Inventor · disambiguated record
Naoki Tamaoki
Also filed as: TAMAOKI NAOKI
11 granted patents·9 pending applications·236 citations·filing 1995–2016
89Inventor score
Top patents by PatentIndex Score
20 records- 0196US7192626B2Methods for producing silicon nitride films and silicon oxynitride films by thermal chemical vapor depositionAIR LIQUIDE·Filed 2003·Granted Mar 20, 2007·115 cites·16 claims
- 0295US8821684B2Substrate plasma processing apparatus and plasma processing methodUI AKIO·Filed 2009·Granted Sep 2, 2014·52 cites·5 claims
- 0370US8209155B2Simulation method and simulation programICHIKAWA TAKASHI·Filed 2008·Granted Jun 26, 2012·5 cites·18 claims
- 0469US8548787B2Simulating a chemical reaction phenomenon in a semiconductor processTAMAOKI NAOKI·Filed 2006·Granted Oct 1, 2013·2 cites·9 claims
- 0561US8252193B2Plasma processing apparatus of substrate and plasma processing method thereofUI AKIO·Filed 2008·Granted Aug 28, 2012·1 cites·9 claims
- 0658US6022806AMethod of forming a film in recess by vapor phase growthTOSHIBA KK·Filed 1995·Granted Feb 8, 2000·29 cites·17 claims
- 0757US6365231B2Ammonium halide eliminator, chemical vapor deposition system and chemical vapor deposition processTOSHIBA KK·Filed 1999·Granted Apr 2, 2002·19 cites·8 claims
- 0856US2014087483A1Manufacturing method of magnetoresistive effect element and manufacturing apparatus of magnetoresistive effect elementTOSHIBA KK·Filed 2013·Application pending·0 cites
- 0955US2013220377A1Method of cleaning a film-forming apparatusAIR LIQUIDE US·Filed 2013·Application pending·0 cites
- 1053US2016380189A1Manufacturing method of magnetoresistive effect element and manufacturing apparatus of magnetoresistive effect elementTOSHIBA KK·Filed 2016·Application pending·0 cites
- 1151US2007134433A1Methods for producing silicon nitride films and silicon oxynitride films by thermal chemical vapor depositionDUSSARRAT CHRISTIAN·Filed 2007·Application pending·0 cites
- 1249US10460050B2Topography simulation apparatus, topography simulation method, and topography simulation programTOSHIBA MEMORY CORP·Filed 2016·Granted Oct 29, 2019·0 cites·18 claims
- 1348US7942974B2Method of cleaning a film-forming apparatusTOSHIBA KK·Filed 2005·Granted May 17, 2011·0 cites·17 claims
- 1446US2009048813A1Simulation method and simulation programICHIKAWA TAKASHI·Filed 2008·Application pending·0 cites
- 1543US2005082002A1Method of cleaning a film-forming apparatus and film-forming apparatusFiled 2004·Application pending·0 cites
- 1643US2006216875A1Method for annealing and method for manufacturing a semiconductor deviceITO TAKAYUKI·Filed 2006·Application pending·0 cites
- 1742US2015205890A1Topography simulation apparatus, topography simulation method and recording mediumTOSHIBA KK·Filed 2014·Application pending·0 cites
- 1839US2006198958A1Methods for producing silicon nitride films by vapor-phase growthDUSSARRAT CHRISTIAN·Filed 2004·Application pending·0 cites
- 1938US5926402ASimulation method with respect to trace object that event occurs in proportion to probability and computer program product for causing computer system to perform the simulationTOSHIBA KK·Filed 1997·Granted Jul 20, 1999·13 cites·24 claims
- 2036US9996639B2Topography simulation apparatus, topography simulation method and recording mediumTOSHIBA MEMORY CORP·Filed 2015·Granted Jun 12, 2018·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →