Inventor · disambiguated record
Peter Paul Hempenius
Also filed as: HEMPENIUS PETER · HEMPENIUS PETER PAUL
15 granted patents·9 pending applications·41 citations·filing 2006–2024
89Inventor score
Top patents by PatentIndex Score
24 records- 0190US7742149B2Stage system and lithographic apparatus comprising such a stage systemASML NETHERLANDS BV·Filed 2008·Granted Jun 22, 2010·15 cites·5 claims
- 0289US11315752B2E-beam apparatusASML NETHERLANDS BV·Filed 2020·Granted Apr 26, 2022·2 cites·15 claims
- 0380US10867770B2E-beam apparatusASML NETHERLANDS BV·Filed 2019·Granted Dec 15, 2020·2 cites·20 claims
- 0477US9946172B2System for positioning an object in lithographyASML NETHERLANDS BV·Filed 2014·Granted Apr 17, 2018·2 cites·20 claims
- 0576US7884919B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Feb 8, 2011·4 cites·39 claims
- 0674US10191396B2Lithographic apparatus, object positioning system and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Jan 29, 2019·2 cites·20 claims
- 0771US9378722B2Lithographic apparatus with actuator to compensate acoustic vibrationBUTLER HANS·Filed 2008·Granted Jun 28, 2016·6 cites·28 claims
- 0871US7969550B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Jun 28, 2011·3 cites·26 claims
- 0970US8928860B2Lithographic apparatus having a chuck with a visco-elastic damping layerHEMPENIUS PETER PAUL·Filed 2009·Granted Jan 6, 2015·4 cites·25 claims
- 1066US2024288389A1Charged particle assessment system and methodASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 1164US2025132122A1Assessment apparatus and methodsASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 1262US2024312756A1Platform for charged particle apparatus and components within a charged particle apparatusASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 1358US8310651B2Lithographic apparatus, method and device manufacturing methodHEMPENIUS PETER PAUL·Filed 2009·Granted Nov 13, 2012·1 cites·6 claims
- 1456US2025329511A1Electron-optical apparatus and method of obtaining topographical information about a sample surfaceASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1555US11798777B2Charged particle beam apparatus, and systems and methods for operating the apparatusASML NETHERLANDS BV·Filed 2020·Granted Oct 24, 2023·0 cites·20 claims
- 1655US2025014857A1Method and system of reducing chamber vibrationASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1751US11764030B2Stage apparatus suitable for electron beam inspection apparatusASML NETHERLANDS BV·Filed 2019·Granted Sep 19, 2023·0 cites·15 claims
- 1851US2025218720A1Method of wafer grounding utilizing wafer edge backside coating exclusion areaASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1951US2024071713A1Dual focus soluton for sem metrology toolsASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 2049US11302512B2Electron beam inspection apparatus stage positioningASML NETHERLANDS BV·Filed 2020·Granted Apr 12, 2022·0 cites·19 claims
- 2147US11621142B2Substrate positioning device and electron beam inspection toolASML NETHERLANDS BV·Filed 2020·Granted Apr 4, 2023·0 cites·14 claims
- 2246US2020303158A1Electron beam inspection tool and method for positioning an object tableASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 2345US2023114067A1Vibration damping and resonance reduction for ion pumpASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 2443US10809634B2Stage system and metrology toolASML NETHERLANDS BV·Filed 2018·Granted Oct 20, 2020·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →