Inventor · disambiguated record
Ryuji Ohtani
Also filed as: OHTANI RYUJI
15 granted patents·6 pending applications·858 citations·filing 1994–2021
94Inventor score
Top patents by PatentIndex Score
21 records- 0198US7951262B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted May 31, 2011·486 cites·21 claims
- 0297US8603293B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2011·Granted Dec 10, 2013·73 cites·22 claims
- 0397US7988816B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Aug 2, 2011·63 cites·22 claims
- 0495US7740737B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Jun 22, 2010·25 cites·14 claims
- 0593US8137471B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2010·Granted Mar 20, 2012·12 cites·22 claims
- 0692US5494781AMethod for manufacturing printed circuit boardMATSUSHITA ELECTRIC WORKS LTD·Filed 1994·Granted Feb 27, 1996·114 cites·14 claims
- 0789US9490105B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2013·Granted Nov 8, 2016·6 cites·19 claims
- 0887US10854431B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2019·Granted Dec 1, 2020·2 cites·12 claims
- 0983US10546727B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2016·Granted Jan 28, 2020·2 cites·9 claims
- 1082US5855157ASaw bladeMATSUSHITA ELECTRIC WORKS LTD·Filed 1997·Granted Jan 5, 1999·54 cites·2 claims
- 1181US9021984B2Plasma processing apparatus and semiconductor device manufacturing methodYAMAMOTO TAKASHI·Filed 2011·Granted May 5, 2015·7 cites·5 claims
- 1280US9640368B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2012·Granted May 2, 2017·11 cites·16 claims
- 1380US8790490B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2012·Granted Jul 29, 2014·3 cites·14 claims
- 1474US2021082669A1Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 1559US2014326409A1Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1658US2016358753A1Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 1756US10529539B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2016·Granted Jan 7, 2020·0 cites·8 claims
- 1853US2022172934A1Method of diagnosing chamber condition and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1949US2008179005A1Plasma processing apparatus and control method thereofTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2049US2011214815A1Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2011·Application pending·0 cites
- 2144US7682982B2Plasma processing apparatus and control method thereofTOKYO ELECTRON LTD·Filed 2005·Granted Mar 23, 2010·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →