Inventor · disambiguated record
Patrick Tae
Also filed as: TAE PATRICK · TAE PATRICK JOHN
20 granted patents·2 pending applications·11 citations·filing 2018–2024
90Inventor score
Top patents by PatentIndex Score
22 records- 0195US11708635B2Processing chamber condition and process state monitoring using optical reflector attached to processing chamber linerAPPLIED MATERIALS INC·Filed 2020·Granted Jul 25, 2023·4 cites·16 claims
- 0289US11781214B2Differential capacitive sensors for in-situ film thickness and dielectric constant measurementAPPLIED MATERIALS INC·Filed 2019·Granted Oct 10, 2023·2 cites·13 claims
- 0389US11284018B1Smart camera substrateAPPLIED MATERIALS INC·Filed 2020·Granted Mar 22, 2022·2 cites·18 claims
- 0486US12123090B2Differential capacitive sensor for in-situ film thickness and dielectric constant measurementAPPLIED MATERIALS INC·Filed 2023·Granted Oct 22, 2024·0 cites·7 claims
- 0585US12442765B2Transmission corrected plasma emission using in-situ optical reflectometryAPPLIED MATERIALS INC·Filed 2024·Granted Oct 14, 2025·0 cites·20 claims
- 0685US12432461B2Smart camera substrateAPPLIED MATERIALS INC·Filed 2024·Granted Sep 30, 2025·0 cites·20 claims
- 0785US12009236B2Sensors and system for in-situ edge ring erosion monitorAPPLIED MATERIALS INC·Filed 2019·Granted Jun 11, 2024·3 cites·7 claims
- 0881US12114083B2Smart camera substrateAPPLIED MATERIALS INC·Filed 2023·Granted Oct 8, 2024·0 cites·18 claims
- 0974US12000041B2Processing chamber condition and process state monitoring using optical reflector attached to processing chamber linerAPPLIED MATERIALS INC·Filed 2023·Granted Jun 4, 2024·0 cites·20 claims
- 1074US11736818B2Smart camera substrateAPPLIED MATERIALS INC·Filed 2022·Granted Aug 22, 2023·0 cites·18 claims
- 1174US2024321610A1Sensors and system for in-situ edge ring erosion monitorAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1273US12163911B2Capacitive sensor housing for chamber condition monitoringAPPLIED MATERIALS INC·Filed 2022·Granted Dec 10, 2024·0 cites·14 claims
- 1373US12031910B2Transmission corrected plasma emission using in-situ optical reflectometryAPPLIED MATERIALS INC·Filed 2021·Granted Jul 9, 2024·0 cites·21 claims
- 1472US2024290592A1Thin film, in-situ measurement through transparent crystal and transparent substrate within processing chamber wallAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1565US12437979B2Capacitive sensors and capacitive sensing locations for plasma chamber condition monitoringAPPLIED MATERIALS INC·Filed 2020·Granted Oct 7, 2025·0 cites·12 claims
- 1664US11545346B2Capacitive sensing data integration for plasma chamber condition monitoringAPPLIED MATERIALS INC·Filed 2020·Granted Jan 3, 2023·0 cites·8 claims
- 1763US11415538B2Capacitive sensor housing for chamber condition monitoringAPPLIED MATERIALS INC·Filed 2020·Granted Aug 16, 2022·0 cites·8 claims
- 1860US12009191B2Thin film, in-situ measurement through transparent crystal and transparent substrate within processing chamber wallAPPLIED MATERIALS INC·Filed 2020·Granted Jun 11, 2024·0 cites·19 claims
- 1958US12469686B2Process characterization and correction using optical wall process sensor (OWPS)APPLIED MATERIALS INC·Filed 2022·Granted Nov 11, 2025·0 cites·20 claims
- 2051US12418972B2Confocal chromatic metrology for EUV source condition monitoringKLA CORP·Filed 2022·Granted Sep 16, 2025·0 cites·22 claims
- 2148US11581206B2Capacitive sensor for chamber condition monitoringAPPLIED MATERIALS INC·Filed 2020·Granted Feb 14, 2023·0 cites·13 claims
- 2244US11551905B2Resonant process monitorAPPLIED MATERIALS INC·Filed 2018·Granted Jan 10, 2023·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →