Inventor · disambiguated record
Naoki Mihara
Also filed as: MIHARA NAOKI
11 granted patents·9 pending applications·9 citations·filing 2004–2024
82Inventor score
Top patents by PatentIndex Score
20 records- 0175US9048070B2Dielectric window for plasma treatment device, and plasma treatment deviceTOKYO ELECTRON LTD·Filed 2012·Granted Jun 2, 2015·3 cites·10 claims
- 0267US9111726B2Plasma processing apparatusMOYAMA KAZUKI·Filed 2012·Granted Aug 18, 2015·2 cites·12 claims
- 0363US10312057B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Jun 4, 2019·1 cites·5 claims
- 0461US2024297054A1Substrate processing apparatus, substrate processing system, electrical power supply system, and electrical power supply methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0561US2023147719A1Medical information processing apparatus and medical information processing systemCANON MEDICAL SYSTEMS CORP·Filed 2022·Application pending·0 cites
- 0660US2024290577A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0758US2024071734A1Lower electrode mechanism and substrate processing methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0858US2024055235A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0957US10319568B2Plasma processing apparatus for performing plasma process for target objectTOKYO ELECTRON LTD·Filed 2014·Granted Jun 11, 2019·1 cites·6 claims
- 1054US10062547B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Aug 28, 2018·0 cites·9 claims
- 1153US2011186226A1Gas supply member, plasma processing apparatus, and method of manufacturing the gas supply memberTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1250US11543807B2Mounting state informing apparatus and mounting state informing methodTOKYO ELECTRON LTD·Filed 2019·Granted Jan 3, 2023·0 cites·16 claims
- 1344US7374646B2Electrolytic processing apparatus and substrate processing methodEBARA CORP·Filed 2004·Granted May 20, 2008·2 cites·2 claims
- 1442US9277637B2Apparatus for plasma treatment and method for plasma treatmentNOZAWA TOSHIHISA·Filed 2011·Granted Mar 1, 2016·0 cites·19 claims
- 1541US8920596B2Plasma processing apparatusMIHARA NAOKI·Filed 2010·Granted Dec 30, 2014·0 cites·8 claims
- 1640US2015155139A1Dielectric window, antenna and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1739US9324542B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Apr 26, 2016·0 cites·4 claims
- 1838US2012241090A1Plasma processing apparatusYOSHIKAWA JUN·Filed 2012·Application pending·0 cites
- 1933US8663424B2Plasma processing apparatus and gas supply member support deviceMIHARA NAOKI·Filed 2011·Granted Mar 4, 2014·0 cites·7 claims
- 2031US2015294839A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →