Inventor · disambiguated record
Sarah Brosnan
Also filed as: BROSNAN SARAH
6 granted patents·5 pending applications·5 citations·filing 2018–2022
72Inventor score
Top patents by PatentIndex Score
11 records- 0187US10920107B2Self-stopping polishing composition and method for bulk oxide planarizationCABOT MICROELECTRONICS CORP·Filed 2020·Granted Feb 16, 2021·2 cites·14 claims
- 0287US10619076B2Self-stopping polishing composition and method for bulk oxide planarizationCABOT MICROELECTRONICS CORP·Filed 2019·Granted Apr 14, 2020·2 cites·8 claims
- 0381US10619075B2Self-stopping polishing composition and method for bulk oxide planarizationCABOT MICROELECTRONICS CORP·Filed 2018·Granted Apr 14, 2020·1 cites·10 claims
- 0469US11845156B2Polishing pad employing polyamine and cyclohexanedimethanol curativesCABOT MICROELECTRONICS CORP·Filed 2020·Granted Dec 19, 2023·0 cites·29 claims
- 0555US2021115298A1Composition and method for dielectric cmpCMC MAT INC·Filed 2020·Application pending·0 cites
- 0655US2021115299A1Composition and method for dielectric cmpCMC MAT INC·Filed 2020·Application pending·0 cites
- 0750US10584266B2CMP compositions containing polymer complexes and agents for STI applicationsCABOT MICROELECTRONICS CORP·Filed 2018·Granted Mar 10, 2020·0 cites·14 claims
- 0849US12157834B2Composition and method for polysilicon CMPCABOT MICROELECTRONICS CORP·Filed 2020·Granted Dec 3, 2024·0 cites·8 claims
- 0948US2023087984A1Silica-based slurry compositions containing high molecular weight polymers for use in cmp of dielectricsCMC MAT INC·Filed 2022·Application pending·0 cites
- 1044US2021115301A1Self-stopping polishing composition and methodCMC MAT INC·Filed 2020·Application pending·0 cites
- 1143US2021115302A1Composition and method for selective oxide cmpCMC MAT INC·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →