Inventor · disambiguated record
Nadav Gutman
Also filed as: GUTMAN NADAV
30 granted patents·2 pending applications·67 citations·filing 2015–2024
95Inventor score
Top patents by PatentIndex Score
32 records- 0194US11209737B1Performance optimized scanning sequence for eBeam metrology and inspectionKLA CORP·Filed 2020·Granted Dec 28, 2021·5 cites·24 claims
- 0294US10473460B2Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signalsKLA TENCOR CORP·Filed 2018·Granted Nov 12, 2019·20 cites·35 claims
- 0393US10533848B2Metrology and control of overlay and edge placement errorsKLA TENCOR CORP·Filed 2018·Granted Jan 14, 2020·5 cites·42 claims
- 0492US12001148B2Enhancing performance of overlay metrologyKLA CORP·Filed 2023·Granted Jun 4, 2024·2 cites·26 claims
- 0592US11862524B2Overlay mark design for electron beam overlayKLA CORP·Filed 2021·Granted Jan 2, 2024·2 cites·20 claims
- 0690US11698251B2Methods and systems for overlay measurement based on soft X-ray ScatterometryKLA CORP·Filed 2020·Granted Jul 11, 2023·2 cites·22 claims
- 0790US11353321B2Metrology system and method for measuring diagonal diffraction-based overlay targetsKLA CORP·Filed 2020·Granted Jun 7, 2022·2 cites·23 claims
- 0890US10474040B2Systems and methods for device-correlated overlay metrologyKLA TENCOR CORP·Filed 2018·Granted Nov 12, 2019·4 cites·36 claims
- 0989US9934353B2Focus measurements using scatterometry metrologyKLA TENCOR CORP·Filed 2015·Granted Apr 3, 2018·5 cites·22 claims
- 1087US11409205B2Non-orthogonal target and method for using the same in measuring misregistration of semiconductor devicesKLA CORP·Filed 2020·Granted Aug 9, 2022·2 cites·22 claims
- 1184US11085754B2Enhancing metrology target information contentKLA TENCOR CORP·Filed 2018·Granted Aug 10, 2021·2 cites·29 claims
- 1283US11592755B2Enhancing performance of overlay metrologyKLA CORP·Filed 2021·Granted Feb 28, 2023·1 cites·30 claims
- 1383US10622238B2Overlay measurement using phase and amplitude modelingKLA TENCOR CORP·Filed 2018·Granted Apr 14, 2020·4 cites·17 claims
- 1481US9841689B1Approach for model calibration used for focus and dose measurementKLA TENCOR CORP·Filed 2015·Granted Dec 12, 2017·2 cites·17 claims
- 1580US12055859B2Overlay mark design for electron beam overlayKLA CORP·Filed 2023·Granted Aug 6, 2024·0 cites·15 claims
- 1679US10684563B2On the fly target acquisitionKLA TENCOR CORP·Filed 2018·Granted Jun 16, 2020·3 cites·19 claims
- 1776US10897566B2Direct focusing with image binning in metrology toolsKLA TENCOR CORP·Filed 2017·Granted Jan 19, 2021·3 cites·16 claims
- 1874US12100574B2Target and algorithm to measure overlay by modeling back scattering electrons on overlapping structuresKLA CORP·Filed 2020·Granted Sep 24, 2024·1 cites·9 claims
- 1971US10197922B2Focus metrology and targets which utilize transformations based on aerial images of the targetsKLA TENCOR CORP·Filed 2016·Granted Feb 5, 2019·1 cites·20 claims
- 2070US11703767B2Overlay mark design for electron beam overlayKLA CORP·Filed 2021·Granted Jul 18, 2023·0 cites·10 claims
- 2170US10768533B2Method and system for generating programmed defects for use in metrology measurementsKLA TENCOR CORP·Filed 2017·Granted Sep 8, 2020·1 cites·38 claims
- 2265US12092966B2Device feature specific edge placement error (EPE)KLA CORP·Filed 2023·Granted Sep 17, 2024·0 cites·32 claims
- 2362US2025369754A1System and method for multi-merit adaptive sampling in overlay metrologyKLA CORP·Filed 2024·Application pending·0 cites
- 2459US12423803B2Predicting tool induced shift using Moiré overlay targetsKLA CORP·Filed 2024·Granted Sep 23, 2025·0 cites·35 claims
- 2559US2024094639A1High-resolution evaluation of optical metrology targets for process controlKLA CORP·Filed 2022·Application pending·0 cites
- 2656US11720031B2Overlay design for electron beam and scatterometry overlay measurementsKLA CORP·Filed 2021·Granted Aug 8, 2023·0 cites·12 claims
- 2752US10866090B2Estimating amplitude and phase asymmetry in imaging technology for achieving high accuracy in overlay metrologyKLA TENCOR CORP·Filed 2018·Granted Dec 15, 2020·0 cites·14 claims
- 2850US11075126B2Misregistration measurements using combined optical and electron beam technologyKLA TENCOR CORP·Filed 2019·Granted Jul 27, 2021·0 cites·20 claims
- 2949US11637030B2Multi-stage, multi-zone substrate positioning systemsKLA CORP·Filed 2020·Granted Apr 25, 2023·0 cites·28 claims
- 3043US10565697B2Utilizing overlay misregistration error estimations in imaging overlay metrologyKLA TENCOR CORP·Filed 2017·Granted Feb 18, 2020·0 cites·22 claims
- 3140US10504802B2Target location in semiconductor manufacturingKLA TENCOR CORP·Filed 2017·Granted Dec 10, 2019·0 cites·20 claims
- 3239US10379449B2Identifying process variations during product manufactureKLA TENCOR CORP·Filed 2018·Granted Aug 13, 2019·0 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →