Inventor · disambiguated record
Olaf Conradi
Also filed as: CONRADI OLAF
19 granted patents·2 pending applications·64 citations·filing 2006–2017
92Inventor score
Top patents by PatentIndex Score
21 records- 0195US7830611B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Granted Nov 9, 2010·34 cites·48 claims
- 0291US7990622B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2010·Granted Aug 2, 2011·7 cites·47 claims
- 0387US9442381B2Method of operating a projection exposure tool for microlithographyZEISS CARL SMT GMBH·Filed 2013·Granted Sep 13, 2016·4 cites·36 claims
- 0480US8947633B2Optical system and method of useZEISS CARL SMT GMBH·Filed 2013·Granted Feb 3, 2015·2 cites·33 claims
- 0579US9146475B2Projection exposure system and projection exposure methodZEISS CARL SMT GMBH·Filed 2013·Granted Sep 29, 2015·3 cites·33 claims
- 0676US7777963B2Method for improving the imaging properties of a projection objective, and such a projection objectiveZEISS CARL SMT AG·Filed 2006·Granted Aug 17, 2010·3 cites·53 claims
- 0775US9097984B2Microlithography projection objectiveZEISS CARL SMT GMBH·Filed 2014·Granted Aug 4, 2015·1 cites·30 claims
- 0875US8462315B2Optical system and method of useCONRADI OLAF·Filed 2009·Granted Jun 11, 2013·3 cites·32 claims
- 0973US8773638B2Microlithographic projection exposure apparatus with correction optical system that heats projection objective elementDODOC AURELIAN·Filed 2010·Granted Jul 8, 2014·2 cites·23 claims
- 1068US9069263B2Method for improving the imaging properties of a projection objective, and such a projection objectiveCONRADI OLAF·Filed 2010·Granted Jun 30, 2015·1 cites·28 claims
- 1166US8325323B2Method and system for correcting image changesCONRADI OLAF·Filed 2009·Granted Dec 4, 2012·2 cites·52 claims
- 1261US10281824B2Microlithography projection objectiveZEISS CARL SMT GMBH·Filed 2017·Granted May 7, 2019·0 cites·24 claims
- 1360US2014293256A1Microlithography projection objectiveZEISS CARL SMT GMBH·Filed 2014·Application pending·0 cites
- 1459US7808615B2Projection exposure apparatus and method for operating the sameZEISS CARL SMT AG·Filed 2006·Granted Oct 5, 2010·2 cites·18 claims
- 1556US9581813B2Method for improving the imaging properties of a projection objective, and such a projection objectiveZEISS CARL SMT GMBH·Filed 2015·Granted Feb 28, 2017·0 cites·35 claims
- 1655US10241423B2Method of operating a projection exposure tool for microlithographyZEISS CARL SMT GMBH·Filed 2016·Granted Mar 26, 2019·0 cites·20 claims
- 1755US9823579B2Optical system and method of useZEISS CARL SMT GMBH·Filed 2015·Granted Nov 21, 2017·0 cites·45 claims
- 1852US2009115986A1Microlithography projection objectiveZEISS CARL SMT AG·Filed 2006·Application pending·0 cites
- 1945US9366977B2Semiconductor microlithography projection exposure apparatusBLEIDISTEL SASCHA·Filed 2011·Granted Jun 14, 2016·0 cites·42 claims
- 2042US9606446B2Reflective optical element for EUV lithography and method of manufacturing a reflective optical elementZEISS CARL SMT GMBH·Filed 2015·Granted Mar 28, 2017·0 cites·18 claims
- 2137US9690203B2Method for adjusting an illumination settingZEISS CARL SMT GMBH·Filed 2015·Granted Jun 27, 2017·0 cites·20 claims
Join the waitlist — get patent alerts
Get an alert when Olaf Conradi files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →