Inventor · disambiguated record
Sanjaysingh Lalbahadoersing
Also filed as: LALBAHADOERSING SANJAYSINGH
12 granted patents·3 pending applications·34 citations·filing 2004–2020
87Inventor score
Files withASML NETHERLANDS BV9MUSA SAMI2VAN HAREN RICHARD JOHANNES FRANCISCUS2ASML NERTHERLANDS B V1PROSYENTSOV VITALLY1
Top patents by PatentIndex Score
15 records- 0187US11086232B2Mark, overlay target, and methods of alignment and overlayASML NETHERLANDS BV·Filed 2018·Granted Aug 10, 2021·5 cites·20 claims
- 0279US8072615B2Alignment method, alignment system, and product with alignment markMUSA SAMI·Filed 2008·Granted Dec 6, 2011·11 cites·15 claims
- 0377US10191390B2Method for transferring a mark pattern to a substrate, a calibration method, and a lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted Jan 29, 2019·2 cites·20 claims
- 0468US7453161B2Marker for alignment of non-transparent gate layer, method for manufacturing such a marker, and use of such a marker in a lithographic apparatusASML NETHERLANDS BV·Filed 2007·Granted Nov 18, 2008·3 cites·15 claims
- 0565US7598024B2Method and system for enhanced lithographic alignmentASML NETHERLANDS BV·Filed 2006·Granted Oct 6, 2009·2 cites·23 claims
- 0657US7271073B2Marker for alignment of non-transparent gate layer, method for manufacturing such a marker, and use of such a marker in a lithographic apparatusASML NERTHERLANDS B V·Filed 2004·Granted Sep 18, 2007·9 cites·13 claims
- 0755US11675281B2Methods of alignment, overlay, configuration of marks, manufacturing of patterning devices and patterning the marksASML NETHERLANDS BV·Filed 2020·Granted Jun 13, 2023·0 cites·13 claims
- 0855US8319967B2Marker structure and method of forming the sameVAN HAREN RICHARD JOHANNES FRANCISCUS·Filed 2008·Granted Nov 27, 2012·0 cites·12 claims
- 0955US8203692B2Sub-segmented alignment mark arrangementMUSA SAMI·Filed 2009·Granted Jun 19, 2012·1 cites·16 claims
- 1052US8243259B2Lithographic apparatusPROSYENTSOV VITALLY·Filed 2009·Granted Aug 14, 2012·1 cites·15 claims
- 1151US2013070226A1Marker structure and method of forming the sameVAN HAREN RICHARD JOHANNES FRANCISCUS·Filed 2012·Application pending·0 cites
- 1250US2007212648A1Method and system for enhanced lithographic patterningASML NETHERLANDS BV·Filed 2007·Application pending·0 cites
- 1348US2007212649A1Method and system for enhanced lithographic patterningASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 1443US10948837B2Information determining apparatus and methodASML NETHERLANDS BV·Filed 2018·Granted Mar 16, 2021·0 cites·21 claims
- 1534US10429750B2Alignment mark recovery method and lithographic apparatusASML NETHERLANDS BV·Filed 2017·Granted Oct 1, 2019·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →