Inventor · disambiguated record
Osamu Nozawa
Also filed as: NOZAWA OSAMU
106 granted patents·22 pending applications·531 citations·filing 1995–2024
99Inventor score
Top patents by PatentIndex Score
128 records- 0198US11762279B2Mask blank, method for manufacturing reflective mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2022·Granted Sep 19, 2023·3 cites·13 claims
- 0292US10481486B2Mask blank, phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2016·Granted Nov 19, 2019·4 cites·25 claims
- 0392US8137868B2Photomask blank, photomask, and methods of manufacturing the sameNOZAWA OSAMU·Filed 2010·Granted Mar 20, 2012·7 cites·24 claims
- 0490US11281089B2Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted Mar 22, 2022·4 cites·20 claims
- 0590US8524421B2Mask blank, transfer mask, methods of manufacturing the same and method of manufacturing a semiconductor deviceNOZAWA OSAMU·Filed 2011·Granted Sep 3, 2013·5 cites·25 claims
- 0690US6287429B1Magnetic recording medium having an improved magnetic characteristicHOYA CORP·Filed 1999·Granted Sep 11, 2001·87 cites·4 claims
- 0789US10539866B2Mask blank, phase-shift mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted Jan 21, 2020·2 cites·13 claims
- 0889US8637213B2Mask blank and transfer maskHASHIMOTO MASAHIRO·Filed 2010·Granted Jan 28, 2014·5 cites·22 claims
- 0988US12468217B2Mask blank, method of manufacturing transfer mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2021·Granted Nov 11, 2025·1 cites·20 claims
- 1088US7935461B2Phase shift mask blank, phase shift mask, and method for manufacturing phase shift mask blankHOYA CORP·Filed 2009·Granted May 3, 2011·7 cites·18 claims
- 1188US6335124B1Phase shift mask and phase shift mask blankHOYA CORP·Filed 1998·Granted Jan 1, 2002·72 cites·18 claims
- 1287US10114281B2Mask blank, phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2016·Granted Oct 30, 2018·4 cites·27 claims
- 1387US9625806B2Mask blank, phase-shift mask, and method for manufacturing the sameHOYA CORP·Filed 2014·Granted Apr 18, 2017·3 cites·16 claims
- 1487US5900324AMagnetic recording media, methods for producing the same and magnetic recordersHOYA CORP·Filed 1995·Granted May 4, 1999·50 cites·46 claims
- 1585US10088744B2Mask blank, method of manufacturing phase shift mask, phase shift mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2015·Granted Oct 2, 2018·4 cites·20 claims
- 1685US7955762B2Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive filmHOYA CORP·Filed 2009·Granted Jun 7, 2011·5 cites·18 claims
- 1784US10915016B2Mask blank, method for manufacturing phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2016·Granted Feb 9, 2021·3 cites·20 claims
- 1883US10146123B2Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2015·Granted Dec 4, 2018·3 cites·13 claims
- 1983US9625805B2Reflective mask blank, reflective mask and method of manufacturing reflective maskHOYA CORP·Filed 2015·Granted Apr 18, 2017·2 cites·22 claims
- 2083US2025044677A1Mask blankHOYA CORP·Filed 2024·Application pending·0 cites
- 2182US6743553B2Halftone phase shift mask and mask blankHOYA CORP·Filed 2001·Granted Jun 1, 2004·21 cites·19 claims
- 2281US12007684B2Mask blank, method of manufacturing imprint mold, method of manufacturing transfer mask, method of manufacturing reflective mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2023·Granted Jun 11, 2024·0 cites·34 claims
- 2381US11333966B2Mask blank, phase shift mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted May 17, 2022·2 cites·27 claims
- 2481US10606164B2Mask blank, phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted Mar 31, 2020·2 cites·25 claims
- 2581US10551734B2Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted Feb 4, 2020·2 cites·20 claims
- 2681US10365556B2Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2016·Granted Jul 30, 2019·2 cites·18 claims
- 2780US10942441B2Mask blank, phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2019·Granted Mar 9, 2021·1 cites·25 claims
- 2880US9140980B2Method of manufacturing a transfer mask and method of manufacturing a semiconductor deviceHOYA CORP·Filed 2013·Granted Sep 22, 2015·2 cites·7 claims
- 2980US6783634B2Manufacturing method and apparatus of phase shift mask blankHOYA CORP·Filed 2001·Granted Aug 31, 2004·12 cites·5 claims
- 3079US10101650B2Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2014·Granted Oct 16, 2018·2 cites·22 claims
- 3179US7592106B2Halftone type phase shift mask blank and phase shift mask thereofHOYA CORP·Filed 2006·Granted Sep 22, 2009·4 cites·15 claims
- 3277US8999609B2Phase shift mask blank, method of manufacturing the same, and phase shift maskNOZAWA OSAMU·Filed 2011·Granted Apr 7, 2015·2 cites·19 claims
- 3377US7115341B2Halftone phase shift mask blank, halftone phase shift mask, and method of producing the sameHOYA CORP·Filed 2003·Granted Oct 3, 2006·14 cites·8 claims
- 3476US8822103B2Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor deviceKOMINATO ATSUSHI·Filed 2011·Granted Sep 2, 2014·2 cites·18 claims
- 3576US7862963B2Halftone type phase shift mask blank and phase shift mask thereofHOYA CORP·Filed 2009·Granted Jan 4, 2011·3 cites·9 claims
- 3676US5968679AMagnetic recording medium and method of manufacturing the sameHOYA CORP·Filed 1996·Granted Oct 19, 1999·29 cites·27 claims
- 3774US9075319B2Mask blank and transfer maskHASHIMOTO MASAHIRO·Filed 2010·Granted Jul 7, 2015·2 cites·14 claims
- 3874US7011910B2Halftone-type phase-shift mask blank, and halftone-type phase-shift maskHOYA CORP·Filed 2003·Granted Mar 14, 2006·13 cites·20 claims
- 3974US6087047APhase shift mask and phase shift mask blankHOYA CORP·Filed 1998·Granted Jul 11, 2000·36 cites·25 claims
- 4073US10481485B2Mask blank, transfer mask, method of manufacturing transfer mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2016·Granted Nov 19, 2019·1 cites·29 claims
- 4173US9195133B2Mask blank, transfer mask and method of manufacturing transfer maskHOYA CORP·Filed 2013·Granted Nov 24, 2015·1 cites·29 claims
- 4272US9436079B2Phase shift mask blank, method of manufacturing the same, and phase shift maskHOYA CORP·Filed 2015·Granted Sep 6, 2016·1 cites·17 claims
- 4372US6762000B2Phase shift mask blank, photo mask blank and manufacturing apparatus and method of blanksHOYA CORP·Filed 2001·Granted Jul 13, 2004·10 cites·12 claims
- 4471US9372393B2Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor deviceHOYA CORP·Filed 2014·Granted Jun 21, 2016·1 cites·21 claims
- 4570US10942442B2Mask blank, phase-shift mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2019·Granted Mar 9, 2021·0 cites·20 claims
- 4670US6677087B2Phase shift mask blank, phase shift mask, and method for manufacturing the sameHOYA CORP·Filed 2001·Granted Jan 13, 2004·10 cites·14 claims
- 4769US12153338B2Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2020·Granted Nov 26, 2024·0 cites·14 claims
- 4868US10261409B2Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2015·Granted Apr 16, 2019·1 cites·18 claims
- 4968US6740208B2Photo mask blank and method of manufacturing the sameHOYA CORP·Filed 2001·Granted May 25, 2004·9 cites·7 claims
- 5067US6844119B2Method for producing a halftone phase shift mask blank, a halftone phase shift mask blank and halftone phase shift maskHOYA CORP·Filed 2002·Granted Jan 18, 2005·9 cites·4 claims
Showing the top 50 of 128 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Osamu Nozawa files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →