Inventor · disambiguated record
Patrick Warnaar
Also filed as: WARNAAR PATRICK
52 granted patents·11 pending applications·219 citations·filing 2008–2024
98Inventor score
Files withASML NETHERLANDS BV49WARNAAR PATRICK4BIJNEN FRANCISCUS GODEFRIDUS CASPER2HULSEBOS EDO MARIA2SMILDE HENDRIK JAN HIDDE2
Top patents by PatentIndex Score
63 records- 0199US9946167B2Metrology method and inspection apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Apr 17, 2018·18 cites·18 claims
- 0298US8867020B2Metrology method and apparatus, and device manufacturing methodSMILDE HENDRIK JAN HIDDE·Filed 2011·Granted Oct 21, 2014·59 cites·14 claims
- 0397US11067902B2Computational metrologyASML NETHERLANDS BV·Filed 2018·Granted Jul 20, 2021·9 cites·20 claims
- 0497US9140998B2Metrology method and inspection apparatus, lithographic system and device manufacturing methodSMILDE HENDRIK JAN HIDDE·Filed 2011·Granted Sep 22, 2015·24 cites·12 claims
- 0596US12066764B2Metrology apparatus and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2023·Granted Aug 20, 2024·2 cites·20 claims
- 0696US10437163B2Method and apparatus for design of a metrology targetASML NETHERLANDS BV·Filed 2017·Granted Oct 8, 2019·7 cites·9 claims
- 0795US11125806B2Metrology apparatus and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2019·Granted Sep 21, 2021·5 cites·15 claims
- 0895US10816909B2Metrology system and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2018·Granted Oct 27, 2020·5 cites·17 claims
- 0994US11385553B2Metrology method, patterning device, apparatus and computer programASML NETHERLANDS BV·Filed 2021·Granted Jul 12, 2022·2 cites·20 claims
- 1094US10481506B2Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Nov 19, 2019·7 cites·24 claims
- 1193US10739687B2Metrology method and apparatus, substrate, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Aug 11, 2020·4 cites·22 claims
- 1292US10162271B2Metrology method and apparatus, substrate, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Dec 25, 2018·7 cites·20 claims
- 1392US9753379B2Inspection apparatus and methods, methods of manufacturing devicesASML NETHERLANDS BV·Filed 2015·Granted Sep 5, 2017·7 cites·24 claims
- 1492US8208121B2Alignment mark and a method of aligning a substrate comprising such an alignment markBIJNEN FRANCISCUS GODEFRIDUS CASPER·Filed 2009·Granted Jun 26, 2012·24 cites·34 claims
- 1591US11768442B2Method of determining control parameters of a device manufacturing processASML NETHERLANDS BV·Filed 2022·Granted Sep 26, 2023·1 cites·20 claims
- 1689US12366811B2Metrology system and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2024·Granted Jul 22, 2025·0 cites·20 claims
- 1787US9069264B2Metrology method and apparatus, and device manufacturing methodWARNAAR PATRICK·Filed 2012·Granted Jun 30, 2015·8 cites·19 claims
- 1886US11415900B2Metrology system and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2020·Granted Aug 16, 2022·1 cites·20 claims
- 1986US10996570B2Metrology method, patterning device, apparatus and computer programASML NETHERLANDS BV·Filed 2019·Granted May 4, 2021·2 cites·25 claims
- 2084US9869940B2Metrology method and apparatus, computer program and lithographic systemASML NETHERLANDS BV·Filed 2016·Granted Jan 16, 2018·3 cites·18 claims
- 2183US12105432B2Metrology method and associated computer productASML NETHERLANDS BV·Filed 2020·Granted Oct 1, 2024·2 cites·20 claims
- 2283US8208140B2Alignment system and alignment marks for use therewithHULSEBOS EDO MARIA·Filed 2010·Granted Jun 26, 2012·4 cites·17 claims
- 2382US11513442B2Method of determining control parameters of a device manufacturing processASML NETHERLANDS BV·Filed 2018·Granted Nov 29, 2022·2 cites·20 claims
- 2480US12197136B2Method of determining control parameters of a device manufacturing processASML NETHERLANDS BV·Filed 2023·Granted Jan 14, 2025·0 cites·20 claims
- 2580US11009343B2Metrology apparatus and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2019·Granted May 18, 2021·2 cites·15 claims
- 2677US12007700B2Metrology system and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2022·Granted Jun 11, 2024·0 cites·20 claims
- 2776US11709436B2Metrology apparatus and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2021·Granted Jul 25, 2023·0 cites·20 claims
- 2876US8709687B2Substrate and patterning device for use in metrology, metrology method and device manufacturing methodVAN DER SCHAAR MAURITS·Filed 2012·Granted Apr 29, 2014·3 cites·6 claims
- 2976US7989966B2Mark structure for coarse wafer alignment and method for manufacturing such a mark structureASML NETHERLANDS BV·Filed 2009·Granted Aug 2, 2011·3 cites·8 claims
- 3075US12493247B2Method and system for predicting process information with a parameterized modelASML NETHERLANDS BV·Filed 2020·Granted Dec 9, 2025·1 cites·13 claims
- 3175US11650047B2Metrology apparatus and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2021·Granted May 16, 2023·0 cites·20 claims
- 3275US2024412067A1Metrology Apparatus And Method For Determining A Characteristic Of One Or More Structures On A SubstrateASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 3374US12461451B2Computational metrologyASML NETHERLANDS BV·Filed 2021·Granted Nov 4, 2025·0 cites·20 claims
- 3474US11181828B2Method of determining a value of a parameter of interest of a patterning process, device manufacturing methodASML NETHERLANDS BV·Filed 2019·Granted Nov 23, 2021·2 cites·20 claims
- 3574US10466594B2Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Nov 5, 2019·1 cites·17 claims
- 3674US10261427B2Metrology method and apparatus, computer program and lithographic systemASML NETHERLANDS BV·Filed 2018·Granted Apr 16, 2019·1 cites·8 claims
- 3772US11429029B2Method and apparatus for illumination adjustmentASML NETHERLANDS BV·Filed 2020·Granted Aug 30, 2022·0 cites·20 claims
- 3871US11526085B2Metrology method and apparatus, substrate, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2020·Granted Dec 13, 2022·0 cites·20 claims
- 3969US12242203B2Target for measuring a parameter of a lithographic processASML NETHERLANDS BV·Filed 2021·Granted Mar 4, 2025·0 cites·11 claims
- 4069US8208139B2Alignment system and alignment marks for use therewithHULSEBOS EDO MARIA·Filed 2008·Granted Jun 26, 2012·2 cites·16 claims
- 4167US11003099B2Method and apparatus for design of a metrology targetASML NETHERLANDS BV·Filed 2019·Granted May 11, 2021·0 cites·20 claims
- 4266US2020050114A1Method of Measuring a Structure, Inspection Apparatus, Lithographic System and Device Manufacturing MethodASML NETHERLANDS BV·Filed 2019·Application pending·0 cites
- 4364US11022892B2Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2019·Granted Jun 1, 2021·0 cites·22 claims
- 4463US2025348008A1Single pad overlay measurementASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 4562US2025208522A1Illumination module and associated methods and metrology apparatusASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 4660US12405535B2Method for filtering an image and associated metrology apparatusASML HOLDING NV·Filed 2020·Granted Sep 2, 2025·0 cites·15 claims
- 4760US9535342B2Metrology method and apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Jan 3, 2017·0 cites·20 claims
- 4860US2025036031A1Target asymmetry measurement for substrate alignment in lithography systemsASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 4957US9331022B2Substrate and patterning device for use in metrology, metrology method and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted May 3, 2016·0 cites·5 claims
- 5057US8908152B2Lithographic apparatus and device manufacturing method to determine improved absolute position of exposure fields using mark structuresBIJNEN FRANCISCUS GODEFRIDUS CASPER·Filed 2009·Granted Dec 9, 2014·1 cites·22 claims
Showing the top 50 of 63 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →