Inventor · disambiguated record
Paul R. Mchugh
Also filed as: MCHUGH PAUL · MCHUGH PAUL R
80 granted patents·47 pending applications·1,868 citations·filing 1997–2025
99Inventor score
Top patents by PatentIndex Score
127 records- 0199US6565729B2Method for electrochemically depositing metal on a semiconductor workpieceSEMITOOL INC·Filed 2000·Granted May 20, 2003·435 cites·59 claims
- 0298US6441350B1Temperature control system for a thermal reactorBROOKS AUTOMATION INC·Filed 1999·Granted Aug 27, 2002·530 cites·24 claims
- 0398US6428673B1Apparatus and method for electrochemical processing of a microelectronic workpiece, capable of modifying processing based on metrologySEMITOOL INC·Filed 2000·Granted Aug 6, 2002·102 cites·17 claims
- 0496US11230793B2Mechanically-driven oscillating flow agitationAPPLIED MATERIALS INC·Filed 2020·Granted Jan 25, 2022·2 cites·10 claims
- 0596US10227706B2Electroplating apparatus with electrolyte agitationAPPLIED MATERIALS INC·Filed 2015·Granted Mar 12, 2019·6 cites·19 claims
- 0696US9765443B2Electroplating processor with current thief electrodeAPPLIED MATERIALS INC·Filed 2015·Granted Sep 19, 2017·6 cites·17 claims
- 0796US6569297B2Workpiece processor having processing chamber with improved processing fluid flowSEMITOOL INC·Filed 2001·Granted May 27, 2003·39 cites·52 claims
- 0895US11585009B2Mechanically-driven oscillating flow agitationAPPLIED MATERIALS INC·Filed 2022·Granted Feb 21, 2023·1 cites·18 claims
- 0995US10577712B2Electroplating apparatus with electrolyte agitationAPPLIED MATERIALS INC·Filed 2019·Granted Mar 3, 2020·3 cites·19 claims
- 1095US7931786B2Apparatus and method for agitating liquids in wet chemical processing of microfeature workpiecesSEMITOOL INC·Filed 2006·Granted Apr 26, 2011·18 cites·25 claims
- 1194US9920448B2Inert anode electroplating processor and replenisher with anionic membranesAPPLIED MATERIALS INC·Filed 2015·Granted Mar 20, 2018·4 cites·20 claims
- 1294US8496789B2Electrochemical processorMCHUGH PAUL R·Filed 2011·Granted Jul 30, 2013·9 cites·20 claims
- 1394US7332066B2Apparatus and method for electrochemically depositing metal on a semiconductor workpieceSEMITOOL INC·Filed 2005·Granted Feb 19, 2008·19 cites·38 claims
- 1493US12116686B2Parameter adjustment model for semiconductor processing chambersAPPLIED MATERIALS INC·Filed 2022·Granted Oct 15, 2024·2 cites·17 claims
- 1593US9758897B2Electroplating apparatus with notch adapted contact ring seal and thief electrodeAPPLIED MATERIALS INC·Filed 2015·Granted Sep 12, 2017·3 cites·8 claims
- 1693US7842173B2Apparatus and methods for electrochemical processing of microfeature wafersSEMITOOL INC·Filed 2007·Granted Nov 30, 2010·9 cites·24 claims
- 1793US6660137B2System for electrochemically processing a workpieceSEMITOOL INC·Filed 2001·Granted Dec 9, 2003·78 cites·18 claims
- 1893US6471913B1Method and apparatus for processing a microelectronic workpiece including an apparatus and method for executing a processing step at an elevated temperatureSEMITOOL INC·Filed 2000·Granted Oct 29, 2002·66 cites·22 claims
- 1992US8496790B2Electrochemical processorWILSON GREGORY J·Filed 2011·Granted Jul 30, 2013·13 cites·12 claims
- 2092US7857958B2Method and apparatus for controlling vessel characteristics, including shape and thieving current for processing microfeature workpiecesSEMITOOL INC·Filed 2007·Granted Dec 28, 2010·17 cites·23 claims
- 2192US7371998B2Thermal wafer processorSEMITOOL INC·Filed 2006·Granted May 13, 2008·20 cites·19 claims
- 2291US7160421B2Turning electrodes used in a reactor for electrochemically processing a microelectronic workpieceSEMITOOL INC·Filed 2001·Granted Jan 9, 2007·24 cites·32 claims
- 2390US12104269B2Mechanically-driven oscillating flow agitationAPPLIED MATERIALS INC·Filed 2023·Granted Oct 1, 2024·0 cites·20 claims
- 2490US10546762B2Drying high aspect ratio featuresAPPLIED MATERIALS INC·Filed 2017·Granted Jan 28, 2020·6 cites·20 claims
- 2590US6207937B1Temperature control system for a thermal reactorSEMITOOL INC·Filed 1999·Granted Mar 27, 2001·84 cites·5 claims
- 2689US7189318B2Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpieceSEMITOOL INC·Filed 2001·Granted Mar 13, 2007·16 cites·22 claims
- 2788US8968533B2Electroplating processor with geometric electrolyte flow pathHARRIS RANDY A·Filed 2012·Granted Mar 3, 2015·4 cites·15 claims
- 2888US8313631B2Apparatus and methods for electrochemical processing of microfeature wafersMCHUGH PAUL R·Filed 2010·Granted Nov 20, 2012·3 cites·11 claims
- 2985US9222195B2Electroplating systems and methods for high sheet resistance substratesMCHUGH PAUL R·Filed 2012·Granted Dec 29, 2015·3 cites·7 claims
- 3084US11982008B2Electroplating systemAPPLIED MATERIALS INC·Filed 2023·Granted May 14, 2024·0 cites·5 claims
- 3184US9359683B2Method of forming metal and metal alloy featuresKIM BIOH·Filed 2007·Granted Jun 7, 2016·6 cites·46 claims
- 3284US7267749B2Workpiece processor having processing chamber with improved processing fluid flowSEMITOOL INC·Filed 2003·Granted Sep 11, 2007·10 cites·32 claims
- 3384US7247223B2Method and apparatus for controlling vessel characteristics, including shape and thieving current for processing microfeature workpiecesSEMITOOL INC·Filed 2003·Granted Jul 24, 2007·25 cites·44 claims
- 3483US10655226B2Apparatus and methods to improve ALD uniformityAPPLIED MATERIALS INC·Filed 2018·Granted May 19, 2020·1 cites·19 claims
- 3583US10494731B2Electroplating dynamic edge controlAPPLIED MATERIALS INC·Filed 2017·Granted Dec 3, 2019·3 cites·18 claims
- 3682US9099297B2Electrochemical processorAPPLIED MATERIALS INC·Filed 2013·Granted Aug 4, 2015·4 cites·12 claims
- 3782US8968531B2Electro processor with shielded contact ringWILSON GREGORY J·Filed 2011·Granted Mar 3, 2015·2 cites·16 claims
- 3881US10240248B2Adaptive electric field shielding in an electroplating processor using agitator geometry and motion controlAPPLIED MATERIALS INC·Filed 2016·Granted Mar 26, 2019·1 cites·9 claims
- 3980US11578422B2Electroplating systemAPPLIED MATERIALS INC·Filed 2022·Granted Feb 14, 2023·0 cites·17 claims
- 4080US7438788B2Apparatus and methods for electrochemical processing of microelectronic workpiecesSEMITOOL INC·Filed 2005·Granted Oct 21, 2008·2 cites·14 claims
- 4180US6747734B1Apparatus and method for processing a microelectronic workpiece using metrologySEMITOOL INC·Filed 2000·Granted Jun 8, 2004·21 cites·48 claims
- 4279US6780374B2Method and apparatus for processing a microelectronic workpiece at an elevated temperatureSEMITOOL INC·Filed 2000·Granted Aug 24, 2004·23 cites·27 claims
- 4379US6222164B1Temperature control system for a thermal reactorSEMITOOL INC·Filed 1999·Granted Apr 24, 2001·41 cites·4 claims
- 4478US7393439B2Integrated microfeature workpiece processing tools with registration systems for paddle reactorsSEMITOOL INC·Filed 2003·Granted Jul 1, 2008·11 cites·23 claims
- 4578US7102763B2Methods and apparatus for processing microelectronic workpieces using metrologySEMITOOL INC·Filed 2001·Granted Sep 5, 2006·22 cites·69 claims
- 4677US10227707B2Inert anode electroplating processor and replenisherAPPLIED MATERIALS INC·Filed 2015·Granted Mar 12, 2019·1 cites·9 claims
- 4777US7390383B2Paddles and enclosures for enhancing mass transfer during processing of microfeature workpiecesSEMITOOL INC·Filed 2003·Granted Jun 24, 2008·17 cites·39 claims
- 4875US8900425B2Contact ring for an electrochemical processorHARRIS RANDY A·Filed 2011·Granted Dec 2, 2014·1 cites·15 claims
- 4975US7264698B2Apparatus and methods for electrochemical processing of microelectronic workpiecesSEMITOOL INC·Filed 2001·Granted Sep 4, 2007·11 cites·26 claims
- 5075US2025347020A1Electroplating co-planarity improvement by die shieldingAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
Showing the top 50 of 127 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →