Inventor · disambiguated record
Roie Volkovich
Also filed as: VOLKOVICH ROIE
35 granted patents·2 pending applications·42 citations·filing 2014–2024
95Inventor score
Top patents by PatentIndex Score
37 records- 0197US11355375B2Device-like overlay metrology targets displaying Moiré effectsKLA CORP·Filed 2020·Granted Jun 7, 2022·6 cites·21 claims
- 0292US11761969B2System and method for analyzing a sample with a dynamic recipe based on iterative experimentation and feedbackKLA CORP·Filed 2020·Granted Sep 19, 2023·4 cites·25 claims
- 0392US11353799B1System and method for error reduction for metrology measurementsKLA CORP·Filed 2020·Granted Jun 7, 2022·5 cites·25 claims
- 0490US11353321B2Metrology system and method for measuring diagonal diffraction-based overlay targetsKLA CORP·Filed 2020·Granted Jun 7, 2022·2 cites·23 claims
- 0589US9934353B2Focus measurements using scatterometry metrologyKLA TENCOR CORP·Filed 2015·Granted Apr 3, 2018·5 cites·22 claims
- 0688US11532566B2Misregistration target having device-scaled features useful in measuring misregistration of semiconductor devicesKLA CORP·Filed 2020·Granted Dec 20, 2022·2 cites·19 claims
- 0783US11635682B2Systems and methods for feedforward process control in the manufacture of semiconductor devicesKLA CORP·Filed 2020·Granted Apr 25, 2023·2 cites·16 claims
- 0883US10754260B2Method and system for process control with flexible samplingKLA TENCOR CORP·Filed 2016·Granted Aug 25, 2020·3 cites·30 claims
- 0979US10962951B2Process and metrology control, process indicators and root cause analysis tools based on landscape informationKLA TENCOR CORP·Filed 2018·Granted Mar 30, 2021·5 cites·13 claims
- 1076US10303835B2Method and apparatus for direct self assembly in target design and productionKLA TENCOR CORP·Filed 2015·Granted May 28, 2019·2 cites·26 claims
- 1175US10340196B1Method and system for selection of metrology targets for use in focus and dose applicationsKLA TENCOR CORP·Filed 2014·Granted Jul 2, 2019·3 cites·31 claims
- 1273US11018064B2Multiple-tool parameter set configuration and misregistration measurement system and methodKLA CORP·Filed 2019·Granted May 25, 2021·2 cites·20 claims
- 1369US10763146B2Recipe optimization based zonal analysisKLA TENCOR CORP·Filed 2017·Granted Sep 1, 2020·1 cites·13 claims
- 1468US11644419B2Measurement of properties of patterned photoresistKLA CORP·Filed 2021·Granted May 9, 2023·0 cites·18 claims
- 1567US12347706B2Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful thereinKLA TENCOR CORP·Filed 2022·Granted Jul 1, 2025·0 cites·14 claims
- 1664US11226566B2Method of measuring misregistration of semiconductor devicesKLA TENCOR CORP·Filed 2021·Granted Jan 18, 2022·0 cites·16 claims
- 1763US11467503B2Field-to-field corrections using overlay targetsKLA CORP·Filed 2021·Granted Oct 11, 2022·0 cites·22 claims
- 1860US2025272812A1Side-by-side off-center die overlay targetKLA CORP·Filed 2024·Application pending·0 cites
- 1959US10990022B2Field-to-field corrections using overlay targetsKLA CORP·Filed 2019·Granted Apr 27, 2021·0 cites·13 claims
- 2058US11060845B2Polarization measurements of metrology targets and corresponding target designsKLA TENCOR CORP·Filed 2019·Granted Jul 13, 2021·0 cites·42 claims
- 2158US2025054872A1Overlay metrology target for die-to-wafer overlay metrologyKLA CORP·Filed 2024·Application pending·0 cites
- 2255US11302544B2Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful thereinKLA TENCOR CORP·Filed 2019·Granted Apr 12, 2022·0 cites·13 claims
- 2355US10928739B2Method of measuring misregistration of semiconductor devicesKLA TENCOR CORP·Filed 2019·Granted Feb 23, 2021·0 cites·14 claims
- 2454US11360398B2System and method for tilt calculation based on overlay metrology measurementsKLA CORP·Filed 2020·Granted Jun 14, 2022·0 cites·45 claims
- 2552US10331050B2Lithography systems with integrated metrology tools having enhanced functionalitiesKLA TENCOR CORP·Filed 2017·Granted Jun 25, 2019·0 cites·16 claims
- 2651US11640117B2Selection of regions of interest for measurement of misregistration and amelioration thereofKLA CORP·Filed 2020·Granted May 2, 2023·0 cites·24 claims
- 2750US11075126B2Misregistration measurements using combined optical and electron beam technologyKLA TENCOR CORP·Filed 2019·Granted Jul 27, 2021·0 cites·20 claims
- 2848US12222199B2Systems and methods for measurement of misregistration and amelioration thereofKLA CORP·Filed 2020·Granted Feb 11, 2025·0 cites·22 claims
- 2948US10458777B2Polarization measurements of metrology targets and corresponding target designsKLA TENCOR CORP·Filed 2015·Granted Oct 29, 2019·0 cites·20 claims
- 3047US11454894B2Systems and methods for scatterometric single-wavelength measurement of misregistration and amelioration thereofKLA CORP·Filed 2021·Granted Sep 27, 2022·0 cites·21 claims
- 3147US10401841B2Identifying registration errors of DSA linesKLA TENCOR CORP·Filed 2015·Granted Sep 3, 2019·0 cites·20 claims
- 3246US11862521B2Multiple-tool parameter set calibration and misregistration measurement system and methodKLA CORP·Filed 2020·Granted Jan 2, 2024·0 cites·24 claims
- 3344US10025285B2On-product derivation and adjustment of exposure parameters in a directed self-assembly processKLA TENCOR CORP·Filed 2015·Granted Jul 17, 2018·0 cites·16 claims
- 3443US12393113B2Inter-step feedforward process control in the manufacture of semiconductor devicesKLA CORP·Filed 2020·Granted Aug 19, 2025·0 cites·14 claims
- 3542US11971664B2Reducing device overlay errorsKLA TENCOR CORP·Filed 2018·Granted Apr 30, 2024·0 cites·11 claims
- 3642US11353493B2Data-driven misregistration parameter configuration and measurement system and methodKLA TENCOR CORP·Filed 2019·Granted Jun 7, 2022·0 cites·19 claims
- 3738US11551980B2Dynamic amelioration of misregistration measurementKLA TENCOR CORP·Filed 2019·Granted Jan 10, 2023·0 cites·23 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →