Inventor · disambiguated record
Prakash V. Arya
Also filed as: ARYA PRAKASH V
6 granted patents·2 pending applications·362 citations·filing 1996–2007
88Inventor score
Top patents by PatentIndex Score
8 records- 0196US5955037AEffluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gasesATMI ECOSYS CORP·Filed 1996·Granted Sep 21, 1999·156 cites·49 claims
- 0288US5935283AClog-resistant entry structure for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing systemATMI ECOSYS CORP·Filed 1997·Granted Aug 10, 1999·85 cites·19 claims
- 0387US7695700B2Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gasesAPPLIED MATERIALS INC·Filed 2007·Granted Apr 13, 2010·11 cites·14 claims
- 0483US7214349B2Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gasesAPPLIED MATERIALS INC·Filed 2001·Granted May 8, 2007·24 cites·24 claims
- 0583US5833888AWeeping weir gas/liquid interface structureATMI ECOSYS CORP·Filed 1996·Granted Nov 10, 1998·53 cites·19 claims
- 0679US6333010B1Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gasesADVANCED TECH MATERIALS·Filed 1999·Granted Dec 25, 2001·33 cites·14 claims
- 0764US2009010814A1Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gasesHOLST MARK·Filed 2007·Application pending·0 cites
- 0853US2007166205A1Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gasesHOLST MARK·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →