CATHARINUS1KOEVOETS ADRIANUS HENDRIK1PEETERS FELIX GODFRIED PETER1
Top patents by PatentIndex Score
20 records- 0193US7102729B2Lithographic apparatus, measurement system, and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Sep 5, 2006·158 cites·10 claims
- 0286US11635696B2Imprint lithographyASML NETHERLANDS BV·Filed 2020·Granted Apr 25, 2023·1 cites·20 claims
- 0384US12147162B2Imprint lithographyASML NETHERLANDS BV·Filed 2023·Granted Nov 19, 2024·0 cites·20 claims
- 0483US10580545B2Beam delivery apparatus and methodASML NETHERLANDS BV·Filed 2014·Granted Mar 3, 2020·6 cites·38 claims
- 0583US7554105B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Jun 30, 2009·6 cites·22 claims
- 0681US8144310B2Positioning system, lithographic apparatus and device manufacturing methodBUTLER HANS·Filed 2009·Granted Mar 27, 2012·5 cites·17 claims
- 0781US7119886B2Lithographic apparatus, device manufacturing method, and angular encoderASML NETHERLANDS BV·Filed 2004·Granted Oct 10, 2006·19 cites·21 claims
- 0875US10908510B2Imprint lithographyASML NETHERLANDS BV·Filed 2019·Granted Feb 2, 2021·0 cites·20 claims
- 0975US9864279B2Imprint lithographyDE SCHIFFART CATHARINUS·Filed 2011·Granted Jan 9, 2018·2 cites·21 claims
- 1074US10168621B2Radiation beam apparatusASML NETHERLANDS BV·Filed 2015·Granted Jan 1, 2019·2 cites·21 claims
- 1171US10216101B2ReflectorASML NETHERLANDS BV·Filed 2015·Granted Feb 26, 2019·1 cites·19 claims
- 1269US10890851B2Imprint lithographyASML NETHERLANDS BV·Filed 2017·Granted Jan 12, 2021·0 cites·20 claims
- 1369US9122173B2Positioning system, lithographic apparatus and device manufacturing methodBUTLER HANS·Filed 2012·Granted Sep 1, 2015·1 cites·16 claims
- 1456US10712678B2Imprint lithography apparatus and methodASML NETHERLANDS BV·Filed 2016·Granted Jul 14, 2020·0 cites·9 claims
- 1551US2011001254A1Imprint Lithography Apparatus and MethodASML NETHERLANDS BV·Filed 2010·Application pending·0 cites
- 1648US7426015B2Device manufacturing method and lithographic apparatusASML NETHERLANDS BV·Filed 2007·Granted Sep 16, 2008·0 cites·31 claims
- 1745US9952513B2UndulatorASML NETHERLANDS BV·Filed 2015·Granted Apr 24, 2018·0 cites·20 claims
- 1845US9606458B2Method for calibration of an encoder scale and a lithographic apparatusASML NETHERLANDS BV·Filed 2013·Granted Mar 28, 2017·0 cites·14 claims
- 1940US9310700B2Lithography method and apparatusKOEVOETS ADRIANUS HENDRIK·Filed 2011·Granted Apr 12, 2016·0 cites·20 claims
- 2040US9304401B2Measurement of the position of a radiation beam spot in lithographyPEETERS FELIX GODFRIED PETER·Filed 2012·Granted Apr 5, 2016·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →