Inventor · disambiguated record
R. Suryanarayanan Iyer
Also filed as: IYER R S · IYER R SURYANARAYANAN
10 granted patents·12 pending applications·1,558 citations·filing 2002–2010
92Inventor score
Top patents by PatentIndex Score
22 records- 0198US7473655B2Method for silicon based dielectric chemical vapor depositionAPPLIED MATERIALS INC·Filed 2005·Granted Jan 6, 2009·430 cites·23 claims
- 0297US7294581B2Method for fabricating silicon nitride spacer structuresAPPLIED MATERIALS INC·Filed 2005·Granted Nov 13, 2007·535 cites·21 claims
- 0396US7601652B2Method for treating substrates and films with photoexcitationAPPLIED MATERIALS INC·Filed 2005·Granted Oct 13, 2009·486 cites·18 claims
- 0491US7465669B2Method of fabricating a silicon nitride stackAPPLIED MATERIALS INC·Filed 2005·Granted Dec 16, 2008·33 cites·20 claims
- 0590US7416995B2Method for fabricating controlled stress silicon nitride filmsAPPLIED MATERIALS INC·Filed 2005·Granted Aug 26, 2008·19 cites·18 claims
- 0687US7341907B2Single wafer thermal CVD processes for hemispherical grained silicon and nano-crystalline grain-sized polysiliconAPPLIED MATERIALS INC·Filed 2005·Granted Mar 11, 2008·16 cites·20 claims
- 0779US7365029B2Method for silicon nitride chemical vapor depositionAPPLIED MATERIALS INC·Filed 2005·Granted Apr 29, 2008·6 cites·11 claims
- 0876US6884464B2Methods for forming silicon comprising films using hexachlorodisilane in a single-wafer deposion chamberAPPLIED MATERIALS INC·Filed 2002·Granted Apr 26, 2005·21 cites·20 claims
- 0965US7488690B2Silicon nitride film with stress controlAPPLIED MATERIALS INC·Filed 2004·Granted Feb 10, 2009·11 cites·30 claims
- 1056US2006102076A1Apparatus and method for the deposition of silicon nitride filmsAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 1155US9892941B2Multi-zone resistive heaterCUI ANQING·Filed 2009·Granted Feb 13, 2018·1 cites·20 claims
- 1248US2005109276A1Thermal chemical vapor deposition of silicon nitride using BTBAS bis(tertiary-butylamino silane) in a single wafer chamberAPPLIED MATERIALS INC·Filed 2004·Application pending·0 cites
- 1348US2007082507A1Method and apparatus for the low temperature deposition of doped silicon nitride filmsAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 1448US2009111284A1Method for silicon based dielectric chemical vapor depositionWANG YAXIN·Filed 2009·Application pending·0 cites
- 1548US2006281310A1Rotating substrate support and methods of useAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 1643US2008119059A1Low thermal budget chemical vapor deposition processingSMITH JACOB W·Filed 2006·Application pending·0 cites
- 1743US2008197125A1Substrate heating method and apparatusAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 1841US2007125762A1Multi-zone resistive heaterAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 1941US2008145536A1METHOD AND APPARATUS FOR LOW TEMPERATURE AND LOW K SiBN DEPOSITIONAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 2040US2010224130A1Rotating substrate support and methods of useSMITH JACOB·Filed 2010·Application pending·0 cites
- 2140US2008246101A1Method of poly-silicon grain structure formationAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 2239US2006286819A1Method for silicon based dielectric deposition and clean with photoexcitationAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →