Inventor · disambiguated record
Ryota Ifuku
Also filed as: IFUKU RYOTA
13 granted patents·17 pending applications·4 citations·filing 2015–2025
82Inventor score
Files withTOKYO ELECTRON LTD30
Top patents by PatentIndex Score
30 records- 0188US11972929B2Processing apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2020·Granted Apr 30, 2024·2 cites·9 claims
- 0276US9702039B2Graphene forming methodTOKYO ELECTRON LTD·Filed 2015·Granted Jul 11, 2017·2 cites·4 claims
- 0374US12351905B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Jul 8, 2025·0 cites·19 claims
- 0473US2025361604A1Film forming method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0572US12486570B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Dec 2, 2025·0 cites·13 claims
- 0661US2025129474A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0758US12116280B2Method and apparatus for forming graphene structureTOKYO ELECTRON LTD·Filed 2019·Granted Oct 15, 2024·0 cites·9 claims
- 0854US2025207261A1Film forming method and film forming systemTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0954US2025149329A1Subtrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1053US12018375B2Flim forming method of carbon-containing film by microwave plasmaTOKYO ELECTRON LTD·Filed 2020·Granted Jun 25, 2024·0 cites·21 claims
- 1153US12014907B2Method and device for forming graphene structureTOKYO ELECTRON LTD·Filed 2020·Granted Jun 18, 2024·0 cites·13 claims
- 1253US11302576B2Method of making a semiconductor device including a graphene barrier layer between conductive layersTOKYO ELECTRON LTD·Filed 2020·Granted Apr 12, 2022·0 cites·7 claims
- 1353US2023080956A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1451US12037246B2Method for detecting abnormal growth of graphene, measurement apparatus, and film formation systemTOKYO ELECTRON LTD·Filed 2020·Granted Jul 16, 2024·0 cites·18 claims
- 1551US2025191907A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1650US2024120183A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1748US12168825B2Film formation method and film formation deviceTOKYO ELECTRON LTD·Filed 2020·Granted Dec 17, 2024·0 cites·5 claims
- 1848US2017268103A1Method for forming base film of graphene, graphene forming method, and apparatus for forming base film of grapheneTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 1946US2023420294A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 2044US12163898B2Method and apparatus for detecting abnormal growth of grapheneTOKYO ELECTRON LTD·Filed 2020·Granted Dec 10, 2024·0 cites·8 claims
- 2144US10700006B2Manufacturing method of nickel wiringTOKYO ELECTRON LTD·Filed 2017·Granted Jun 30, 2020·0 cites·15 claims
- 2244US2023042099A1Film formation method and film formation apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 2341US2023028816A1Film forming method and film forming systemTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 2440US11091836B2Graphene structure forming method and graphene structure forming apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Aug 17, 2021·0 cites·8 claims
- 2540US2022165568A1Method and device for forming hexagonal boron nitride filmTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 2639US2018226252A1Method for Planarizing Graphene LayerTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 2739US2017016116A1Graphene production method, graphene production apparatus and graphene production systemTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 2838US2018226261A1Method of anisotropically etching grapheneTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 2937US2018076030A1SiC FILM FORMING METHOD AND SiC FILM FORMING APPARATUSTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 3036US2018057933A1Method for producing grapheneTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Ryota Ifuku files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →