Inventor · disambiguated record
Samantha Tan
Also filed as: TAN SAMANTHA · TAN SAMANTHA S H
35 granted patents·29 pending applications·536 citations·filing 1989–2025
98Inventor score
Top patents by PatentIndex Score
64 records- 0198US11257674B2Eliminating yield impact of stochastics in lithographyLAM RES CORP·Filed 2020·Granted Feb 22, 2022·15 cites·19 claims
- 0298US9257638B2Method to etch non-volatile metal materialsLAM RES CORP·Filed 2014·Granted Feb 9, 2016·55 cites·18 claims
- 0397US11848212B2Alternating etch and passivation processLAM RES CORP·Filed 2022·Granted Dec 19, 2023·10 cites·14 claims
- 0497US11551938B2Alternating etch and passivation processLAM RES CORP·Filed 2020·Granted Jan 10, 2023·13 cites·21 claims
- 0597US10796912B2Eliminating yield impact of stochastics in lithographyLAM RES CORP·Filed 2018·Granted Oct 6, 2020·18 cites·16 claims
- 0697US9130158B1Method to etch non-volatile metal materialsLAM RES CORP·Filed 2014·Granted Sep 8, 2015·44 cites·19 claims
- 0796US12293919B2Alternating etch and passivation processLAM RES CORP·Filed 2023·Granted May 6, 2025·3 cites·15 claims
- 0895US12504692B2Cyclic development of metal oxide based photoresist for etch stop deterrenceLAM RES CORP·Filed 2023·Granted Dec 23, 2025·2 cites·28 claims
- 0995US11988965B2Underlayer for photoresist adhesion and dose reductionLAM RES CORP·Filed 2021·Granted May 21, 2024·13 cites·42 claims
- 1095US11314168B2Underlayer for photoresist adhesion and dose reductionLAM RES CORP·Filed 2021·Granted Apr 26, 2022·24 cites·79 claims
- 1194US12474638B2Underlayer for photoresist adhesion and dose reductionLAM RES CORP·Filed 2024·Granted Nov 18, 2025·2 cites·63 claims
- 1293US12474640B2Integration of dry development and etch processes for EUV patterning in a single process chamberLAM RES CORP·Filed 2024·Granted Nov 18, 2025·4 cites·20 claims
- 1393US12062538B2Atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvementLAM RES CORP·Filed 2020·Granted Aug 13, 2024·3 cites·32 claims
- 1493US6607605B2Cleaning of semiconductor process equipment chamber parts using organic solventsCHEMTRACE CORP·Filed 2001·Granted Aug 19, 2003·43 cites·15 claims
- 1592US8691023B2Methods and apparatus for cleaning deposition chamber parts using selective spray etchBAO LIYUAN·Filed 2012·Granted Apr 8, 2014·116 cites·10 claims
- 1692US6810887B2Method for cleaning semiconductor fabrication equipment partsCHEMTRACE CORP·Filed 2001·Granted Nov 2, 2004·42 cites·21 claims
- 1787US7452475B2Cleaning process and apparatus for silicate materialsAPPLIED MATERIALS INC·Filed 2005·Granted Nov 18, 2008·6 cites·15 claims
- 1884US9391267B2Method to etch non-volatile metal materialsLAM RES CORP·Filed 2015·Granted Jul 12, 2016·3 cites·20 claims
- 1984US2025328076A1Underlayer for photoresist adhesion and dose reductionLAM RES CORP·Filed 2025·Application pending·0 cites
- 2082US11062897B2Metal doped carbon based hard mask removal in semiconductor fabricationLAM RES CORP·Filed 2017·Granted Jul 13, 2021·4 cites·26 claims
- 2181US11823909B2Selective processing with etch residue-based inhibitorsLAM RES CORP·Filed 2019·Granted Nov 21, 2023·2 cites·20 claims
- 2281US7377991B2Ultrasonic assisted etch using corrosive liquidsAPPLIED MATERIALS INC·Filed 2006·Granted May 27, 2008·5 cites·26 claims
- 2380US12131909B2Selective processing with etch residue-based inhibitorsLAM RES CORP·Filed 2023·Granted Oct 29, 2024·0 cites·18 claims
- 2480US2025087498A1Tin oxide mandrels in patterningLAM RES CORP·Filed 2024·Application pending·0 cites
- 2580US2025246460A1Integrated dry processes for patterning radiation photoresist patterningLAM RES CORP·Filed 2025·Application pending·0 cites
- 2678US2025014904A1Selective processing with etch residue-based inhibitorsLAM RES CORP·Filed 2024·Application pending·0 cites
- 2777US7789969B2Methods and apparatus for cleaning chamber componentsAPPLIED MATERIALS INC·Filed 2007·Granted Sep 7, 2010·6 cites·17 claims
- 2877US2024274408A1High energy atomic layer etchingLAM RES CORP·Filed 2024·Application pending·0 cites
- 2975US7091132B2Ultrasonic assisted etch using corrosive liquidsCHEMTRACE PREC CLEANING INC·Filed 2003·Granted Aug 15, 2006·16 cites·33 claims
- 3074US12315727B2Eliminating yield impact of stochastics in lithographyLAM RES CORP·Filed 2021·Granted May 27, 2025·0 cites·13 claims
- 3174US7754609B1Cleaning processes for silicon carbide materialsAPPLIED MATERIALS INC·Filed 2003·Granted Jul 13, 2010·11 cites·41 claims
- 3274US2022115244A1Atomic layer etching of tungsten for enhanced tungsten deposition fillLAM RES CORP·Filed 2021·Application pending·0 cites
- 3373US7045072B2Cleaning process and apparatus for silicate materialsTAN SAMANTHA S H·Filed 2003·Granted May 16, 2006·11 cites·4 claims
- 3473US2024429045A1Atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvementLAM RES CORP·Filed 2024·Application pending·0 cites
- 3572US2021305059A1Atomic layer etching of tungsten for enhanced tungsten deposition fillLAM RES CORP·Filed 2021·Application pending·0 cites
- 3671US2023045336A1Integrated dry processes for patterning radiation photoresist patterningLAM RES CORP·Filed 2021·Application pending·0 cites
- 3766US2022392747A1Atomic layer etching and smoothing of refractory metals and other high surface binding energy materialsLAM RES CORP·Filed 2022·Application pending·0 cites
- 3863US8492674B2Methods and apparatus for ex situ seasoning of electronic device manufacturing process componentsWANG JIANSHENG·Filed 2008·Granted Jul 23, 2013·1 cites·10 claims
- 3963US5804744AApparatus for obtaining, storing and transporting liquid samples and methods for making and using sameCHEMTRACE·Filed 1996·Granted Sep 8, 1998·29 cites·20 claims
- 4063US2020402770A1High energy atomic layer etchingLAM RES CORP·Filed 2020·Application pending·0 cites
- 4160US2017232784A1System and Method for Cleaning Semiconductor Fabrication Equipment PartsQUANTUM GLOBAL TECH LLC·Filed 2016·Application pending·0 cites
- 4260US2014190937A1System and Method for Cleaning Semiconductor Fabrication Equipment PartsQUANTUM GLOBAL TECH LLC·Filed 2014·Application pending·0 cites
- 4358US8097089B2Methods for cleaning process kits and chambers, and for ruthenium recoveryTAN SAMANTHA S H·Filed 2008·Granted Jan 17, 2012·0 cites·17 claims
- 4458US2018240682A1Atomic layer etch of tungsten for enhanced tungsten deposition fillLAM RES CORP·Filed 2018·Application pending·0 cites
- 4556US2012211468A1System and Method for Cleaning Semiconductor Fabrication Equipment PartsTAN SAMANTHA·Filed 2012·Application pending·0 cites
- 4654US2006180180A1System and method for cleaning semiconductor fabrication equipment partsTAN SAMANTHA·Filed 2006·Application pending·0 cites
- 4753US5996424AApparatus for obtaining, storing and transporting liquid samples and methods for making and using sameCHEMTRACE CORP·Filed 1998·Granted Dec 7, 1999·16 cites·27 claims
- 4853US2024355650A1Dry development apparatus and methods for volatilization of dry development byproducts in wafersLAM RES CORP·Filed 2022·Application pending·0 cites
- 4952US4930360ALiquids samplerBALAZS ANALYTICAL LAB·Filed 1989·Granted Jun 5, 1990·15 cites·8 claims
- 5052US2023314946A1Method of forming photo-sensitive hybrid filmsLAM RES CORP·Filed 2021·Application pending·0 cites
Showing the top 50 of 64 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →