Inventor · disambiguated record
Samer Banna
Also filed as: BANNA SAMER
51 granted patents·30 pending applications·808 citations·filing 2008–2025
98Inventor score
Files withAPPLIED MATERIALS INC61ASM IP HOLDING BV13BANNA SAMER2ASM IP HOLDINGS B V1LUBOMIRSKY DMITRY1
Top patents by PatentIndex Score
81 records- 0198US8368308B2Inductively coupled plasma reactor having RF phase control and methods of use thereofAPPLIED MATERIALS INC·Filed 2010·Granted Feb 5, 2013·285 cites·20 claims
- 0297US8988848B2Extended and independent RF powered cathode substrate for extreme edge tunabilityAPPLIED MATERIALS INC·Filed 2012·Granted Mar 24, 2015·47 cites·16 claims
- 0397US8937800B2Electrostatic chuck with advanced RF and temperature uniformityLUBOMIRSKY DMITRY·Filed 2013·Granted Jan 20, 2015·305 cites·20 claims
- 0497US8933628B2Inductively coupled plasma source with phase controlAPPLIED MATERIALS INC·Filed 2012·Granted Jan 13, 2015·37 cites·17 claims
- 0596US10955832B2Adaptive chamber matching in advanced semiconductor process controlAPPLIED MATERIALS INC·Filed 2020·Granted Mar 23, 2021·4 cites·20 claims
- 0696US10929586B2Predictive spatial digital design of experiment for advanced semiconductor process optimization and controlAPPLIED MATERIALS INC·Filed 2020·Granted Feb 23, 2021·6 cites·20 claims
- 0794US11728141B2Gas hub for plasma reactorAPPLIED MATERIALS INC·Filed 2022·Granted Aug 15, 2023·2 cites·8 claims
- 0892US10705514B2Adaptive chamber matching in advanced semiconductor process controlAPPLIED MATERIALS INC·Filed 2018·Granted Jul 7, 2020·7 cites·17 claims
- 0991US10163606B2Plasma reactor with highly symmetrical four-fold gas injectionAPPLIED MATERIALS INC·Filed 2014·Granted Dec 25, 2018·11 cites·20 claims
- 1090US10008368B2Multi-zone gas injection assembly with azimuthal and radial distribution controlAPPLIED MATERIALS INC·Filed 2014·Granted Jun 26, 2018·10 cites·27 claims
- 1190US9646893B2Method and apparatus for reducing radiation induced change in semiconductor structuresAPPLIED MATERIALS INC·Filed 2016·Granted May 9, 2017·7 cites·14 claims
- 1290US8974684B2Synchronous embedded radio frequency pulsing for plasma etchingBANNA SAMER·Filed 2012·Granted Mar 10, 2015·15 cites·18 claims
- 1385US11244811B2Plasma reactor with highly symmetrical four-fold gas injectionAPPLIED MATERIALS INC·Filed 2018·Granted Feb 8, 2022·1 cites·7 claims
- 1485US9536710B2Tunable gas delivery assembly with internal diffuser and angular injectionAPPLIED MATERIALS INC·Filed 2013·Granted Jan 3, 2017·7 cites·8 claims
- 1584US10930531B2Adaptive control of wafer-to-wafer variability in device performance in advanced semiconductor processesAPPLIED MATERIALS INC·Filed 2018·Granted Feb 23, 2021·3 cites·20 claims
- 1684US9779953B2Electromagnetic dipole for plasma density tuning in a substrate processing chamberAPPLIED MATERIALS INC·Filed 2014·Granted Oct 3, 2017·6 cites·5 claims
- 1781US11139150B2Nozzle for multi-zone gas injection assemblyAPPLIED MATERIALS INC·Filed 2019·Granted Oct 5, 2021·2 cites·3 claims
- 1881US10573493B2Inductively coupled plasma apparatusAPPLIED MATERIALS INC·Filed 2016·Granted Feb 25, 2020·2 cites·12 claims
- 1980US10657214B2Predictive spatial digital design of experiment for advanced semiconductor process optimization and controlAPPLIED MATERIALS INC·Filed 2018·Granted May 19, 2020·3 cites·20 claims
- 2080US8360003B2Plasma reactor with uniform process rate distribution by improved RF ground return pathAPPLIED MATERIALS INC·Filed 2009·Granted Jan 29, 2013·5 cites·4 claims
- 2179US2025293062A1Adaptive control of variability in device performance in advanced semiconductor processesAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2278US10332772B2Multi-zone heated ESC with independent edge zonesAPPLIED MATERIALS INC·Filed 2014·Granted Jun 25, 2019·4 cites·15 claims
- 2378US9659803B2Electrostatic chuck with concentric cooling baseAPPLIED MATERIALS INC·Filed 2014·Granted May 23, 2017·4 cites·19 claims
- 2478US8299391B2Field enhanced inductively coupled plasma (Fe-ICP) reactorTODOROW VALENTIN N·Filed 2008·Granted Oct 30, 2012·8 cites·20 claims
- 2574US10825708B2Process kit components for use with an extended and independent RF powered cathode substrate for extreme edge tunabilityAPPLIED MATERIALS INC·Filed 2012·Granted Nov 3, 2020·2 cites·16 claims
- 2674US10410841B2Side gas injection kit for multi-zone gas injection assemblyAPPLIED MATERIALS INC·Filed 2018·Granted Sep 10, 2019·0 cites·14 claims
- 2773US8578879B2Apparatus for VHF impedance match tuningRAMASWAMY KARTIK·Filed 2009·Granted Nov 12, 2013·7 cites·26 claims
- 2872US9287147B2Substrate support with advanced edge control provisionsTANTIWONG KYLE·Filed 2013·Granted Mar 15, 2016·4 cites·20 claims
- 2971US9472378B2Multiple zone coil antenna with plural radial lobesAPPLIED MATERIALS INC·Filed 2013·Granted Oct 18, 2016·2 cites·20 claims
- 3071US9257265B2Methods for reducing etch nonuniformity in the presence of a weak magnetic field in an inductively coupled plasma reactorAPPLIED MATERIALS INC·Filed 2014·Granted Feb 9, 2016·2 cites·16 claims
- 3171US8492980B2Methods for calibrating RF power applied to a plurality of RF coils in a plasma processing systemBANNA SAMER·Filed 2011·Granted Jul 23, 2013·3 cites·20 claims
- 3270US8956886B2Embedded test structure for trimming process controlAPPLIED MATERIALS INC·Filed 2014·Granted Feb 17, 2015·2 cites·20 claims
- 3367US11139142B2High-resolution three-dimensional profiling of features in advanced semiconductor devices in a non-destructive manner using electron beam scanning electron microscopyAPPLIED MATERIALS INC·Filed 2019·Granted Oct 5, 2021·1 cites·20 claims
- 3467US2022132859A1Methods and apparatus for forming antimicrobial filmAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 3566US12322618B2Adaptive control of variability in device performance in advanced semiconductor processesAPPLIED MATERIALS INC·Filed 2021·Granted Jun 3, 2025·0 cites·20 claims
- 3666US2025388414A1Substrate handling device and end effectorASM IP HOLDING BV·Filed 2025·Application pending·0 cites
- 3765US10422984B2Flexible mode scanning optical microscopy and inspection systemAPPLIED MATERIALS INC·Filed 2017·Granted Sep 24, 2019·1 cites·17 claims
- 3864US9945033B2High efficiency inductively coupled plasma source with customized RF shield for plasma profile controlAPPLIED MATERIALS INC·Filed 2014·Granted Apr 17, 2018·0 cites·21 claims
- 3963US12415982B2Automated closed system for cell therapy manufacturingAPPLIED MATERIALS INC·Filed 2021·Granted Sep 16, 2025·0 cites·20 claims
- 4063US12005446B2High throughput compact microfluidic cell counterAPPLIED MATERIALS INC·Filed 2021·Granted Jun 11, 2024·0 cites·15 claims
- 4163US11119051B2Particle detection for substrate processingAPPLIED MATERIALS INC·Filed 2020·Granted Sep 14, 2021·0 cites·20 claims
- 4263US9406540B2Self-bias calculation on a substrate in a process chamber with bias power for single or multiple frequenciesAPPLIED MATERIALS INC·Filed 2012·Granted Aug 2, 2016·1 cites·20 claims
- 4363US2025183069A1Configurable and modular load lock chamber systems and methods of making load locks for semiconductor processing systemsASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 4463US2025218803A1Transfer chambers, associated semiconductor processing systems, and methods for preventing moisture entering a transfer chamberASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 4563US2025218833A13 pillar boat in a load lock chamber and methods of making pillar boat in load locks for semiconductor processing systemsASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 4662US11781100B2All-in-one bioreactor for therapeutic cells manufacturingAPPLIED MATERIALS INC·Filed 2020·Granted Oct 10, 2023·0 cites·19 claims
- 4762US2025183064A1Substrate preheating module, a device processing assembly with a substrate preheating function and the method of the sameASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 4862US2025183068A1Substrate cooling apparatus using conduction and radianceASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 4960US2025038012A1Systems and methods for substrate cooling and/or heating using cooling gas introduced from another chamberASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 5059US10271416B2High efficiency triple-coil inductively coupled plasma source with phase controlAPPLIED MATERIALS INC·Filed 2012·Granted Apr 23, 2019·2 cites·14 claims
Showing the top 50 of 81 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →