Inventor · disambiguated record
Rene George
Also filed as: GEORGE RENE
27 granted patents·20 pending applications·563 citations·filing 1998–2025
96Inventor score
Top patents by PatentIndex Score
47 records- 0196US11658006B2Plasma sources and plasma processing apparatus thereofAPPLIED MATERIALS INC·Filed 2021·Granted May 23, 2023·4 cites·10 claims
- 0295US6335293B1Systems and methods for two-sided etch of a semiconductor substrateMATTSON TECH INC·Filed 1999·Granted Jan 1, 2002·384 cites·20 claims
- 0394US11959169B2Asymmetric injection for better wafer uniformityAPPLIED MATERIALS INC·Filed 2022·Granted Apr 16, 2024·2 cites·10 claims
- 0492US11486038B2Asymmetric injection for better wafer uniformityAPPLIED MATERIALS INC·Filed 2020·Granted Nov 1, 2022·3 cites·20 claims
- 0591US11854770B2Plasma processing with independent temperature controlAPPLIED MATERIALS INC·Filed 2021·Granted Dec 26, 2023·2 cites·23 claims
- 0686US9831091B2Plasma treating a process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Nov 28, 2017·4 cites·10 claims
- 0786US9184072B2Advanced multi-workpiece processing chamberDEVINE DANIEL J·Filed 2007·Granted Nov 10, 2015·16 cites·45 claims
- 0884US7232767B2Slotted electrostatic shield modification for improved etch and CVD process uniformityMATTSON TECH INC·Filed 2004·Granted Jun 19, 2007·25 cites·20 claims
- 0982US7276122B2Multi-workpiece processing chamberMATTSON TECH INC·Filed 2004·Granted Oct 2, 2007·25 cites·24 claims
- 1079US12272521B2Plasma sources and plasma processing apparatus thereofAPPLIED MATERIALS INC·Filed 2023·Granted Apr 8, 2025·0 cites·16 claims
- 1179US8066815B2Multi-workpiece processing chamberDEVINE DANIEL J·Filed 2007·Granted Nov 29, 2011·7 cites·13 claims
- 1279US6624082B2Systems and methods for two-sided etch of a semiconductor substrateMATTSON TECH INC·Filed 2001·Granted Sep 23, 2003·23 cites·18 claims
- 1376US6379576B2Systems and methods for variable mode plasma enhanced processing of semiconductor wafersMATTSON TECH INC·Filed 1998·Granted Apr 30, 2002·47 cites·40 claims
- 1474US11077410B2Gas injector with baffleAPPLIED MATERIALS INC·Filed 2018·Granted Aug 3, 2021·1 cites·19 claims
- 1574US2025174444A1Uniformity control for plasma processingAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1673US10290504B2Plasma treating a process chamberAPPLIED MATERIALS INC·Filed 2017·Granted May 14, 2019·1 cites·16 claims
- 1773US2025385082A1Dual pressure oxidation method for forming an oxide layer in a featureAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1872US12272531B2Dual pressure oxidation method for forming an oxide layer in a featureAPPLIED MATERIALS INC·Filed 2022·Granted Apr 8, 2025·0 cites·20 claims
- 1972US7799685B2System and method for removal of photoresist in transistor fabrication for integrated circuit manufacturingMATTSON TECH INC·Filed 2004·Granted Sep 21, 2010·16 cites·23 claims
- 2072US2024170263A1Plasma processing with independent temperature controlAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2169US12211677B2Uniformity control for plasma processingAPPLIED MATERIALS INC·Filed 2021·Granted Jan 28, 2025·0 cites·20 claims
- 2268US11529592B2Gas injector with baffleAPPLIED MATERIALS INC·Filed 2021·Granted Dec 20, 2022·0 cites·20 claims
- 2365US11885021B2Gas supply member with baffleAPPLIED MATERIALS INC·Filed 2021·Granted Jan 30, 2024·0 cites·19 claims
- 2463US8413604B2Slotted electrostatic shield modification for improved etch and CVD process uniformityGEORGE RENE·Filed 2006·Granted Apr 9, 2013·2 cites·11 claims
- 2562US7947605B2Post ion implant photoresist strip using a pattern fill and methodMATTSON TECH INC·Filed 2007·Granted May 24, 2011·1 cites·29 claims
- 2659US12139790B2Processing system and method of delivering a reactant gasAPPLIED MATERIALS INC·Filed 2020·Granted Nov 12, 2024·0 cites·17 claims
- 2759US10504779B2Hydrogenation and nitridization processes for reducing oxygen content in a filmAPPLIED MATERIALS INC·Filed 2019·Granted Dec 10, 2019·0 cites·20 claims
- 2859US2025379047A1Thin and high-quality oxide layersAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2959US2025132147A1Methods for treatment of high-k materials to reduce leakage current and increase capacitanceAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3058US2024355592A1Uniform plasma processing with a linear plasma sourceAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3157US2025364220A1Bilayer plasma oxidation processesAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3257US2024170261A1Plasma generator for edge uniformityAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 3356US2024162011A1Addition of external ultraviolet light for improved plasma strike consistencyAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 3455US2024266146A1Plasma processing improvementAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3554US11124878B2Gas supply member with baffleAPPLIED MATERIALS INC·Filed 2018·Granted Sep 21, 2021·0 cites·17 claims
- 3654US2023411121A1Stackable plasma source for plasma processingAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 3754US2023411122A1Stackable plasma source for plasma processingAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 3852US2013196510A1Slotted electrostatic shield modification for improved etch and cvd process uniformityMATTSON TECH INC·Filed 2013·Application pending·0 cites
- 3951US10236207B2Hydrogenation and nitridization processes for reducing oxygen content in a filmAPPLIED MATERIALS INC·Filed 2017·Granted Mar 19, 2019·0 cites·20 claims
- 4051US2023215702A1Uniformity control for plasma processing using wall recombinationAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 4150US10971357B2Thin film treatment processAPPLIED MATERIALS INC·Filed 2018·Granted Apr 6, 2021·0 cites·20 claims
- 4247US2022165547A1Novel and effective homogenize flow mixing designAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 4345US2022223383A1Process system with variable flow valveAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 4441US2007012251A1Seal arrangement with corrosion barrier and methodZUCKER MARTIN·Filed 2006·Application pending·0 cites
- 4539US2005205210A1Advanced multi-pressure workpiece processingDEVINE DANIEL J·Filed 2005·Application pending·0 cites
- 4637US2004084150A1Photoresist implant crust removalFiled 2003·Application pending·0 cites
- 4726US2001009177A1Systems and methods for two-sided etch of a semiconductor substrateFiled 1999·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →