Inventor · disambiguated record
Sascha Bleidistel
Also filed as: BLEIDISTEL SASCHA
35 granted patents·8 pending applications·93 citations·filing 2004–2023
96Inventor score
Top patents by PatentIndex Score
43 records- 0195US7830611B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Granted Nov 9, 2010·34 cites·48 claims
- 0292US8811568B2Correction of optical elements by correction light irradiated in a flat mannerZEISS CARL SMT GMBH·Filed 2013·Granted Aug 19, 2014·5 cites·24 claims
- 0391US7990622B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2010·Granted Aug 2, 2011·7 cites·47 claims
- 0488US7782440B2Projection lens system of a microlithographic projection exposure installationZEISS CARL SMT AG·Filed 2005·Granted Aug 24, 2010·8 cites·4 claims
- 0586US9568837B2Arrangement for actuating an element in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 14, 2017·2 cites·20 claims
- 0685US8786826B1Arrangement for actuating an element in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Jul 22, 2014·5 cites·29 claims
- 0784US8767176B2Microlithographic projection exposure apparatusBLEIDISTEL SASCHA·Filed 2011·Granted Jul 1, 2014·6 cites·30 claims
- 0879US10908508B2Position measurement of optical elements in a lithographic apparatusZEISS CARL SMT GMBH·Filed 2019·Granted Feb 2, 2021·1 cites·21 claims
- 0979US9841682B2Arrangement for actuating an element in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Granted Dec 12, 2017·1 cites·20 claims
- 1079US8760744B2Correction of optical elements by correction light irradiated in a flat mannerBLEIDISTEL SASCHA·Filed 2009·Granted Jun 24, 2014·3 cites·27 claims
- 1178US10509325B2Position measurement of optical elements in a lithographic apparatusZEISS CARL SMT GMBH·Filed 2018·Granted Dec 17, 2019·1 cites·21 claims
- 1276US7777963B2Method for improving the imaging properties of a projection objective, and such a projection objectiveZEISS CARL SMT AG·Filed 2006·Granted Aug 17, 2010·3 cites·53 claims
- 1375US10185221B2Arrangement for actuating an element in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Granted Jan 22, 2019·1 cites·20 claims
- 1473US10012911B2Projection exposure apparatus with wavefront measuring device and optical wavefront manipulatorZEISS CARL SMT GMBH·Filed 2017·Granted Jul 3, 2018·1 cites·20 claims
- 1573US8773638B2Microlithographic projection exposure apparatus with correction optical system that heats projection objective elementDODOC AURELIAN·Filed 2010·Granted Jul 8, 2014·2 cites·23 claims
- 1671US8269948B2Projection exposure apparatus and optical systemBLEIDISTEL SASCHA·Filed 2009·Granted Sep 18, 2012·5 cites·38 claims
- 1770US10146137B2Catadioptric projection objective including a reflective optical component and a measuring deviceBLEIDISTEL SASCHA·Filed 2012·Granted Dec 4, 2018·2 cites·20 claims
- 1870US8027023B2Optical imaging device and method for reducing dynamic fluctuations in pressure differenceZEISS CARL SMT GMBH·Filed 2007·Granted Sep 27, 2011·2 cites·22 claims
- 1968US9069263B2Method for improving the imaging properties of a projection objective, and such a projection objectiveCONRADI OLAF·Filed 2010·Granted Jun 30, 2015·1 cites·28 claims
- 2068US2021149309A1Position measurement of optical elements in a lithographic apparatusZEISS CARL SMT GMBH·Filed 2021·Application pending·0 cites
- 2165US8319944B2Projection lens system of a microlithographic projection exposure installationBEIERL HELMUT·Filed 2010·Granted Nov 27, 2012·1 cites·20 claims
- 2264US8212991B2Optical system of a microlithographic projection exposure apparatusDODOC AURELIAN·Filed 2009·Granted Jul 3, 2012·2 cites·33 claims
- 2363US9366857B2Correction of optical elements by correction light irradiated in a flat mannerZEISS CARL SMT GMBH·Filed 2014·Granted Jun 14, 2016·0 cites·21 claims
- 2460US10054786B2Correction of optical elements by correction light irradiated in a flat mannerZEISS CARL SMT GMBH·Filed 2016·Granted Aug 21, 2018·0 cites·23 claims
- 2559US10578976B2Catadioptric projection objective including a reflective optical component and a measuring deviceZEISS CARL SMT GMBH·Filed 2018·Granted Mar 3, 2020·0 cites·20 claims
- 2659US2024085783A1Optical device, method for adjusting a setpoint deformation and lithography systemZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 2758US9535336B2Microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Jan 3, 2017·0 cites·22 claims
- 2858US9164396B2Projection lens system of a microlithographic projection exposure installationZEISS CARL SMT GMBH·Filed 2012·Granted Oct 20, 2015·0 cites·20 claims
- 2958US2014300882A1Arrangement for actuating an element in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Application pending·0 cites
- 3056US9581813B2Method for improving the imaging properties of a projection objective, and such a projection objectiveZEISS CARL SMT GMBH·Filed 2015·Granted Feb 28, 2017·0 cites·35 claims
- 3156US2008309904A1Optical system of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 3253US10025200B2Optimum arrangement of actuator and sensor points on an optical elementZEISS CARL SMT GMBH·Filed 2016·Granted Jul 17, 2018·0 cites·20 claims
- 3353US9110388B2Projection exposure apparatus with multiple sets of piezoelectric elements moveable in different directions and related methodBLEIDISTEL SASCHA·Filed 2012·Granted Aug 18, 2015·0 cites·48 claims
- 3451US10162270B2Projection exposure apparatus comprising a measuring system for measuring an optical elementZEISS CARL SMT GMBH·Filed 2014·Granted Dec 25, 2018·0 cites·25 claims
- 3551US9817322B2Optical imaging device and method for reducing dynamic fluctuations in pressure differenceHEMBACHER STEFAN·Filed 2011·Granted Nov 14, 2017·0 cites·57 claims
- 3650US10459351B2Device for transmitting electrical signals, and lithography apparatusZEISS CARL SMT GMBH·Filed 2019·Granted Oct 29, 2019·0 cites·20 claims
- 3747US2008170217A1Optical System of a Microlithographic Projection Exposure ApparatusZEISS CARL SMT AG·Filed 2006·Application pending·0 cites
- 3845US9366977B2Semiconductor microlithography projection exposure apparatusBLEIDISTEL SASCHA·Filed 2011·Granted Jun 14, 2016·0 cites·42 claims
- 3945US2010128367A1Projection objective for a microlithography apparatus and methodZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 4041US2013182264A1Projection Exposure Tool for Microlithography and Method for Microlithographic ExposureHETZLER JOCHEN·Filed 2013·Application pending·0 cites
- 4137US10162267B2Projection exposure apparatus including mechanism to reduce influence of pressure fluctuationsZEISS CARL SMT GMBH·Filed 2015·Granted Dec 25, 2018·0 cites·31 claims
- 4237US2006018045A1Mirror arrangement and method of manufacturing thereof, optical system and lithographic method of manufacturing a miniaturized deviceZEISS CARL SMT AG·Filed 2004·Application pending·0 cites
- 4332US9964673B2Optical system with aperture device having plurality of aperture elementsSIGEL BENJAMIN·Filed 2011·Granted May 8, 2018·0 cites·3 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →