Inventor · disambiguated record
Nils Dieckmann
Also filed as: DIECKMANN NILS
16 granted patents·5 pending applications·162 citations·filing 2000–2012
92Inventor score
Top patents by PatentIndex Score
21 records- 0195US7847921B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodZEISS CARL SMT AG·Filed 2008·Granted Dec 7, 2010·30 cites·7 claims
- 0295US7408616B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodZEISS CARL SMT AG·Filed 2004·Granted Aug 5, 2008·70 cites·44 claims
- 0375US7329886B2EUV illumination system having a plurality of light sources for illuminating an optical elementZEISS CARL SMT AG·Filed 2004·Granted Feb 12, 2008·18 cites·41 claims
- 0473US6636367B2Projection exposure deviceZEISS STIFTUNG·Filed 2001·Granted Oct 21, 2003·14 cites·15 claims
- 0565US6985218B2Method of determining at least one parameter that is characteristic of the angular distribution of light illuminating an object in a projection exposure apparatusZEISS CARL SMT AG·Filed 2004·Granted Jan 10, 2006·8 cites·2 claims
- 0663US6936825B2Process for the decontamination of microlithographic projection exposure devicesZEISS CARL SMT AG·Filed 2001·Granted Aug 30, 2005·8 cites·21 claims
- 0762US7593095B2System for reducing the coherence of laser radiationZEISS CARL SMT AG·Filed 2005·Granted Sep 22, 2009·1 cites·49 claims
- 0861US8488104B2Projection objective with diaphragmsDIECKMANN NILS·Filed 2011·Granted Jul 16, 2013·1 cites·20 claims
- 0960US6707537B2Projection exposure systemZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Mar 16, 2004·6 cites·23 claims
- 1059US7808615B2Projection exposure apparatus and method for operating the sameZEISS CARL SMT AG·Filed 2006·Granted Oct 5, 2010·2 cites·18 claims
- 1154US6512780B1System for compensating directional and positional fluctuations in light produced by a laserZEISS STIFTUNG·Filed 2000·Granted Jan 28, 2003·4 cites·3 claims
- 1252US8169594B2Illumination system of a microlithographic projection exposure apparatusDIECKMANN NILS·Filed 2009·Granted May 1, 2012·0 cites·29 claims
- 1351US8767181B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodGRUNER TORALF·Filed 2010·Granted Jul 1, 2014·0 cites·19 claims
- 1450US9116441B2Illumination system of a microlithographic projection exposure apparatusDIECKMANN NILS·Filed 2012·Granted Aug 25, 2015·0 cites·20 claims
- 1547US8081293B2Illumination system of a microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2008·Granted Dec 20, 2011·0 cites·20 claims
- 1644US9274435B2Illumination system or projection objective of a microlithographic projection exposure apparatusDIECKMANN NILS·Filed 2009·Granted Mar 1, 2016·0 cites·36 claims
- 1743US2006290913A1Microlithography exposure method and projection exposure apparatus for carrying out the methodZEISS CARL SMT AG·Filed 2006·Application pending·0 cites
- 1841US2005117203A1Method for producing an optical element from a quartz substrateZEISS CARL SMT AG·Filed 2004·Application pending·0 cites
- 1941US2005094268A1Optical system with birefringent optical elementsZEISS CARL SMT AG·Filed 2004·Application pending·0 cites
- 2040US2004021843A1Method for producing an optical element from a quartz substrateZEISS CARL SMT AG·Filed 2003·Application pending·0 cites
- 2135US2006061886A1System for setting and maintaining a gas atmosphere in an optical systemGELLRICH BERNHARD·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →