Inventor · disambiguated record
Robert A. Weaver
Also filed as: WEAVER ROBERT · WEAVER ROBERT A · WEAVER ROBERT ALLEN
23 granted patents·12 pending applications·1,504 citations·filing 1983–2008
97Inventor score
Top patents by PatentIndex Score
35 records- 0199US6565729B2Method for electrochemically depositing metal on a semiconductor workpieceSEMITOOL INC·Filed 2000·Granted May 20, 2003·435 cites·59 claims
- 0298US5947718ASemiconductor processing furnaceSEMITOOL INC·Filed 1997·Granted Sep 7, 1999·502 cites·25 claims
- 0395US6254742B1Diffuser with spiral opening pattern for an electroplating reactor vesselSEMITOOL INC·Filed 1999·Granted Jul 3, 2001·130 cites·19 claims
- 0494US7332066B2Apparatus and method for electrochemically depositing metal on a semiconductor workpieceSEMITOOL INC·Filed 2005·Granted Feb 19, 2008·19 cites·38 claims
- 0593US6471913B1Method and apparatus for processing a microelectronic workpiece including an apparatus and method for executing a processing step at an elevated temperatureSEMITOOL INC·Filed 2000·Granted Oct 29, 2002·66 cites·22 claims
- 0691US7160421B2Turning electrodes used in a reactor for electrochemically processing a microelectronic workpieceSEMITOOL INC·Filed 2001·Granted Jan 9, 2007·24 cites·32 claims
- 0789US7189318B2Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpieceSEMITOOL INC·Filed 2001·Granted Mar 13, 2007·16 cites·22 claims
- 0884US7866292B2Apparatus and methods for continuous variable valve timingAES IND INC·Filed 2008·Granted Jan 11, 2011·13 cites·20 claims
- 0981US5846073ASemiconductor furnace processing vessel baseSEMITOOL INC·Filed 1997·Granted Dec 8, 1998·52 cites·25 claims
- 1079US6780374B2Method and apparatus for processing a microelectronic workpiece at an elevated temperatureSEMITOOL INC·Filed 2000·Granted Aug 24, 2004·23 cites·27 claims
- 1178US7102763B2Methods and apparatus for processing microelectronic workpieces using metrologySEMITOOL INC·Filed 2001·Granted Sep 5, 2006·22 cites·69 claims
- 1278US6370791B1Processing machine with lockdown rotorSEMITOOL INC·Filed 2000·Granted Apr 16, 2002·26 cites·20 claims
- 1373US7115196B2Apparatus and method for electrochemically depositing metal on a semiconductor workpieceSEMITOOL INC·Filed 2003·Granted Oct 3, 2006·11 cites·12 claims
- 1471US7020537B2Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpieceSEMITOOL INC·Filed 2001·Granted Mar 28, 2006·12 cites·11 claims
- 1569US5908292ASemiconductor processing furnace outflow cooling systemSEMITOOL INC·Filed 1997·Granted Jun 1, 1999·42 cites·43 claims
- 1668US6164963ASemiconductor furnace processing vessel baseFiled 1998·Granted Dec 26, 2000·29 cites·26 claims
- 1767US2007089991A1Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpieceSEMITOOL INC·Filed 2006·Application pending·0 cites
- 1866US2007221502A1Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpieceSEMITOOL INC·Filed 2007·Application pending·0 cites
- 1963US6861027B2Method and apparatus for processing a microelectronic workpiece including an apparatus and method for executing a processing step at an elevated temperatureSEMITOOL INC·Filed 2002·Granted Mar 1, 2005·7 cites·46 claims
- 2063US2005167273A1Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpieceFiled 2005·Application pending·0 cites
- 2163US2005167274A1Tuning electrodes used in a reactor for electrochemically processing a microelectronics workpieceFiled 2005·Application pending·0 cites
- 2261US6030208AThermal processorSEMITOOL INC·Filed 1998·Granted Feb 29, 2000·32 cites·21 claims
- 2359US4703741AGasoline combustion engineCURRAN JEFFREY M·Filed 1984·Granted Nov 3, 1987·15 cites·23 claims
- 2458US5904478ASemiconductor processing furnace heating subassemblySEMITOOL INC·Filed 1997·Granted May 18, 1999·24 cites·27 claims
- 2558US2005189227A1Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpieceFiled 2005·Application pending·0 cites
- 2656US2004188259A1Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpieceFiled 2004·Application pending·0 cites
- 2754US2010116671A1Apparatus and method for electrochemically depositing metal on a semiconductor workpieceSEMITOOL INC·Filed 2006·Application pending·0 cites
- 2849US2005183959A1Tuning electrodes used in a reactor for electrochemically processing a microelectric workpieceFiled 2005·Application pending·0 cites
- 2949US2005084987A1Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpieceFiled 2004·Application pending·0 cites
- 3048US2007034516A1Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpieceWILSON GREGORY J·Filed 2006·Application pending·0 cites
- 3144US7127828B2Lockdown rotor for a processing machineSEMITOOL INC·Filed 2002·Granted Oct 31, 2006·2 cites·21 claims
- 3242US2004108212A1Apparatus and methods for transferring heat during chemical processing of microelectronic workpiecesFiled 2002·Application pending·0 cites
- 3334US6881309B2Diffuser with spiral opening pattern for electroplating reactor vesselSEMITOOL INC·Filed 2001·Granted Apr 19, 2005·1 cites·20 claims
- 3433US2006000716A1Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpieceWILSON GREGORY J·Filed 2005·Application pending·0 cites
- 3531USD282864SSemiautomatic rifleWEAVER ARMS INC·Filed 1983·Granted Mar 4, 1986·1 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →