Inventor · disambiguated record
Patricia M. Liu
Also filed as: LIU PATRICIA · LIU PATRICIA M
39 granted patents·13 pending applications·1,271 citations·filing 1997–2025
97Inventor score
Top patents by PatentIndex Score
52 records- 0198US6454860B2Deposition reactor having vaporizing, mixing and cleaning capabilitiesAPPLIED MATERIALS INC·Filed 1998·Granted Sep 24, 2002·692 cites·22 claims
- 0296US6204203B1Post deposition treatment of dielectric films for interface controlAPPLIED MATERIALS INC·Filed 1998·Granted Mar 20, 2001·271 cites·16 claims
- 0394US9048183B2NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursorsAPPLIED MATERIALS INC·Filed 2014·Granted Jun 2, 2015·14 cites·18 claims
- 0493US11261538B1In-situ temperature mapping for epi chamberAPPLIED MATERIALS INC·Filed 2020·Granted Mar 1, 2022·3 cites·19 claims
- 0592US7837838B2Method of fabricating a high dielectric constant transistor gate using a low energy plasma apparatusAPPLIED MATERIALS INC·Filed 2006·Granted Nov 23, 2010·20 cites·27 claims
- 0692US6328808B1Apparatus and method for aligning and controlling edge deposition on a substrateAPPLIED MATERIALS INC·Filed 2000·Granted Dec 11, 2001·44 cites·16 claims
- 0791US11152479B2Semiconductor device, method of making a semiconductor device, and processing systemAPPLIED MATERIALS INC·Filed 2020·Granted Oct 19, 2021·3 cites·11 claims
- 0890US11195923B2Method of fabricating a semiconductor device having reduced contact resistanceAPPLIED MATERIALS INC·Filed 2019·Granted Dec 7, 2021·5 cites·13 claims
- 0989US11152221B2Methods and apparatus for metal silicide depositionAPPLIED MATERIALS INC·Filed 2020·Granted Oct 19, 2021·2 cites·19 claims
- 1089US10872763B2Treatments to enhance material structuresAPPLIED MATERIALS INC·Filed 2019·Granted Dec 22, 2020·5 cites·16 claims
- 1189US10861722B2Integrated semiconductor processingAPPLIED MATERIALS INC·Filed 2019·Granted Dec 8, 2020·6 cites·20 claims
- 1289US8642468B2NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursorsGANGULI SESHADRI·Filed 2011·Granted Feb 4, 2014·9 cites·17 claims
- 1388US7645710B2Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma systemAPPLIED MATERIALS INC·Filed 2007·Granted Jan 12, 2010·13 cites·19 claims
- 1487US8778816B2In situ vapor phase surface activation of SiO2SATO TATSUYA E·Filed 2011·Granted Jul 15, 2014·9 cites·19 claims
- 1586US6274058B1Remote plasma cleaning method for processing chambersAPPLIED MATERIALS INC·Filed 1999·Granted Aug 14, 2001·106 cites·21 claims
- 1684US11733081B2Methods, systems, and apparatus for conducting a calibration operation for a plurality of mass flow controllers (MFCs) of a substrate processing systemAPPLIED MATERIALS INC·Filed 2021·Granted Aug 22, 2023·1 cites·20 claims
- 1781US11860973B2Method and system for foreline deposition diagnostics and controlAPPLIED MATERIALS INC·Filed 2020·Granted Jan 2, 2024·1 cites·20 claims
- 1881US7678710B2Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma systemAPPLIED MATERIALS INC·Filed 2006·Granted Mar 16, 2010·7 cites·37 claims
- 1978US6186092B1Apparatus and method for aligning and controlling edge deposition on a substrateAPPLIED MATERIALS INC·Filed 1997·Granted Feb 13, 2001·39 cites·32 claims
- 2076US2023366715A1Methods, systems, and apparatus for conducting a calibration operation for a plurality of mass flow controllers (mfcs) of a substrate processing systemAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2175US11309404B2Integrated CMOS source drain formation with advanced controlAPPLIED MATERIALS INC·Filed 2019·Granted Apr 19, 2022·1 cites·14 claims
- 2273US2025096045A1Substrate processing monitoringAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2371US11615986B2Methods and apparatus for metal silicide depositionAPPLIED MATERIALS INC·Filed 2021·Granted Mar 28, 2023·0 cites·22 claims
- 2469US7913645B2Methods and apparatus for incorporating nitrogen in oxide filmsAPPLIED MATERIALS INC·Filed 2006·Granted Mar 29, 2011·2 cites·24 claims
- 2569US7902050B2Methods and apparatus for incorporating nitrogen in oxide filmsAPPLIED MATERIALS INC·Filed 2006·Granted Mar 8, 2011·2 cites·24 claims
- 2669US2022199804A1Integrated CMOS Source Drain Formation With Advanced ControlAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2768US8658522B2Methods and apparatus for incorporating nitrogen in oxide filmsAPPLIED MATERIALS INC·Filed 2013·Granted Feb 25, 2014·1 cites·24 claims
- 2868US2025194193A1Arsenic diffusion profile engineering for transistorsAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2966US12249626B2Arsenic diffusion profile engineering for transistorsAPPLIED MATERIALS INC·Filed 2020·Granted Mar 11, 2025·0 cites·20 claims
- 3065US9437640B2Engineering induced tunable electrostatic effectAPPLIED MATERIALS INC·Filed 2014·Granted Sep 6, 2016·0 cites·20 claims
- 3164US11901182B2Silicide film nucleationAPPLIED MATERIALS INC·Filed 2021·Granted Feb 13, 2024·0 cites·13 claims
- 3263US2025231066A1Temperature profile measurement and synchronized control on substrate and susceptor in an epitaxy chamberAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 3362US11456178B2Gate interface engineering with doped layerAPPLIED MATERIALS INC·Filed 2021·Granted Sep 27, 2022·0 cites·20 claims
- 3462US11081358B2Silicide film nucleationAPPLIED MATERIALS INC·Filed 2019·Granted Aug 3, 2021·0 cites·13 claims
- 3561US12449309B2Methods for detection using optical emission spectroscopyAPPLIED MATERIALS INC·Filed 2020·Granted Oct 21, 2025·0 cites·20 claims
- 3661US12165934B2Substrate processing monitoringAPPLIED MATERIALS INC·Filed 2020·Granted Dec 10, 2024·0 cites·18 claims
- 3759US2022093749A1Method of fabricating a semiconductor device having reduced contact resistanceAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 3858US12196617B2Temperature profile measurement and synchronized control on substrate and susceptor in an epitaxy chamberAPPLIED MATERIALS INC·Filed 2020·Granted Jan 14, 2025·0 cites·20 claims
- 3956US11271097B2Cap oxidation for FinFET formationAPPLIED MATERIALS INC·Filed 2020·Granted Mar 8, 2022·0 cites·20 claims
- 4054US11195914B2Transistor and method for forming a transistorAPPLIED MATERIALS INC·Filed 2019·Granted Dec 7, 2021·0 cites·20 claims
- 4153US10971366B2Methods for silicide depositionAPPLIED MATERIALS INC·Filed 2019·Granted Apr 6, 2021·0 cites·20 claims
- 4252US6218300B1Method and apparatus for forming a titanium doped tantalum pentaoxide dielectric layer using CVDAPPLIED MATERIALS INC·Filed 1998·Granted Apr 17, 2001·15 cites·30 claims
- 4352US2023029344A1Methods of formation of a sige/si superlatticeAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 4451US8375892B2Methods and apparatus for incorporating nitrogen in oxide filmsAPPLIED MATERIALS INC·Filed 2011·Granted Feb 19, 2013·0 cites·24 claims
- 4548US11037838B2In-situ integrated chambersAPPLIED MATERIALS INC·Filed 2019·Granted Jun 15, 2021·0 cites·20 claims
- 4647US12227847B2Level monitoring and active adjustment of a substrate support assemblyAPPLIED MATERIALS INC·Filed 2021·Granted Feb 18, 2025·0 cites·13 claims
- 4745US2002192370A1Deposition reactor having vaporizing, mixing and cleaning capabilitiesFiled 2002·Application pending·0 cites
- 4844US2007209930A1Apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma systemAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 4943US2016215392A1Injector For Spatially Separated Atomic Layer Deposition ChamberAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 5043US2010305884A1Methods for determining the quantity of precursor in an ampouleAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
Showing the top 50 of 52 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →