Inventor · disambiguated record
Munehito Kagaya
Also filed as: KAGAYA MUNEHITO
14 granted patents·13 pending applications·110 citations·filing 2014–2024
86Inventor score
Files withTOKYO ELECTRON LTD27
Top patents by PatentIndex Score
27 records- 0196US9822009B2Method for producing grapheneTOKYO ELECTRON LTD·Filed 2015·Granted Nov 21, 2017·106 cites·4 claims
- 0286US12374543B2Recess filling method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jul 29, 2025·1 cites·20 claims
- 0376US12482635B2Plasma processing device, and plasma processing methodTOKYO ELECTRON LTD·Filed 2024·Granted Nov 25, 2025·0 cites·12 claims
- 0476US9702039B2Graphene forming methodTOKYO ELECTRON LTD·Filed 2015·Granted Jul 11, 2017·2 cites·4 claims
- 0569US12344933B2SiN film embedding methodTOKYO ELECTRON LTD·Filed 2021·Granted Jul 1, 2025·0 cites·18 claims
- 0667US10643839B2Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2017·Granted May 5, 2020·1 cites·20 claims
- 0760US2025118550A1Substrate-processing method and substrate-processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0859US12020900B2Plasma processing device, and plasma processing methodTOKYO ELECTRON LTD·Filed 2020·Granted Jun 25, 2024·0 cites·10 claims
- 0957US2024175121A1Film forming method, processing apparatus, and processing systemTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1056US2025067556A1Method of measuring film thickness, and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1155US2021301402A1Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 1252US12312683B2Substrate processing method and substrate processing deviceTOKYO ELECTRON LTD·Filed 2020·Granted May 27, 2025·0 cites·17 claims
- 1352US11626330B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Apr 11, 2023·0 cites·13 claims
- 1452US2025343041A1Substrate-processing method and substrate-processing systemTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1550US11996296B2Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2021·Granted May 28, 2024·0 cites·16 claims
- 1649US2025179625A1Method of forming silicon nitride film and film forming apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1748US2017268103A1Method for forming base film of graphene, graphene forming method, and apparatus for forming base film of grapheneTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 1848US2018155830A1Gas supply and exhaust structureTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 1946US12331403B2Substrate processing method and substrate processing deviceTOKYO ELECTRON LTD·Filed 2020·Granted Jun 17, 2025·0 cites·12 claims
- 2045US2024371631A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 2144US2024087885A1Method of forming silicon nitride film and film forming apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 2244US2022403515A1Substrate treatment method and substrate treatment deviceTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 2342US11658008B2Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2019·Granted May 23, 2023·0 cites·7 claims
- 2440US10378104B2Process for producing carbon nanotubes and method for forming wiringTOKYO ELECTRON LTD·Filed 2016·Granted Aug 13, 2019·0 cites·13 claims
- 2540US10121680B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Nov 6, 2018·0 cites·5 claims
- 2640US2021217609A1Method or apparatus for forming thin film on substrate employing atomic layer epitaxy methodTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 2735US2016118589A1Organic Semiconductor Film, Method for Manufacturing Same, and Transistor StructureTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →