Inventor · disambiguated record
Paul Connors
Also filed as: CONNORS PAUL · CONNORS PAUL DENNIS
10 granted patents·2 pending applications·459 citations·filing 2014–2024
85Inventor score
Files withAPPLIED MATERIALS INC12
Top patents by PatentIndex Score
12 records- 0195US9355876B2Process load lock apparatus, lift assemblies, electronic device processing systems, and methods of processing substrates in load lock locationsAPPLIED MATERIALS INC·Filed 2014·Granted May 31, 2016·452 cites·17 claims
- 0288US11031262B2Loadlock integrated bevel etcher systemAPPLIED MATERIALS INC·Filed 2020·Granted Jun 8, 2021·2 cites·20 claims
- 0377US10679830B2Cleaning process for removing boron-carbon residuals in processing chamber at high temperatureAPPLIED MATERIALS INC·Filed 2017·Granted Jun 9, 2020·2 cites·25 claims
- 0474US10636684B2Loadlock integrated bevel etcher systemAPPLIED MATERIALS INC·Filed 2019·Granted Apr 28, 2020·1 cites·20 claims
- 0569US10403515B2Loadlock integrated bevel etcher systemAPPLIED MATERIALS INC·Filed 2016·Granted Sep 3, 2019·1 cites·13 claims
- 0664US10950445B2Deposition of metal silicide layers on substrates and chamber componentsAPPLIED MATERIALS INC·Filed 2020·Granted Mar 16, 2021·0 cites·20 claims
- 0763US9490154B2Method of aligning substrate-scale mask with substrateAPPLIED MATERIALS INC·Filed 2015·Granted Nov 8, 2016·1 cites·8 claims
- 0854US10734232B2Deposition of metal silicide layers on substrates and chamber componentsAPPLIED MATERIALS INC·Filed 2018·Granted Aug 4, 2020·0 cites·20 claims
- 0950US11315771B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2020·Granted Apr 26, 2022·0 cites·5 claims
- 1045US2016240410A1Substrate lift assembliesAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 1137US2017178758A1Uniform wafer temperature achievement in unsymmetric chamber environmentAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 1235USD1103950SProcess chamber collimatorAPPLIED MATERIALS INC·Filed 2024·Granted Dec 2, 2025·0 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →