Inventor · disambiguated record
Ryuichi Funatsu
Also filed as: FUNATSU RYUICHI
18 granted patents·4 pending applications·460 citations·filing 1986–2011
95Inventor score
Top patents by PatentIndex Score
22 records- 0197US7880143B2Electron beam apparatusHITACHI HIGH TECH CORP·Filed 2007·Granted Feb 1, 2011·54 cites·17 claims
- 0292US7425704B2Inspection method and apparatus using an electron beamHITACHI HIGH TECH CORP·Filed 2006·Granted Sep 16, 2008·14 cites·7 claims
- 0391US7906761B2Charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2008·Granted Mar 15, 2011·16 cites·25 claims
- 0491US7034298B2Inspection method and apparatus using an electron beamHITACHI HIGH TECH CORP·Filed 2003·Granted Apr 25, 2006·31 cites·14 claims
- 0590US6566654B1Inspection of circuit patterns for defects and analysis of defects using a charged particle beamHITACHI LTD·Filed 2000·Granted May 20, 2003·34 cites·13 claims
- 0690US4666291ALight-exposure apparatusHITACHI LTD·Filed 1986·Granted May 19, 1987·57 cites·7 claims
- 0783US5008702AExposure method and apparatusHITACHI LTD·Filed 1989·Granted Apr 16, 1991·33 cites·46 claims
- 0883US4852133AX-ray lithography apparatusHITACHI LTD·Filed 1987·Granted Jul 25, 1989·38 cites·4 claims
- 0981US8193493B2Charged particle beam apparatusTANIMOTO SAYAKA·Filed 2011·Granted Jun 5, 2012·6 cites·10 claims
- 1080US7271385B2Inspection method and inspection apparatus using electron beamHITACHI HIGH TECH CORP·Filed 2005·Granted Sep 18, 2007·5 cites·5 claims
- 1180US5125740AMethod and apparatus for measuring optical constants of a thin film as well as method and apparatus for fabricating a thin film utilizing sameHITACHI LTD·Filed 1990·Granted Jun 30, 1992·54 cites·13 claims
- 1279US7071468B2Circuit pattern inspection method and its apparatusHITACHI HIGH TECH CORP·Filed 2004·Granted Jul 4, 2006·16 cites·6 claims
- 1376US4777641AMethod and apparatus for alignmentHITACHI LTD·Filed 1986·Granted Oct 11, 1988·27 cites·5 claims
- 1475US5134298ABeam control method and apparatusHITACHI LTD·Filed 1991·Granted Jul 28, 1992·29 cites·16 claims
- 1568US7855363B2Inspection method and apparatus using an electron beamHITACHI HIGH TECH CORP·Filed 2008·Granted Dec 21, 2010·1 cites·11 claims
- 1664US5195070AOptical information processing apparatus and optical pickup thereforHITACHI LTD·Filed 1990·Granted Mar 16, 1993·15 cites·48 claims
- 1762US7081625B2Charged particle beam apparatusHITACHI SCIENCE SYSTEMS LTD·Filed 2003·Granted Jul 25, 2006·5 cites·6 claims
- 1862US5121449AInformation detecting system of scanning typeHITACHI LTD·Filed 1990·Granted Jun 9, 1992·25 cites·25 claims
- 1952US2009309022A1Apparatus for inspecting a substrate, a method of inspecting a substrate, a scanning electron microscope, and a method of producing an image using a scanning electron microscopeHITACHI HIGH TECH CORP·Filed 2009·Application pending·0 cites
- 2046US2005194536A1Charged particle beam apparatusFiled 2005·Application pending·0 cites
- 2142US2005040331A1Inspection method and inspection apparatus using electron beamFiled 2004·Application pending·0 cites
- 2240US2004026633A1Inspection method and inspection apparatus using electron beamFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →