Inventor · disambiguated record
Osamu Suga
Also filed as: SUGA OSAMU
9 granted patents·2 pending applications·152 citations·filing 1990–2015
88Inventor score
Files withRENESAS ELECTRONICS CORP3HITACHI LTD2TERASAWA TSUNEO2KAMO TAKASHI1NAT INST OF ADVANCED IND SCIEN1
Top patents by PatentIndex Score
11 records- 0189US8488866B2Method of inspecting mask pattern and mask pattern inspection apparatusTERASAWA TSUNEO·Filed 2010·Granted Jul 16, 2013·12 cites·16 claims
- 0288US5097138AElectron beam lithography system and methodHITACHI LTD·Filed 1990·Granted Mar 17, 1992·52 cites·7 claims
- 0387US5424173AElectron beam lithography system and methodHITACHI LTD·Filed 1993·Granted Jun 13, 1995·49 cites·18 claims
- 0484US8173332B2Reflection-type exposure mask and method of manufacturing a semiconductor deviceKAMO TAKASHI·Filed 2010·Granted May 8, 2012·5 cites·20 claims
- 0579US7960076B2Reflective-type maskTOSHIBA KK·Filed 2008·Granted Jun 14, 2011·5 cites·10 claims
- 0672US7844934B2Method for designing a semiconductor integrated circuit layout capable of reducing the processing time for optical proximity effect correctionRENESAS ELECTRONICS CORP·Filed 2006·Granted Nov 30, 2010·7 cites·8 claims
- 0771US9229314B2Method of inspecting mask, mask inspection device, and method of manufacturing maskRENESAS ELECTRONICS CORP·Filed 2015·Granted Jan 5, 2016·1 cites·4 claims
- 0869US6873942B13-D structure design system, a method for designing 3-D structure and a recording medium readable by a computer having a program allowing the computer to execute the method recorded thereinORIGINAL ENGINEERING CONSULTAN·Filed 2000·Granted Mar 29, 2005·21 cites·5 claims
- 0956US9063098B2Method of inspecting mask, mask inspection device, and method of manufacturing maskTERASAWA TSUNEO·Filed 2012·Granted Jun 23, 2015·0 cites·4 claims
- 1041US2007074146A1Method for designing mask pattern and method for manufacturing semiconductor deviceNAT INST OF ADVANCED IND SCIEN·Filed 2006·Application pending·0 cites
- 1138US2011117479A1Reflective exposure mask, method of manufacturing reflective exposure mask, and method of manufacturing semiconductor deviceRENESAS ELECTRONICS CORP·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →