Inventor · disambiguated record
Ronald Thomas Bertram, Jr.
Also filed as: BERTRAM JR RONALD THOMAS · BERTRAM RONALD · BERTRAM RONALD T · BERTRAM RONALD THOMAS
19 granted patents·16 pending applications·136 citations·filing 1997–2016
93Inventor score
Files withARENA CHANTAL8BERTRAM JR RONALD THOMAS8SOITEC SILICON ON INSULATOR8TOKYO ELECTRON LTD3ASM INC2
Top patents by PatentIndex Score
35 records- 0196US7816236B2Selective deposition of silicon-containing filmsASM INC·Filed 2006·Granted Oct 19, 2010·42 cites·34 claims
- 0289US8388755B2Thermalization of gaseous precursors in CVD reactorsARENA CHANTAL·Filed 2008·Granted Mar 5, 2013·13 cites·23 claims
- 0385US9412580B2Methods for forming group III-nitride materials and structures formed by such methodsARENA CHANTAL·Filed 2011·Granted Aug 9, 2016·7 cites·15 claims
- 0484US8574968B2Epitaxial methods and templates grown by the methodsARENA CHANTAL·Filed 2008·Granted Nov 5, 2013·12 cites·19 claims
- 0582US7550075B2Removal of contaminants from a fluidTOKYO ELECTRON LTD·Filed 2005·Granted Jun 23, 2009·8 cites·19 claims
- 0678US9481944B2Gas injectors including a funnel- or wedge-shaped channel for chemical vapor deposition (CVD) systems and CVD systems with the sameSOITEC SILICON ON INSULATOR·Filed 2013·Granted Nov 1, 2016·1 cites·9 claims
- 0778US8431419B2UV absorption based monitor and control of chloride gas streamBERTRAM JR RONALD THOMAS·Filed 2009·Granted Apr 30, 2013·3 cites·15 claims
- 0875US8377802B2III-V semiconductor structures and methods for forming the sameSOITEC SILICON ON INSULATOR·Filed 2011·Granted Feb 19, 2013·3 cites·13 claims
- 0974US9023721B2Methods of forming bulk III-nitride materials on metal-nitride growth template layers, and structures formed by such methodsARENA CHANTAL·Filed 2011·Granted May 5, 2015·3 cites·12 claims
- 1072US8741385B2Thermalization of gaseous precursors in CVD reactorsSOITEC SILICON ON INSULATOR·Filed 2013·Granted Jun 3, 2014·2 cites·18 claims
- 1168US8486192B2Thermalizing gas injectors for generating increased precursor gas, material deposition systems including such injectors, and related methodsBERTRAM JR RONALD THOMAS·Filed 2010·Granted Jul 16, 2013·2 cites·26 claims
- 1265US9012919B2III-V semiconductor structures and methods for forming the sameSOITEC SILICON ON INSULATOR·Filed 2013·Granted Apr 21, 2015·1 cites·20 claims
- 1365US8455370B2Transfer of high temperature wafersTISCHLER MICHAEL ALBERT·Filed 2012·Granted Jun 4, 2013·1 cites·20 claims
- 1463US8153536B2Transfer of high temperature wafersTISCHLER MICHAEL ALBERT·Filed 2008·Granted Apr 10, 2012·1 cites·20 claims
- 1558US9175419B2Apparatus for delivering precursor gases to an epitaxial growth substrateARENA CHANTAL·Filed 2008·Granted Nov 3, 2015·0 cites·12 claims
- 1657US6121140AMethod of improving surface morphology and reducing resistivity of chemical vapor deposition-metal filmsTOKYO ELECTRON LTD·Filed 1997·Granted Sep 19, 2000·18 cites·17 claims
- 1757US2010180913A1Methods for in-situ chamber cleaning process for high volume manufacture of semiconductor materialsARENA CHANTAL·Filed 2008·Application pending·0 cites
- 1855US2010000681A1Phase change based heating element system and methodSUPERCRITICAL SYSTEMS INC·Filed 2009·Application pending·0 cites
- 1954US6090705AMethod of eliminating edge effect in chemical vapor deposition of a metalTOKYO ELECTRON LTD·Filed 1998·Granted Jul 18, 2000·19 cites·34 claims
- 2051US2013280892A1Methods of depositing a semiconductor material on a substrateSOITEC SILICON ON INSULATOR·Filed 2013·Application pending·0 cites
- 2150US2015167161A1Gas injection components for deposition systems and related methodsSOITEC SILICON ON INSULATOR·Filed 2013·Application pending·0 cites
- 2250US2015099065A1Gas injection components for deposition systems, deposition systems including such components, and related methodsSOITEC SILICON ON INSULATOR·Filed 2013·Application pending·0 cites
- 2349US2013160802A1Processes and systems for reducing undesired deposits within a reaction chamber associated with a semiconductor deposition systemBERTRAM JR RONALD THOMAS·Filed 2012·Application pending·0 cites
- 2448US9644285B2Direct liquid injection for halide vapor phase epitaxy systems and methodsBERTRAM JR RONALD THOMAS·Filed 2012·Granted May 9, 2017·0 cites·22 claims
- 2547US2013052806A1Deposition systems having access gates at desirable locations, and related methodsBERTRAM JR RONALD THOMAS·Filed 2012·Application pending·0 cites
- 2647US2016145767A1Deposition systems having access gates at desirable locations, and related methodsSOITEC SILICON ON INSULATOR·Filed 2016·Application pending·0 cites
- 2747US2013047918A1Deposition systems including a precursor gas furnace within a reaction chamber, and related methodsBERTRAM JR RONALD THOMAS·Filed 2012·Application pending·0 cites
- 2846US2011033610A1Modular and readily configurable reactor enclosures and associated function modulesBERTRAM JR RONALD THOMAS·Filed 2009·Application pending·0 cites
- 2945US2011277681A1Gas injectors for cvd systems with the sameARENA CHANTAL·Filed 2010·Application pending·0 cites
- 3044US2008026149A1Methods and systems for selectively depositing si-containing films using chloropolysilanesASM INC·Filed 2007·Application pending·0 cites
- 3144US2011305835A1Systems and methods for a gas treatment of a number of substratesBERTRAM JR RONALD THOMAS·Filed 2010·Application pending·0 cites
- 3243US2006226117A1Phase change based heating element system and methodBERTRAM RONALD T·Filed 2005·Application pending·0 cites
- 3339US9076666B2Template layers for heteroepitaxial deposition of III-nitride semiconductor materials using HVPE processesARENA CHANTAL·Filed 2011·Granted Jul 7, 2015·0 cites·18 claims
- 3435US2013052333A1Deposition systems having reaction chambers configured for in-situ metrology and related methodsLINDOW ED·Filed 2011·Application pending·0 cites
- 3534US2004016450A1Method for reducing the formation of contaminants during supercritical carbon dioxide processesFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →