Inventor · disambiguated record
Ronald A. Wilklow
Also filed as: WILKLOW RONALD · WILKLOW RONALD A
15 granted patents·6 pending applications·110 citations·filing 1994–2018
91Inventor score
Files withASML HOLDING NV11ASML NETHERLANDS BV2HELMUS PETER RICHARD2ASML HOLDINGS N V1HUGHES AIRCRAFT CO1
Top patents by PatentIndex Score
21 records- 0190US6480330B1Ultraviolet polarization beam splitter for microlithographySILICON VALLEY GROUP·Filed 2000·Granted Nov 12, 2002·39 cites·21 claims
- 0282US7081278B2Method for protection of adhesives used to secure optics from ultra-violet lightASML HOLDINGS N V·Filed 2002·Granted Jul 25, 2006·21 cites·4 claims
- 0378US8736810B2EUV reticle substrates with high thermal conductivityWILKLOW RONALD A·Filed 2009·Granted May 27, 2014·7 cites·20 claims
- 0478US6680794B2Polarization beam splitter for photolithographyASML HOLDING NV·Filed 2002·Granted Jan 20, 2004·17 cites·21 claims
- 0574US7548370B2Layered structure for a tile wave plate assemblyASML HOLDING NV·Filed 2004·Granted Jun 16, 2009·10 cites·19 claims
- 0672US8902562B2Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clampHELMUS PETER RICHARD·Filed 2012·Granted Dec 2, 2014·4 cites·20 claims
- 0765US8558988B2Thin film continuous spatially modulated grey attenuators and filtersVLADIMIRSKY YULI·Filed 2008·Granted Oct 15, 2013·2 cites·19 claims
- 0862US2008017106A1Apparatus to Modify the Spatial Response of a Pattern GeneratorASML HOLDING NV·Filed 2007·Application pending·0 cites
- 0956US7894040B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Feb 22, 2011·3 cites·38 claims
- 1055US9348236B2Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clampHELMUS PETER RICHARD·Filed 2011·Granted May 24, 2016·1 cites·22 claims
- 1154US8755027B2Lithographic apparatus and device manufacturing method involving fluid mixing and control of the physical property of a fluidLIPSON MATTHEW·Filed 2011·Granted Jun 17, 2014·0 cites·20 claims
- 1254US8027026B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2011·Granted Sep 27, 2011·0 cites·20 claims
- 1354US8013999B2Beam characterization monitor for sensing pointing or angle of an optical beamASML HOLDING NV·Filed 2008·Granted Sep 6, 2011·0 cites·25 claims
- 1454US7335398B2Method to modify the spatial response of a pattern generatorASML HOLDING NV·Filed 2004·Granted Feb 26, 2008·1 cites·21 claims
- 1553US2007183046A1Method of Forming a Diffractive Optical ElementASML HOLDING NV·Filed 2007·Application pending·0 cites
- 1649US2008278813A1Ultraviolet Polarization Beam Splitter with Minimum ApodizationASML HOLDING NV·Filed 2008·Application pending·0 cites
- 1746US7414785B2Ultraviolet polarization beam splitter with minimum apodizationASML HOLDING NV·Filed 2003·Granted Aug 19, 2008·1 cites·44 claims
- 1845US2005157391A1Diffractive optical elementASML HOLDING NV·Filed 2005·Application pending·0 cites
- 1942US2020278295A1Beam Pointing Monitor and Compensation SystemsASML HOLDING NV·Filed 2018·Application pending·0 cites
- 2042US2005018296A1Diffractive optical element and method of making sameASML HOLDING NV·Filed 2003·Application pending·0 cites
- 2137US5429732AHigh rate ion beam sputtering processHUGHES AIRCRAFT CO·Filed 1994·Granted Jul 4, 1995·4 cites·3 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →