Inventor · disambiguated record
Noriaki Yagi
Also filed as: YAGI NORIAKI
49 granted patents·1 pending application·1,600 citations·filing 1989–2024
99Inventor score
Files withTOSHIBA KK38SEOUL SEMICONDUCTOR CO LTD5TOSHIBA SILICONE5ISHIGAMI TAKASHI1NOA LEADING CO LTD1
Top patents by PatentIndex Score
50 records- 0197US11721675B2White light source systemSEOUL SEMICONDUCTOR CO LTD·Filed 2022·Granted Aug 8, 2023·4 cites·20 claims
- 0297US5660917AThermal conductivity sheetTOSHIBA KK·Filed 1993·Granted Aug 26, 1997·219 cites·51 claims
- 0397US5503681AMethod of cleaning an objectTOSHIBA KK·Filed 1994·Granted Apr 2, 1996·106 cites·132 claims
- 0496US11094679B2White light source systemTOSHIBA KK·Filed 2020·Granted Aug 17, 2021·4 cites·14 claims
- 0596US6136766ACleaning compositionsTOSHIBA SILICONE·Filed 1995·Granted Oct 24, 2000·106 cites·12 claims
- 0696US5985810ACleaning compositionsTOSHIBA SILICONE·Filed 1995·Granted Nov 16, 1999·109 cites·29 claims
- 0796US5977040ACleaning compositionsTOSHIBA SILICONE·Filed 1995·Granted Nov 2, 1999·113 cites·19 claims
- 0895US12072069B2Method for using white light source, and white light sourceSEOUL SEMICONDUCTOR CO LTD·Filed 2023·Granted Aug 27, 2024·2 cites·26 claims
- 0995US11978726B2White light source systemSEOUL SEMICONDUCTOR CO LTD·Filed 2023·Granted May 7, 2024·2 cites·20 claims
- 1095US10231305B2White light source systemTOSHIBA KK·Filed 2017·Granted Mar 12, 2019·15 cites·28 claims
- 1194US5443747ACleaning compositionsTOSHIBA KK·Filed 1990·Granted Aug 22, 1995·65 cites·25 claims
- 1292US10375786B2White light source systemTOSHIBA KK·Filed 2019·Granted Aug 6, 2019·6 cites·12 claims
- 1392US5741365AContinuous method for cleaning industrial parts using a polyorganosiloxaneTOSHIBA KK·Filed 1995·Granted Apr 21, 1998·57 cites·54 claims
- 1492US5418071ASputtering target and method of manufacturing the sameTOSHIBA KK·Filed 1993·Granted May 23, 1995·67 cites·21 claims
- 1591US10674577B2White light source systemTOSHIBA KK·Filed 2019·Granted Jun 2, 2020·6 cites·24 claims
- 1690US5654115AHydrogen-absorbing alloy for battery, method of manufacturing the same, and secondary nickel-metal hydride batteryTOSHIBA KK·Filed 1995·Granted Aug 5, 1997·92 cites·26 claims
- 1789US5716456AMethod for cleaning an object with an agent including water and a polyorganosiloxaneTOSHIBA KK·Filed 1995·Granted Feb 10, 1998·42 cites·19 claims
- 1887US12482794B2White light source systemSEOUL SEMICONDUCTOR CO LTD·Filed 2024·Granted Nov 25, 2025·0 cites·20 claims
- 1987US10420183B2White light source and white light source systemTOSHIBA KK·Filed 2017·Granted Sep 17, 2019·6 cites·18 claims
- 2087US5769962ACleaning methodTOSHIBA KK·Filed 1995·Granted Jun 23, 1998·38 cites·16 claims
- 2187US5204057AHighly purified titanium material and its named article, a sputtering targetTOSHIBA KK·Filed 1992·Granted Apr 20, 1993·31 cites·5 claims
- 2286US6329275B1Interconnector line of thin film, sputter target for forming the wiring film and electronic component using the sameTOSHIBA KK·Filed 1996·Granted Dec 11, 2001·76 cites·6 claims
- 2383US5470527ATi-W sputtering target and method for manufacturing sameTOSHIBA KK·Filed 1994·Granted Nov 28, 1995·53 cites·14 claims
- 2483US5409517ASputtering target and method of manufacturing the sameTOSHIBA KK·Filed 1991·Granted Apr 25, 1995·44 cites·13 claims
- 2581US5302817AX-ray detector and X-ray examination system utilizing fluorescent materialTOSHIBA KK·Filed 1992·Granted Apr 12, 1994·53 cites·9 claims
- 2680US5196916AHighly purified metal material and sputtering target using the sameTOSHIBA KK·Filed 1991·Granted Mar 23, 1993·54 cites·36 claims
- 2779US5508000ASputtering target and method of manufacturing the sameTOSHIBA KK·Filed 1994·Granted Apr 16, 1996·26 cites·6 claims
- 2875US11430771B2White light source systemSEOUL SEMICONDUCTOR CO LTD·Filed 2021·Granted Aug 30, 2022·0 cites·15 claims
- 2970US5538024ACleaning method and cleaning apparatusTOSHIBA KK·Filed 1995·Granted Jul 23, 1996·15 cites·11 claims
- 3067US5612571ASputtered silicide filmTOSHIBA KK·Filed 1995·Granted Mar 18, 1997·18 cites·20 claims
- 3166US6352628B2Refractory metal silicide target, method of manufacturing the target, refractory metal silicide thin film, and semiconductor deviceTOSHIBA KK·Filed 2001·Granted Mar 5, 2002·8 cites·5 claims
- 3265US5458697AHighly purified metal material and sputtering target using the sameTOSHIBA KK·Filed 1994·Granted Oct 17, 1995·28 cites·23 claims
- 3364US5741367AMethod for drying parts using a polyorganosiloxaneTOSHIBA KK·Filed 1995·Granted Apr 21, 1998·12 cites·24 claims
- 3464US5584906AHighly purified titanium material, method for preparation of it and sputtering target using itTOSHIBA KK·Filed 1993·Granted Dec 17, 1996·10 cites·30 claims
- 3563US5679983AHighly purified metal material and sputtering target using the sameTOSHIBA KK·Filed 1995·Granted Oct 21, 1997·22 cites·3 claims
- 3662US5833761AMethod of cleaning an object including a cleaning step and a vapor drying stepTOSHIBA SILICONE·Filed 1995·Granted Nov 10, 1998·10 cites·12 claims
- 3761US6210634B1Highly purified titanium material, method for preparation of it and sputtering target using itTOSHIBA KK·Filed 1999·Granted Apr 3, 2001·10 cites·23 claims
- 3857US6309593B1Refractory metal silicide target, method of manufacturing the target, refractory metal silicide thin film, and semiconductor deviceTOSHIBA KK·Filed 1994·Granted Oct 30, 2001·15 cites·5 claims
- 3953US5086554AMethod of manufacturing a magnetic coreTOSHIBA KK·Filed 1990·Granted Feb 11, 1992·12 cites·18 claims
- 4052US5888312ACleaning methodTOSHIBA SILICONE·Filed 1995·Granted Mar 30, 1999·8 cites·25 claims
- 4149US5843372AHydrogen-absorbing alloy for battery, method of manufacturing the same, and secondary nickel-metal hydride batteryTOSHIBA KK·Filed 1996·Granted Dec 1, 1998·11 cites·6 claims
- 4248US5728228AMethod for removing residual liquid from parts using a polyorganosiloxaneTOSHIBA KK·Filed 1995·Granted Mar 17, 1998·4 cites·18 claims
- 4343US6400025B1Highly purified titanium material, method for preparation of it and sputtering target using itTOSHIBA KK·Filed 1999·Granted Jun 4, 2002·4 cites·14 claims
- 4442US2022130644A1Plasma processing apparatus, plasma processing method, and conductive memberNOA LEADING CO LTD·Filed 2020·Application pending·0 cites
- 4539USRE41975EInterconnector line of thin film, sputter target for forming the wiring film and electronic component using the sameTOSHIBA KK·Filed 1996·Granted Nov 30, 2010·6 cites·34 claims
- 4635US5772781AMethod for cleaning an object using an agent that includes a polyorganosiloxane or isoparaffinTOSHIBA KK·Filed 1995·Granted Jun 30, 1998·2 cites·18 claims
- 4735US4983943AMagnetic core and method of manufacturing sameTOSHIBA KK·Filed 1989·Granted Jan 8, 1991·3 cites·8 claims
- 4831USRE45481EInterconnector line of thin film, sputter target for forming the wiring film and electronic component using the sameISHIGAMI TAKASHI·Filed 1996·Granted Apr 21, 2015·2 cites·27 claims
- 4931US5288561AHigh temperature heat-treating jigTOSHIBA KK·Filed 1991·Granted Feb 22, 1994·4 cites·10 claims
- 5025US5370837AHigh temperature heat-treating jigTOSHIBA KK·Filed 1994·Granted Dec 6, 1994·0 cites·9 claims
Join the waitlist — get patent alerts
Get an alert when Noriaki Yagi files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →