Inventor · disambiguated record
Peter Gerardus Jonkers
Also filed as: JONKERS PETER GERARDUS
6 granted patents·1 pending application·8 citations·filing 2008–2023
73Inventor score
Files withASML NETHERLANDS BV4LOOPSTRA ERIK ROELOF1NIENHUYS HAN-KWANG1SCHIMMEL HENDRIKUS GIJSBERTUS1
Top patents by PatentIndex Score
7 records- 0191US11340532B2Prolonging optical element lifetime in an EUV lithography systemASML NETHERLANDS BV·Filed 2019·Granted May 24, 2022·5 cites·29 claims
- 0284US11846887B2Prolonging optical element lifetime in an EUV lithography systemASML NETHERLANDS BV·Filed 2022·Granted Dec 19, 2023·1 cites·25 claims
- 0369US2024160109A1Prolonging optical element lifetime in an euv lithography systemASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 0463US8625068B2Lithographic apparatus configured to suppress contamination from passing into the projection system and methodNIENHUYS HAN-KWANG·Filed 2010·Granted Jan 7, 2014·1 cites·19 claims
- 0557US8289498B2Lithographic apparatus and device manufacturing methodLOOPSTRA ERIK ROELOF·Filed 2009·Granted Oct 16, 2012·1 cites·8 claims
- 0650US10310394B2Lithographic apparatus, a projection system and a device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Jun 4, 2019·0 cites·14 claims
- 0744US8711325B2Method and system for determining a suppression factor of a suppression system and a lithographic apparatusSCHIMMEL HENDRIKUS GIJSBERTUS·Filed 2008·Granted Apr 29, 2014·0 cites·22 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →