Inventor · disambiguated record
Naotsugu Hoshi
Also filed as: HOSHI NAOTSUGU
8 granted patents·7 citations·filing 2006–2018
77Inventor score
Top patents by PatentIndex Score
8 records- 0171US11251052B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Feb 15, 2022·2 cites·11 claims
- 0269US7799703B2Processing method and storage mediumTOKYO ELECTRON LTD·Filed 2008·Granted Sep 21, 2010·3 cites·5 claims
- 0361US7964511B2Plasma ashing methodTOKYO ELECTRON LTD·Filed 2006·Granted Jun 21, 2011·1 cites·14 claims
- 0459US8252694B2Plasma etching method and storage mediumHOSHI NAOTSUGU·Filed 2008·Granted Aug 28, 2012·1 cites·8 claims
- 0547US8404596B2Plasma ashing methodTAHARA SHIGERU·Filed 2011·Granted Mar 26, 2013·0 cites·29 claims
- 0646US9130018B2Plasma etching method and storage mediumHOSHI NAOTSUGU·Filed 2012·Granted Sep 8, 2015·0 cites·3 claims
- 0743US9384999B2Plasma etching method and storage mediumHOSHI NAOTSUGU·Filed 2008·Granted Jul 5, 2016·0 cites·6 claims
- 0839US10316835B2Method of determining output flow rate of gas output by flow rate controller of substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Jun 11, 2019·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →