Inventor · disambiguated record
Niels Vergeer
Also filed as: VERGEER NIELS
19 granted patents·3 pending applications·41 citations·filing 2010–2023
92Inventor score
Top patents by PatentIndex Score
22 records- 0190US9395635B2Position determination in a lithography system using a substrate having a partially reflective position markDE BOER GUIDO·Filed 2012·Granted Jul 19, 2016·7 cites·16 claims
- 0287US8570055B2Capacitive sensing systemDE BOER GUIDO·Filed 2010·Granted Oct 29, 2013·8 cites·20 claims
- 0385US8841920B2Capacitive sensing systemMAPPER LITHOGRAPHY IP BV·Filed 2013·Granted Sep 23, 2014·3 cites·29 claims
- 0484US10054863B2Method of determining a position of a substrate in a lithography system, substrate for use in such a method, and lithography system for carrying out such methodMAPPER LITHOGRAPHY IP BV·Filed 2015·Granted Aug 21, 2018·3 cites·28 claims
- 0581US9069265B2Interferometer moduleDE BOER GUIDO·Filed 2012·Granted Jun 30, 2015·4 cites·25 claims
- 0681US8638109B2Capacitive sensing system with differential pairsDE BOER GUIDO·Filed 2010·Granted Jan 28, 2014·4 cites·24 claims
- 0778US9261800B2Alignment of an interferometer module for use in an exposure toolDE BOER GUIDO·Filed 2012·Granted Feb 16, 2016·2 cites·18 claims
- 0871US9665014B2Charged particle lithography system with alignment sensor and beam measurement sensorMAPPER LITHOGRAPHY IP BV·Filed 2013·Granted May 30, 2017·2 cites·18 claims
- 0971US9484188B2Individual beam pattern placement verification in multiple beam lithographyMAPPER LITHOGRAPHY IP BV·Filed 2015·Granted Nov 1, 2016·1 cites·25 claims
- 1071US9383662B2Lithography system for processing at least a part of a targetVERGEER NIELS·Filed 2012·Granted Jul 5, 2016·3 cites·31 claims
- 1171US8513959B2Integrated sensor systemDE BOER GUIDO·Filed 2010·Granted Aug 20, 2013·1 cites·22 claims
- 1268US9201315B2Lithography system for processing a target, such as a wafer, a method for operating a lithography system for processing a target, such as a wafer and a substrate for use in such a lithography systemDE BOER GUIDO·Filed 2012·Granted Dec 1, 2015·2 cites·29 claims
- 1357US9760028B2Lithography system and method for processing a target, such as a waferMAPPER LITHOGRAPHY IP BV·Filed 2013·Granted Sep 12, 2017·0 cites·17 claims
- 1457US2023207259A1Alignment determination method and computer programASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1556US2025329511A1Electron-optical apparatus and method of obtaining topographical information about a sample surfaceASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1656US2017277043A1Lithography system with differential interferometer moduleMAPPER LITHOGRAPHY IP BV·Filed 2017·Application pending·0 cites
- 1755USRE49241ELithography system and method for processing a target, such as a waferASML NETHERLANDS BV·Filed 2013·Granted Oct 11, 2022·0 cites·27 claims
- 1855US9678443B2Lithography system with differential interferometer moduleDE BOER GUIDO·Filed 2012·Granted Jun 13, 2017·0 cites·42 claims
- 1955US9551563B2Multi-axis differential interferometerMAPPER LITHOGRAPHY IP BV·Filed 2013·Granted Jan 24, 2017·1 cites·19 claims
- 2054USRE49732ECharged particle lithography system with alignment sensor and beam measurement sensorASML NETHERLANDS BV·Filed 2013·Granted Nov 21, 2023·0 cites·30 claims
- 2152US9690215B2Interferometer moduleMAPPER LITHOGRAPHY IP BV·Filed 2015·Granted Jun 27, 2017·0 cites·22 claims
- 2246US9395636B2Lithography system for processing a target, such as a wafer, and a method for operating a lithography system for processing a target, such as a waferDE BOER GUIDO·Filed 2012·Granted Jul 19, 2016·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →