Inventor · disambiguated record
Raymond Nicholas Vrtis
Also filed as: VRTIS RAYMOND N · VRTIS RAYMOND NICHOLAS
62 granted patents·35 pending applications·3,243 citations·filing 1989–2025
99Inventor score
Files withVERSUM MAT US LLC46AIR PROD & CHEM34VRTIS RAYMOND NICHOLAS4LAM RES CORP2HAAS MARY KATHRYN1
Top patents by PatentIndex Score
97 records- 0199US6846515B2Methods for using porogens and/or porogenated precursors to provide porous organosilica glass films with low dielectric constantsAIR PROD & CHEM·Filed 2002·Granted Jan 25, 2005·667 cites·99 claims
- 0298US10468244B2Precursors and flowable CVD methods for making low-K films to fill surface featuresVERSUM MAT US LLC·Filed 2017·Granted Nov 5, 2019·388 cites·9 claims
- 0398US7098149B2Mechanical enhancement of dense and porous organosilicate materials by UV exposureAIR PROD & CHEM·Filed 2003·Granted Aug 29, 2006·624 cites·31 claims
- 0498US6583048B2Organosilicon precursors for interlayer dielectric films with low dielectric constantsAIR PROD & CHEM·Filed 2001·Granted Jun 24, 2003·761 cites·56 claims
- 0597US7332445B2Porous low dielectric constant compositions and methods for making and using sameAIR PROD & CHEM·Filed 2005·Granted Feb 19, 2008·65 cites·55 claims
- 0695US6716770B2Low dielectric constant material and method of processing by CVDAIR PROD & CHEM·Filed 2001·Granted Apr 6, 2004·110 cites·56 claims
- 0794US7500397B2Activated chemical process for enhancing material properties of dielectric filmsAIR PROD & CHEM·Filed 2008·Granted Mar 10, 2009·30 cites·46 claims
- 0891US9922818B2Alkyl-alkoxysilacyclic compoundsAIR PROD & CHEM·Filed 2015·Granted Mar 20, 2018·8 cites·31 claims
- 0990US7581549B2Method for removing carbon-containing residues from a substrateAIR PROD & CHEM·Filed 2005·Granted Sep 1, 2009·18 cites·20 claims
- 1090US7404990B2Non-thermal process for forming porous low dielectric constant filmsAIR PROD & CHEM·Filed 2002·Granted Jul 29, 2008·47 cites·33 claims
- 1190US5874516ANonfunctionalized poly(arylene ethers)AIR PROD & CHEM·Filed 1995·Granted Feb 23, 1999·115 cites·21 claims
- 1289US9212420B2Chemical vapor deposition methodLEE ERIC M·Filed 2010·Granted Dec 15, 2015·6 cites·23 claims
- 1389US8399349B2Materials and methods of forming controlled voidVRTIS RAYMOND NICHOLAS·Filed 2007·Granted Mar 19, 2013·13 cites·13 claims
- 1488US10354860B2Method and precursors for manufacturing 3D devicesAIR PROD & CHEM·Filed 2015·Granted Jul 16, 2019·5 cites·34 claims
- 1588US7468290B2Mechanical enhancement of dense and porous organosilicate materials by UV exposureAIR PROD & CHEM·Filed 2003·Granted Dec 23, 2008·33 cites·20 claims
- 1687US10249489B2Use of silyl bridged alkyl compounds for dense OSG filmsVERSUM MAT US LLC·Filed 2017·Granted Apr 2, 2019·7 cites·25 claims
- 1787US7932188B2Mechanical enhancement of dense and porous organosilicate materials by UV exposureAIR PROD & CHEM·Filed 2008·Granted Apr 26, 2011·9 cites·19 claims
- 1886US5658994ANonfunctionalized poly(arylene ether) dielectricsAIR PROD & CHEM·Filed 1995·Granted Aug 19, 1997·88 cites·11 claims
- 1986US2025188605A1Compositions and Methods Using Same for Deposition of Silicon-Containing FilmVERSUM MAT US LLC·Filed 2024·Application pending·0 cites
- 2085US10106890B2Compositions and methods using same for deposition of silicon-containing filmVERSUM MAT US LLC·Filed 2015·Granted Oct 23, 2018·3 cites·9 claims
- 2185US7384471B2Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constantsAIR PROD & CHEM·Filed 2003·Granted Jun 10, 2008·28 cites·35 claims
- 2284US7943195B2Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constantsAIR PROD & CHEM·Filed 2008·Granted May 17, 2011·8 cites·20 claims
- 2384US5626775APlasma etch with trifluoroacetic acid and derivativesAIR PROD & CHEM·Filed 1996·Granted May 6, 1997·73 cites·20 claims
- 2483US8293001B2Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constantsVRTIS RAYMOND NICHOLAS·Filed 2011·Granted Oct 23, 2012·6 cites·4 claims
- 2582US10319862B2Barrier materials for display devicesAIR PROD & CHEM·Filed 2013·Granted Jun 11, 2019·6 cites·10 claims
- 2682US9061317B2Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constantsVRTIS RAYMOND NICHOLAS·Filed 2012·Granted Jun 23, 2015·8 cites·20 claims
- 2780US8951342B2Methods for using porogens for low k porous organosilica glass filmsVRTIS RAYMOND NICHOLAS·Filed 2011·Granted Feb 10, 2015·5 cites·23 claims
- 2879US10395920B2Alkyl-alkoxysilacyclic compoundsVERSUM MAT US LLC·Filed 2018·Granted Aug 27, 2019·2 cites·14 claims
- 2977US5492736AFluorine doped silicon oxide processAIR PROD & CHEM·Filed 1994·Granted Feb 20, 1996·60 cites·15 claims
- 3076US2023339986A1Stable alkenyl or alkynyl-containing organosilicon precursor compositionsVERSUM MAT US LLC·Filed 2023·Application pending·0 cites
- 3174US12505999B2Precursors and flowable CVD methods for making low-K films to fill surface featuresVERSUM MAT US LLC·Filed 2022·Granted Dec 23, 2025·0 cites·9 claims
- 3273US11158498B2Silicon compounds and methods for depositing films using sameVERSUM MAT US LLC·Filed 2019·Granted Oct 26, 2021·1 cites·17 claims
- 3373US7470454B2Non-thermal process for forming porous low dielectric constant filmsAIR PROD & CHEM·Filed 2003·Granted Dec 30, 2008·14 cites·40 claims
- 3473US2024093366A1Compositions and methods for depositing silicon-containing filmsVERSUM MAT US LLC·Filed 2023·Application pending·0 cites
- 3572US11884689B2Alkoxysilacyclic or acyloxysilacyclic compounds and methods for depositing films using sameVERSUM MAT US LLC·Filed 2018·Granted Jan 30, 2024·1 cites·14 claims
- 3672US8753986B2Low k precursors providing superior integration attributesHAAS MARY KATHRYN·Filed 2010·Granted Jun 17, 2014·4 cites·21 claims
- 3772US2025223466A1Compositions comprising silacycloalkanes and methods using same for deposition of silicon-containing filmVERSUM MAT US LLC·Filed 2025·Application pending·0 cites
- 3872US2024182499A1Alkoxysilacyclic or acyloxysilacyclic compounds and methods for depositing films using sameVERSUM MAT US LLC·Filed 2024·Application pending·0 cites
- 3971US8043976B2Adhesion to copper and copper electromigration resistanceAIR PROD & CHEM·Filed 2009·Granted Oct 25, 2011·3 cites·36 claims
- 4069US8637396B2Dielectric barrier deposition using oxygen containing precursorMATZ LAURA M·Filed 2009·Granted Jan 28, 2014·3 cites·32 claims
- 4169US2025215557A1Compositions and methods using same for deposition of silicon-containing filmVERSUM MAT US LLC·Filed 2025·Application pending·0 cites
- 4269US2024392434A1Compositions and methods using same for deposition of silicon-containing filmVERSUM MAT US LLC·Filed 2024·Application pending·0 cites
- 4367US11713328B2Stable alkenyl or alkynyl-containing organosilicon precursor compositionsVERSUM MAT US LLC·Filed 2019·Granted Aug 1, 2023·0 cites·8 claims
- 4466US11626279B2Compositions and methods for making silicon containing filmsVERSUM MAT US LLC·Filed 2013·Granted Apr 11, 2023·2 cites·13 claims
- 4566US8846522B2Materials and methods of forming controlled voidAIR PROD & CHEM·Filed 2013·Granted Sep 30, 2014·1 cites·7 claims
- 4665US12441747B2Silicon compounds and methods for depositing films using sameVERSUM MAT US LLC·Filed 2022·Granted Oct 14, 2025·0 cites·2 claims
- 4765US11270880B2Precursors and flowable CVD methods for making low-k films to fill surface featuresVERSUM MAT US LLC·Filed 2019·Granted Mar 8, 2022·0 cites·6 claims
- 4865US9018107B2Low K precursors providing superior integration attributesAIR PROD & CHEM·Filed 2014·Granted Apr 28, 2015·1 cites·7 claims
- 4965US2025270698A1Boron-containing precursors for the ald deposition of boron nitride filmsVERSUM MAT US LLC·Filed 2023·Application pending·0 cites
- 5064US9976037B2Composition for treating surface of substrate, method and deviceAIR PROD & CHEM·Filed 2016·Granted May 22, 2018·1 cites·23 claims
Showing the top 50 of 97 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →