Inventor · disambiguated record
Osamu Kamimura
Also filed as: KAMIMURA OSAMU
19 granted patents·3 pending applications·265 citations·filing 1993–2022
94Inventor score
Top patents by PatentIndex Score
22 records- 0194US7341144B2Case with hinged lidHITACHI COMM TECH LTD·Filed 2005·Granted Mar 11, 2008·74 cites·20 claims
- 0288US5373112AMultilayered wiring board having printed inductorHITACHI LTD·Filed 1993·Granted Dec 13, 1994·68 cites·3 claims
- 0384US7173262B2Charged particle beam exposure apparatus, charged particle beam exposure method and device manufacturing methodHITACHI HIGH TECH CORP·Filed 2005·Granted Feb 6, 2007·8 cites·17 claims
- 0481US8592776B2Charged particle beam apparatusENYAMA MOMOYO·Filed 2009·Granted Nov 26, 2013·6 cites·10 claims
- 0578US7385194B2Charged particle beam application systemHITACHI HIGH TECH CORP·Filed 2006·Granted Jun 10, 2008·6 cites·19 claims
- 0674US7105842B2Method of charged particle beam lithography and equipment for charged particle beam lithographyCANON KK·Filed 2004·Granted Sep 12, 2006·10 cites·14 claims
- 0774US6969862B2Charged-particle-beam exposure apparatus and method of controlling sameCANON KK·Filed 2003·Granted Nov 29, 2005·19 cites·16 claims
- 0872US6809319B2Electron beam writing equipment and electron beam writing methodHITACHI HIGH TECH CORP·Filed 2003·Granted Oct 26, 2004·8 cites·12 claims
- 0971US7005659B2Charged particle beam exposure apparatus, charged particle beam exposure method, and device manufacturing method using the same apparatusHITACHI HIGH TECH CORP·Filed 2004·Granted Feb 28, 2006·8 cites·12 claims
- 1066US8022365B2Charged particle beam equipments, and charged particle beam microscopeHITACHI LTD·Filed 2008·Granted Sep 20, 2011·1 cites·12 claims
- 1166US6031494AHandy-phone with shielded high and low frequency circuits and planar antennaHITACHI LTD·Filed 1997·Granted Feb 29, 2000·37 cites·12 claims
- 1263US7041988B2Electron beam exposure apparatus and electron beam processing apparatusHITACHI LTD·Filed 2003·Granted May 9, 2006·8 cites·16 claims
- 1360US6838682B2Electron beam exposure equipment and electron beam exposure methodHITACHI HIGH TECH CORP·Filed 2003·Granted Jan 4, 2005·4 cites·20 claims
- 1459US12287025B2Booster lever unitHITACHI LTD·Filed 2022·Granted Apr 29, 2025·0 cites·5 claims
- 1556US7098464B2Electron beam writing equipment and electron beam writing methodCANON KK·Filed 2004·Granted Aug 29, 2006·5 cites·30 claims
- 1656US7049607B2Electron beam writing equipment and electron beam writing methodCANON KK·Filed 2004·Granted May 23, 2006·2 cites·15 claims
- 1750US11985792B2Electronic computing apparatus and enclosure thereforHITACHI LTD·Filed 2022·Granted May 14, 2024·0 cites·11 claims
- 1850US7015482B2Electron beam writing equipment using plural beams and methodADVANTEST CORP·Filed 2003·Granted Mar 21, 2006·1 cites·11 claims
- 1949US2010033695A1Lithography apparatus and manufacturing method using the sameHITACHI LTD·Filed 2009·Application pending·0 cites
- 2049US2011049344A1Diffraction pattern capturing method and charged particle beam deviceHITACHI LTD·Filed 2009·Application pending·0 cites
- 2145US11214369B2System, control device, and moduleHAPSMOBILE INC·Filed 2021·Granted Jan 4, 2022·0 cites·19 claims
- 2245US2008067376A1Charged particle beam apparatusTANIMOTO SAYAKA·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →