Inventor · disambiguated record
Prashant Kumar Kulshreshtha
Also filed as: KULSHRESHTHA PRASHANT · KULSHRESHTHA PRASHANT KUMAR
42 granted patents·17 pending applications·50 citations·filing 2014–2025
96Inventor score
Files withAPPLIED MATERIALS INC59
Top patents by PatentIndex Score
59 records- 0194US11728168B2Ultra-high modulus and etch selectivity boron-carbon hardmask filmsAPPLIED MATERIALS INC·Filed 2021·Granted Aug 15, 2023·2 cites·18 claims
- 0294US11469107B2Highly etch selective amorphous carbon filmAPPLIED MATERIALS INC·Filed 2020·Granted Oct 11, 2022·4 cites·20 claims
- 0394US10403535B2Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition systemAPPLIED MATERIALS INC·Filed 2015·Granted Sep 3, 2019·11 cites·17 claims
- 0492US10418243B2Ultra-high modulus and etch selectivity boron-carbon hardmask filmsAPPLIED MATERIALS INC·Filed 2016·Granted Sep 17, 2019·6 cites·20 claims
- 0588US11031262B2Loadlock integrated bevel etcher systemAPPLIED MATERIALS INC·Filed 2020·Granted Jun 8, 2021·2 cites·20 claims
- 0688US9711360B2Methods to improve in-film particle performance of amorphous boron-carbon hardmask process in PECVD systemAPPLIED MATERIALS INC·Filed 2016·Granted Jul 18, 2017·5 cites·20 claims
- 0787US11613808B2Clean processes for boron carbon film depositionAPPLIED MATERIALS INC·Filed 2020·Granted Mar 28, 2023·2 cites·15 claims
- 0886US9390910B2Gas flow profile modulated control of overlay in plasma CVD filmsAPPLIED MATERIALS INC·Filed 2014·Granted Jul 12, 2016·5 cites·20 claims
- 0985US11584994B2Pedestal for substrate processing chambersAPPLIED MATERIALS INC·Filed 2019·Granted Feb 21, 2023·1 cites·21 claims
- 1083US12211694B2Ultra-high modulus and etch selectivity boron-carbon hardmask filmsAPPLIED MATERIALS INC·Filed 2023·Granted Jan 28, 2025·0 cites·19 claims
- 1182US10373822B2Gas flow profile modulated control of overlay in plasma CVD filmsAPPLIED MATERIALS INC·Filed 2017·Granted Aug 6, 2019·2 cites·18 claims
- 1280US12000048B2Pedestal for substrate processing chambersAPPLIED MATERIALS INC·Filed 2023·Granted Jun 4, 2024·0 cites·20 claims
- 1379US12112949B2Highly etch selective amorphous carbon filmAPPLIED MATERIALS INC·Filed 2022·Granted Oct 8, 2024·0 cites·29 claims
- 1479US11600470B2Targeted heat control systemsAPPLIED MATERIALS INC·Filed 2019·Granted Mar 7, 2023·2 cites·20 claims
- 1578US12014927B2Highly etch selective amorphous carbon filmAPPLIED MATERIALS INC·Filed 2022·Granted Jun 18, 2024·0 cites·20 claims
- 1677US10679830B2Cleaning process for removing boron-carbon residuals in processing chamber at high temperatureAPPLIED MATERIALS INC·Filed 2017·Granted Jun 9, 2020·2 cites·25 claims
- 1776US12334384B2Methods and apparatus for minimizing substrate backside damageAPPLIED MATERIALS INC·Filed 2023·Granted Jun 17, 2025·0 cites·17 claims
- 1876US12211728B2Electrostatic chuck design with improved chucking and arcing performanceAPPLIED MATERIALS INC·Filed 2023·Granted Jan 28, 2025·0 cites·20 claims
- 1976US10504727B2Thick tungsten hardmask films deposition on high compressive/tensile bow wafersAPPLIED MATERIALS INC·Filed 2017·Granted Dec 10, 2019·2 cites·20 claims
- 2075US2023151487A1Methods of reducing chamber residuesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2174US10636684B2Loadlock integrated bevel etcher systemAPPLIED MATERIALS INC·Filed 2019·Granted Apr 28, 2020·1 cites·20 claims
- 2273US2025022709A1Plasma-enhanced chemical vapor deposition of carbon hard-maskAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2371US9837265B2Gas flow profile modulated control of overlay in plasma CVD filmsAPPLIED MATERIALS INC·Filed 2016·Granted Dec 5, 2017·1 cites·7 claims
- 2469US10403515B2Loadlock integrated bevel etcher systemAPPLIED MATERIALS INC·Filed 2016·Granted Sep 3, 2019·1 cites·13 claims
- 2568US11560623B2Methods of reducing chamber residuesAPPLIED MATERIALS INC·Filed 2020·Granted Jan 24, 2023·0 cites·16 claims
- 2667US10325800B2High temperature electrostatic chucking with dielectric constant engineered in-situ charge trap materialsAPPLIED MATERIALS INC·Filed 2014·Granted Jun 18, 2019·1 cites·12 claims
- 2764US10971364B2Ultra-high modulus and etch selectivity boron carbon hardmask filmsAPPLIED MATERIALS INC·Filed 2018·Granted Apr 6, 2021·0 cites·15 claims
- 2864US10950445B2Deposition of metal silicide layers on substrates and chamber componentsAPPLIED MATERIALS INC·Filed 2020·Granted Mar 16, 2021·0 cites·20 claims
- 2964US2025239441A1Process stage transition detection for plasma systemsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3062US10923334B2Selective deposition of hardmaskAPPLIED MATERIALS INC·Filed 2019·Granted Feb 16, 2021·0 cites·23 claims
- 3161US11430641B1Processing systems and methods to control process driftAPPLIED MATERIALS INC·Filed 2021·Granted Aug 30, 2022·0 cites·18 claims
- 3261US2025259829A1Component, system, and method for improved foreline cleaningAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 3360US11682574B2Electrostatic chuck design with improved chucking and arcing performanceAPPLIED MATERIALS INC·Filed 2019·Granted Jun 20, 2023·0 cites·20 claims
- 3460US10930475B2Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon filmsAPPLIED MATERIALS INC·Filed 2018·Granted Feb 23, 2021·0 cites·20 claims
- 3559US2025391654A1Fast carbon plugfill for patterns with large critical dimensionsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3659US2025191909A1Uniform gapfill deposition on semiconductor substrates with varying geometriesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3758US12136549B2Plasma-enhanced chemical vapor deposition of carbon hard-maskAPPLIED MATERIALS INC·Filed 2019·Granted Nov 5, 2024·0 cites·20 claims
- 3858US11756819B2Methods and apparatus for minimizing substrate backside damageAPPLIED MATERIALS INC·Filed 2020·Granted Sep 12, 2023·0 cites·10 claims
- 3956US2019355609A1High temperature electrostatic chucking with dielectric constant engineered in-situ charge trap materialsAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 4055US2025140537A1Chamber and methods for downstream residue managementAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4154US10734232B2Deposition of metal silicide layers on substrates and chamber componentsAPPLIED MATERIALS INC·Filed 2018·Granted Aug 4, 2020·0 cites·20 claims
- 4254US10128088B2Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon filmsAPPLIED MATERIALS INC·Filed 2016·Granted Nov 13, 2018·0 cites·20 claims
- 4352US11821082B2Reduced defect deposition processesAPPLIED MATERIALS INC·Filed 2020·Granted Nov 21, 2023·0 cites·19 claims
- 4451US2020140999A1Process chamber component cleaning methodAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 4550US12027366B2Reduced hydrogen deposition processesAPPLIED MATERIALS INC·Filed 2020·Granted Jul 2, 2024·0 cites·20 claims
- 4650US11830706B2Heated pedestal design for improved heat transfer and temperature uniformityAPPLIED MATERIALS INC·Filed 2019·Granted Nov 28, 2023·0 cites·19 claims
- 4750US11322352B2Nitrogen-doped carbon hardmask filmsAPPLIED MATERIALS INC·Filed 2020·Granted May 3, 2022·0 cites·21 claims
- 4847US12100609B2Electrostatic chucking processAPPLIED MATERIALS INC·Filed 2020·Granted Sep 24, 2024·0 cites·17 claims
- 4946US11810764B2Faceplate with edge flow controlAPPLIED MATERIALS INC·Filed 2020·Granted Nov 7, 2023·0 cites·20 claims
- 5046US2020328066A1Plasma densification within a processing chamberAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
Showing the top 50 of 59 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →