Inventor · disambiguated record
Peter Nunan
Also filed as: NUNAN PETER · NUNAN PETER D
13 granted patents·5 pending applications·227 citations·filing 1999–2016
92Inventor score
Files withVARIAN SEMICONDUCTOR EQUIPMENT6KLA TENCOR TECH CORP2NUNAN PETER2ST MICROELECTRONICS INC2SULLIVAN PAUL2
Top patents by PatentIndex Score
18 records- 0196US6861666B1Apparatus and methods for determining and localization of failures in test structures using voltage contrastKLA TENCOR TECH CORP·Filed 2002·Granted Mar 1, 2005·106 cites·16 claims
- 0295US7820460B2Patterned assembly for manufacturing a solar cell and a method thereofVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Granted Oct 26, 2010·37 cites·28 claims
- 0390US8470616B2Patterned assembly for manufacturing a solar cell and a method thereofSULLIVAN PAUL·Filed 2012·Granted Jun 25, 2013·7 cites·20 claims
- 0487US8222053B2Patterned assembly for manufacturing a solar cell and a method thereofSULLIVAN PAUL·Filed 2009·Granted Jul 17, 2012·9 cites·20 claims
- 0581US6855568B2Apparatus and methods for monitoring self-aligned contact arrays using voltage contrast inspectionKLA TENCOR CORP·Filed 2001·Granted Feb 15, 2005·27 cites·21 claims
- 0670US7151018B1Method and apparatus for transistor sidewall salicidationKLA TENCOR TECH CORP·Filed 2004·Granted Dec 19, 2006·15 cites·12 claims
- 0767US7619229B2Technique for matching performance of ion implantation devices using an in-situ maskVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Granted Nov 17, 2009·2 cites·18 claims
- 0866US9773921B2Combo amorphous and LTPS transistorsAPPLIED MATERIALS INC·Filed 2016·Granted Sep 26, 2017·1 cites·20 claims
- 0966US6797640B2Method of utilizing hard mask for copper plasma etchST MICROELECTRONICS INC·Filed 2001·Granted Sep 28, 2004·9 cites·16 claims
- 1062US7820527B2Cleave initiation using varying ion implant doseVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Granted Oct 26, 2010·2 cites·19 claims
- 1161US7939424B2Wafer bonding activated by ion implantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Granted May 10, 2011·1 cites·14 claims
- 1248US2008157007A1Active particle trapping for process controlVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Application pending·0 cites
- 1347US6355979B2Hard mask for copper plasma etchST MICROELECTRONICS INC·Filed 1999·Granted Mar 12, 2002·11 cites·17 claims
- 1445US2009084757A1Uniformity control for ion beam assisted etchingEROKHIN YURI·Filed 2007·Application pending·0 cites
- 1545US2009137106A1Using ion implantation to control trench depth and alter optical properties of a substrateNUNAN PETER D·Filed 2007·Application pending·0 cites
- 1643US2007184194A1Technique for depositing metallic films using ion implantation surface modification for catalysis of electroless depositionVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Application pending·0 cites
- 1740US8461552B2Active particle trapping for process controlNUNAN PETER·Filed 2010·Granted Jun 11, 2013·0 cites·20 claims
- 1838US2009181492A1Nano-cleave a thin-film of silicon for solar cell fabricationNUNAN PETER·Filed 2008·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →