Inventor · disambiguated record
Ryota Yonezawa
Also filed as: YONEZAWA RYOTA
1 granted patent·10 pending applications·0 citations·filing 2012–2025
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11 records- 0164US12428727B2Cyclic film deposition using reductant gasTOKYO ELECTRON LTD·Filed 2023·Granted Sep 30, 2025·0 cites·20 claims
- 0257US2025154643A1Area selective deposition of metals for electronic devicesTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0356US2024363410A1Methods for making semiconductor devices that include metal cap layersTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0456US2025140551A1Method of forming a memory device in a recessed featureTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0554US2023411142A1Metal oxide precleaning prior to metal fillingTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0654US2025379101A1Surface passivation for achieving controllable queue time for post-planarization processTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0752US2025105059A1Method of via fillingTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0849US2025313949A1Area selective deposition using metal carbonyl precursorsTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0931US2012252188A1Plasma processing method and device isolation methodYONEZAWA RYOTA·Filed 2012·Application pending·0 cites
- 1031US2012252226A1Plasma processing methodKABE YOSHIRO·Filed 2012·Application pending·0 cites
- 1128US2018283851A1Motion detection device and three-dimensional shape measurement device using sameUNIV TOKYO·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →