Inventor · disambiguated record
Nicolas Blasco
Also filed as: BLASCO NICOLAS
36 granted patents·6 pending applications·643 citations·filing 2006–2023
96Inventor score
Files withAIR LIQUIDE26AIR LIQUIDE AMERICAN3BLASCO NICOLAS3L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude3DUSSARRAT CHRISTIAN2
Top patents by PatentIndex Score
42 records- 0197US8668957B2Method of forming dielectric films, new precursors and their use in semiconductor manufacturingDUSSARRAT CHRISTIAN·Filed 2007·Granted Mar 11, 2014·535 cites·22 claims
- 0296US9911590B2Methods of forming dielectric films, new precursors and their use in semiconductor manufacturingAIR LIQUIDE·Filed 2017·Granted Mar 6, 2018·14 cites·26 claims
- 0395US11066310B2Tungsten pentachloride conditioning and crystalline phase manipulationAIR LIQUIDE·Filed 2020·Granted Jul 20, 2021·3 cites·4 claims
- 0495US10384944B2Preparation of Si—H containing iodosilanes via halide exchange reactionAIR LIQUIDE·Filed 2017·Granted Aug 20, 2019·10 cites·10 claims
- 0592US8399056B2Method of forming high-k dielectric films based on novel titanium, zirconium, and hafnium precursors and their use for semiconductor manufacturingBLASCO NICOLAS·Filed 2006·Granted Mar 19, 2013·15 cites·16 claims
- 0691US11673904B1Low pressure process for synthesis of Pt(PF3)4 involving a soluble intermediate and storage of obtained Pt(PF3)4AIR LIQUIDE·Filed 2021·Granted Jun 13, 2023·1 cites·28 claims
- 0791US8470402B2Method of depositing a metal-containing dielectric filmDUSSARRAT CHRISTIAN·Filed 2011·Granted Jun 25, 2013·10 cites·25 claims
- 0890US8853075B2Method for forming a titanium-containing layer on a substrate using an atomic layer deposition (ALD) processGATINEAU SATOKO·Filed 2009·Granted Oct 7, 2014·14 cites·20 claims
- 0989US10899630B2Tungsten pentachloride conditioning and crystalline phase manipulationAIR LIQUIDE·Filed 2018·Granted Jan 26, 2021·2 cites·14 claims
- 1088US10584039B2Titanium-containing film forming compositions for vapor deposition of titanium-containing filmsAIR LIQUIDE·Filed 2017·Granted Mar 10, 2020·2 cites·17 claims
- 1187US8343860B1High C content molecules for C implantAIR LIQUIDE·Filed 2011·Granted Jan 1, 2013·8 cites·9 claims
- 1285US12304922B1Low pressure process for synthesis of Pt(PF3)4 involving a soluble intermediate and storage of obtained Pt(PF3)4AIR LIQUIDE·Filed 2023·Granted May 20, 2025·0 cites·30 claims
- 1385US10710896B2Tungsten pentachloride conditioning and crystalline phase manipulationAIR LIQUIDE·Filed 2018·Granted Jul 14, 2020·3 cites·10 claims
- 1485US10689405B2Titanium-containing film forming compositions for vapor deposition of titanium-containing filmsAIR LIQUIDE·Filed 2018·Granted Jun 23, 2020·1 cites·13 claims
- 1583US8367531B1Aluminum implant using new compoundsAIR LIQUIDE·Filed 2011·Granted Feb 5, 2013·5 cites·9 claims
- 1681US11821080B2Reagents to remove oxygen from metal oxyhalide precursors in thin film deposition processesAIR LIQUIDE·Filed 2021·Granted Nov 21, 2023·1 cites·19 claims
- 1780US8460989B2Niobium and vanadium organometallic precursors for thin film depositionBLASCO NICOLAS·Filed 2009·Granted Jun 11, 2013·8 cites·16 claims
- 1878US10217629B2Method of forming dielectric films, new precursors and their use in semiconductor manufacturingAIR LIQUIDE·Filed 2018·Granted Feb 26, 2019·1 cites·20 claims
- 1977US11577967B2Tungsten pentachloride conditioning and crystalline phase manipulationAIR LIQUIDE·Filed 2020·Granted Feb 14, 2023·0 cites·4 claims
- 2077US10800661B2Preparation of Si-H containing iodosilanes via halide exchange reactionAIR LIQUIDE·Filed 2019·Granted Oct 13, 2020·0 cites·6 claims
- 2173US11168099B2Titanium-containing film forming compositions for vapor deposition of titanium-containing filmsAIR LIQUIDE·Filed 2020·Granted Nov 9, 2021·0 cites·15 claims
- 2273US9085823B2Method of forming a tantalum-containing layer on a substrateBLASCO NICOLAS·Filed 2009·Granted Jul 21, 2015·2 cites·16 claims
- 2371US9583335B2Method of forming dielectric films, new precursors and their use in semiconductor manufacturingL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2014·Granted Feb 28, 2017·1 cites·19 claims
- 2471US9040372B2Niobium and vanadium organometallic precursors for thin film depositionL AIR LIQUIDE SOCIÉTÉ ANONYME POUR L ETUDE ET L EXPL DES PROCÉDÉS GEORGES CLAUDE·Filed 2013·Granted May 26, 2015·3 cites·18 claims
- 2571US2020407228A1Preparation of si-h containing iodosilanes via halide exchange reactionAIR LIQUIDE·Filed 2020·Application pending·0 cites
- 2670US12497691B2Devices having a rare earth (oxy) fluoride coating for improved resistance to corrosive chemical environments and methods for making and using these devicesAIR LIQUIDE·Filed 2021·Granted Dec 16, 2025·0 cites·8 claims
- 2769US11806677B2Preprocessing method for solid material, and solid material product filled with solid material manufactured using said solid material preprocessing methodAIR LIQUIDE·Filed 2018·Granted Nov 7, 2023·1 cites·4 claims
- 2869US11021793B2Group 6 transition metal-containing compositions for vapor deposition of group 6 transition metal-containing filmsAIR LIQUIDE·Filed 2018·Granted Jun 1, 2021·0 cites·2 claims
- 2967US12173403B2Group 6 transition metal-containing compositions for vapor deposition of group 6 transition metal-containing filmsAIR LIQUIDE·Filed 2021·Granted Dec 24, 2024·0 cites·4 claims
- 3061US12187853B2Silicon-based self-assembling monolayer compositions and surface preparation using the sameAIR LIQUIDE AMERICAN·Filed 2021·Granted Jan 7, 2025·0 cites·12 claims
- 3160US9487860B2Method for forming cobalt containing filmsL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2014·Granted Nov 8, 2016·1 cites·5 claims
- 3259US8470401B2Use of group V metal containing precursors for a process of depositing a metal containing filmMERLE NICOLAS·Filed 2007·Granted Jun 25, 2013·2 cites·22 claims
- 3356US12404585B2Lithium precursors for deposition of lithium-containing layers, islets or clustersAIR LIQUIDE·Filed 2020·Granted Sep 2, 2025·0 cites·12 claims
- 3456US10053775B2Methods of using amino(bromo)silane precursors for ALD/CVD silicon-containing film applicationsAIR LIQUIDE AMERICAN·Filed 2015·Granted Aug 21, 2018·0 cites·20 claims
- 3556US2023311098A1The formation of catalyst pt nanodots by pulsed/sequential cvd or atomic layer depositionAIR LIQUIDE·Filed 2021·Application pending·0 cites
- 3652US2020208263A1Solid material container and solid material product with solid material filled in solid material containerAIR LIQUIDE·Filed 2018·Application pending·0 cites
- 3750US2020246494A1Lu-containing compositions and methods of producing the sameL'Air Liquide Société Anonyme pour I'Etude et I'Exploitation des Procédés Georges Claude·Filed 2018·Application pending·0 cites
- 3849US10648087B2Etching reactants and plasma-free etching processes using the sameAIR LIQUIDE·Filed 2016·Granted May 12, 2020·0 cites·16 claims
- 3945US9719167B2Cobalt-containing film forming compositions, their synthesis, and use in film depositionL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2015·Granted Aug 1, 2017·0 cites·20 claims
- 4044US2023274947A1Selective thermal etching methods of metal or metal-containing materials for semiconductor manufacturingAIR LIQUIDE AMERICAN·Filed 2021·Application pending·0 cites
- 4142US2016046408A1Internally coated vessel for housing a metal halideL AIR LIQUIDE SOCIÉTÉ ANONYME POUR L ETUDE ET L EXPL DES PROCÉDÉS GEORGES CLAUDE·Filed 2015·Application pending·0 cites
- 4241US11205573B2Ge-containing Co-film forming material, Ge-containing Co film and film forming method thereofAIR LIQUIDE·Filed 2018·Granted Dec 21, 2021·0 cites·22 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →